Illuminator for microlithographic integrated circuit manufacture

Claim 2

Illuminator apparatus for the microlithographic manufacture of semiconductor integrated circuits by exposure of a resist coated wafer at wavelengths of about 365 nanometers or less, said apparatus comprising: a lamp which emits light at a variety of wavelengths; optical filter means having an entrance and an exit and being operative to remove at least wavelengths longer than about 365 nanometers from light applied to said entrance; means for directing light emitted from said lamp into the entrance of said optical filter means; housing means enclosing said lamp and at least the entrance of said optical filter means, said housing means providing an inlet and an outlet for cooling air for said lamp; and connected to said inlet, a filter which includes a bed of activated carbon for removing from air passing through said housing volatile compounds which are photopolymerizable, whereby degradation of light output from said illuminator apparatus by the photopolymerization of volatile compounds is inhibited.

Claim 3

Apparatus as set forth in claim 1 wherein said lamp is a mercury arc lamp.

Claim 4

Apparatus as set forth in claim 1 wherein said light directing means is a focussed reflector.

Claim 5

Apparatus as set forth in claim 3 wherein said reflector is elliptical and said lamp is at one of the elliptical facii.

Claim 6

Apparatus as set forth in claim 1 including a blower connected to said outlet for drawing air through said housing.

Claim 7

Illuminator apparatus for the microlithographic manufacture of semiconductor integrated circuits by exposure of a resist coated wafer at wavelengths of about 365 nanometers or less, said apparatus comprising: a high pressure mercury arc lamp which emits light at a variety of wavelengths; optical filter means having an entrance and an exit and being operative to remove at least wavelengths longer than about 365 nanometers from light applied to said entrance; light collection means for collecting light emitted from said lamp and directing the collected light into the entrance of said optical filter means; housing means enclosing said lamp, said collection means and at least the entrance of said optical filter means, said housing means providing an inlet and an outlet for cooling air for said lamp; blower means for drawing air from said outlet; and connected to said inlet, a filter which includes a bed of activated carbon for removing from air drawn into said housing volatile compounds which are photopolymerizable into substances which are absorbtive at wavelengths of about 365 nanometers or less, whereby degradation of light output from said illuminator apparatus by the photopolymerization of volatile compounds is inhibited.

Claim 8

Illuminator apparatus for the microlithographic manufacture of semiconductor integrated circuits by exposure of a resist coated wafer at wavelengths of about 365 nanometers or less, said apparatus comprising: a high pressure mercury arc lamp which emits light at a variety of wavelengths; optical filter means having an entrance and an exit and being operative to remove at least wavelengths longer than about 365 nanometers from light applied to said entrance; light collection means for collecting light emitted from said lamp and directing the collected light into the entrance of said optical filter means; housing means enclosing said lamp, said collection means and at least the entrance of said optical filter means, said housing means providing an inlet and an outlet for cooling air for said lamp; blower means for drawing air from said outlet; and connected to said inlet, a filter which includes a bed of activated carbon for removing from air drawn into said housing volatile compounds which are photopolymerizable into substances which are absorbtive at wavelengths of about 365 nanometers or less, whereby degradation of light output from said illuminator apparatus by the photopolymerization of volatile compounds is inhibited.

Claim 9

Apparatus as set forth in claim 6 wherein said collecting means is an elliptical reflector.

Claim 10

Apparatus as set forth in claim 6 wherein said filter is a composite filter including a particulate filter between said activated carbon bed and said inlet.

Claim 11

Apparatus as set forth in claim 6 wherein said optical filter means includes a cold mirror which traps heat producing wavelengths and is coupled to an air cooled heat sink.

Claim 12

Illuminator apparatus for the microlithographic manufacture of semiconductor integrated circuits by exposure of resist coated wafer at wavelengths of about 365 nanometers or less, said apparatus comprising: a high pressure mercury arc lamp which emits light at a variety of wavelengths; optical filter means having an entrance and an exit and being operative to remove at least wavelengths longer than about 365 nanometers from light applied to said entrance, said optical filter means including a cold mirror which traps heat producing wavelengths and is coupled to an air cooled heat sink; an elliptical reflector for collecting light emitted from said lamp and directing the collected light into the entrance of said optical filter means; housing means enclosing said lamp, said collection means and at least the entrance of said optical filter means, said housing means providing an inlet and an outlet for cooling air for said lamp; blower means for drawing air from said outlet; connected to said inlet, a composite filter which includes a bed of activated carbon for removing from air drawn into said housing volatile compounds which are photopolymerizable into substances which are absorbtive at wavelengths of about 36 nanometers or less, said composite filter including also a particulate filter between said bed and said inlet, thereby to inhibit degradation of light output from said illuminator apparatus by the photopolymerization of volatile compounds; and duct means for connecting air drawn by said blower and air passing over said heat sink to a house exhaust.

Claim 13

Illuminator apparatus for the microlithographic manufacture of semiconductor integrated circuits by exposure of resist coated wafer at wavelengths of about 365 nanometers or less, said apparatus comprising: a high pressure mercury arc lamp which emits light at a variety of wavelengths; optical filter means having an entrance and an exit and being operative to remove at least wavelengths longer than about 365 nanometers from light applied to said entrance, said optical filter means including a cold mirror which traps heat producing wavelengths and is coupled to an air cooled heat sink; an elliptical reflector for collecting light emitted from said lamp and directing the collected light into the entrance of said optical filter means; housing means enclosing said lamp, said collection means and at least the entrance of said optical filter means, said housing means providing an inlet and an outlet for cooling air for said lamp; blower means for drawing air from said outlet; connected to said inlet, a composite filter which includes a bed of activated carbon for removing from air drawn into said housing volatile compounds which are photopolymerizable into substances which are absorbtive at wavelengths of about 36 nanometers or less, said composite filter including also a particulate filter between said bed and said inlet, thereby to inhibit degradation of light output from said illuminator apparatus by the photopolymerization of volatile compounds; and duct means for connecting air drawn by said blower and air passing over said heat sink to a house exhaust.