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US5169488A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of forming planarized, reusable calibration grids

Assignee: International Business Machines Corp
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Filing: 1991-05-23
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Granted: 1992-12-08
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Expires: 2011-05-23
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Abstract

Abstract An improved structure for electron beam lithography grids and a method of fabricating such grids yields calibration grids having grid lines coplanar with the surface of the grid body and laterally supported by grooves formed in the grid body and which can also be cleaned after contamination by outgassing resist during use by virtue of the provision of such lateral support for the grid lines. The grid exhibits improved accuracy due to the technique of fabrication of the grooves. The invention thus allows the electron beam lithography process to be conducted with less expense and at greater speed. The improved accuracy of the calibration grid also permits integrated circuits and masks used in the fabrication of such devices to be designed more flexibly and fabricated at reduced cost and improved integration densities and manufacturing yields.

Inventors

  • 👤 George J. Giuffre
  • 👤 Maris A. Sturans
  • 👤 James F. White
  • 👤 Robert R. Wilbarg

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-25 08:20
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/304; H01J37/3045

Claims Analysis

Total Claims: 22
Claim 1
Independent Claim 38 words
A method of making a grid including the steps of providing lateral support for grid line material located at an exterior surface of a body and polishing said exterior surface of said body to form a planar surface.
Claim 2
Independent Claim 38 words
A method of making a grid including the steps of providing lateral support for grid line material located at an exterior surface of a body and polishing said exterior surface of said body to form a planar surface.
Claim 3
Dependent Claim 40 words
A method as recited in claim 1, wherein said step of providing lateral support for said grid line material includes forming at least one groove in said surface of said body and depositing said grid line material in said groove.
Claim 4
Dependent Claim 66 words
A method as recited in claim 2, wherein said step of depositing said grid line material includes depositing said grid line material on said surface of said body, and wherein said polishing step includes abrading said grid line material on said surface of said body until said grid line material deposited in said grooves has a surface which is coplanar with said surface of said body.
Claim 5
Dependent Claim 33 words
A method as recited in claim 2, wherein said step of forming said at least one groove includes at least one step of etching said surface of said body by reactive ion etching.
Claim 6
Dependent Claim 39 words
A method as recited in claim 1, including a step of applying a pattern of grid line material to an exterior surface of a body preceding said step of providing lateral support for said pattern of grid line material.
Claim 7
Dependent Claim 37 words
A method as recited in claim 5, wherein said step of providing lateral support for said pattern of grid line material includes depositing a support material at least in spaces of said pattern of grid line material.
Claim 8
Dependent Claim 27 words
A method as recited in claim 6, wherein said polishing step includes abrading said support material and said grid line material until a planar surface is formed.
Claim 9
Independent Claim 67 words
A method of making a calibration grid for use in electron beam lithography apparatus, said method including the steps of depositing a pattern of conductive material on a surface of a body, overlaying a support material on said surface of said body and said pattern of conductive material, and removing said support material where it overlies said pattern of said conductive material to form a planar surface.
Claim 10
Independent Claim 67 words
A method of making a calibration grid for use in electron beam lithography apparatus, said method including the steps of depositing a pattern of conductive material on a surface of a body, overlaying a support material on said surface of said body and said pattern of conductive material, and removing said support material where it overlies said pattern of said conductive material to form a planar surface.
Claim 11
Independent Claim 65 words
A method of making a calibration grid for use in electron beam lithography apparatus, said method including the steps of forming an intaglio pattern in a surface of a body, depositing a conductive material at least in said intaglio pattern, and polishing said surface of said body until said surface of said body and said conductive material deposited in said intaglio pattern are substantially coplanar.
Claim 12
Independent Claim 65 words
A method of making a calibration grid for use in electron beam lithography apparatus, said method including the steps of forming an intaglio pattern in a surface of a body, depositing a conductive material at least in said intaglio pattern, and polishing said surface of said body until said surface of said body and said conductive material deposited in said intaglio pattern are substantially coplanar.
Claim 13
Dependent Claim 17 words
A method as recited in claim 9, wherein said step of forming an intaglio pattern includes etching.
Claim 14
Dependent Claim 36 words
A method as recited in claim 10, wherein said body is comprised of a material having a crystalline structure and wherein said etching step includes etching in a preferential direction in accordance with said crystalline structure.
Claim 15
Independent Claim 56 words
A method of making a grid including the steps of applying a pattern of conductive grid line material to an exterior surface of a body, providing lateral support for said pattern of grid line material located at said exterior surface of said body and polishing said exterior surface of said body to form a planar surface.
Claim 16
Independent Claim 56 words
A method of making a grid including the steps of applying a pattern of conductive grid line material to an exterior surface of a body, providing lateral support for said pattern of grid line material located at said exterior surface of said body and polishing said exterior surface of said body to form a planar surface.
Claim 17
Dependent Claim 44 words
A method as recited in claim 12, wherein said step of providing lateral support for said grid line material includes forming at least one groove in said surface of said body and said applying step comprises depositing said grid line material in said groove.
Claim 18
Dependent Claim 66 words
A method as recited in claim 13, wherein said step of depositing said grid line material includes depositing said grid line material on said surface of said body, and wherein said polishing step includes abrading said grid line material on said surface of said body until said grid line material deposited in said grooves has a surface which is coplanar with said surface of said body.
Claim 19
Dependent Claim 33 words
A method as recited in claim 13, wherein said step of forming said at least one groove includes at least one step of etching said surface of said body by reactive ion etching.
Claim 20
Dependent Claim 39 words
A method as recited in claim 12, wherein said step of applying a pattern of grid line material to an exterior surface of a body precedes said step of providing lateral support for said pattern of grid line material.
Claim 21
Dependent Claim 37 words
A method as recited in claim 12, wherein said step of providing lateral support for said pattern of grid line material includes depositing a support material at least in spaces of said pattern of grid line material.
Claim 22
Dependent Claim 27 words
A method as recited in claim 17, wherein said polishing step includes abrading said support material and said grid line material until a planar surface is formed.

References Cited (Backward Citations)

US3579057A Cited
US3982837A Cited
US4056730A Cited
US4233091A Cited
US4467211A Cited
US4390789A Cited
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US4728799A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1995-12-08 1996-06-08 1996-12-08 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1999-12-08 2000-06-08 2000-12-08 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2003-12-08 2004-06-08 2004-12-08 $7700.00 Window Closed / Lapsed

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