US5160544A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Hot filament chemical vapor deposition reactor
Assignee: Morgan Chemical Products Inc
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Filing: 1990-09-06
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Granted: 1992-11-03
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Expires: 2010-09-06
Abstract
Abstract An improved hot filament chemical vapor deposition (HFCVD) reactor is disclosed comprising a gas dispersion system, a filament network and an apertured support plate for the substrate. The apertures in the support plate provide for counteracting the natural pressure and temperature gradients which arise within the reactor so that a uniform deposit or material can be coated over the entire surface of multiple small pieces simultaneously. Specifically, the apertured support plate substantially reduces the extent of radial (stagnation point) gas flow adjacent to the substrate which significantly improves coating uniformity.
Inventors
- 👤 Diwakar Garg
- 👤 Wilman Tsai
- 👤 Robert L. Iampietro
- 👤 Fred M. Kimock
- 👤 C. Michael Kelly
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 13:38
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/455; C23C16/45563; C23C16/45565; C23C16/22; C23C16/26; C23C16/27; C23C16/271; C23C16/45568; C23C16/458
Claims Analysis
Total Claims: 30
Claim 1
Independent Claim
233 words
An improved hot filament chemical vapor deposition apparatus for deposition of material on a plurality of substrates comprising: reactor wall means defining a reactor chamber; support means for supporting the plurality of substrates within said reactor chamber; inlet conduit means for introducing reactant gases into said reactor chamber on the upstream side of said support means; outlet conduit means for extracting said gases from said reactor chamber on the downstream side of said support means; dispersion means operatively connected to said inlet conduit means; said dispersion means and said support means defining a reaction zone therebetween; and heater means interposed between said dispersion means and said support means for heating and activating said reactant gases; said dispersion means having a configuration to introduce reactant gases to said reaction zone with a substantially uniform velocity; said support means having a configuration and position to substantially reduce stagnation point flow of said reactant gases adjacent to the substrates supported within said reaction zone; said support means comprising an apertured plate interposed between said dispersion means and said outlet conduit means; said apertured plate comprising a plurality of uniform apertures configured and positioned in relationship to said dispersion means and heater means to substantially reduce stagnation point flow of said reactant gases adjacent to the substrates; and said support means thereby reducing the radial flow of said gases to provide substantially uniform coating of the substrates.
Claim 2
Dependent Claim
233 words
An improved hot filament chemical vapor deposition apparatus for deposition of material on a plurality of substrates comprising: reactor wall means defining a reactor chamber; support means for supporting the plurality of substrates within said reactor chamber; inlet conduit means for introducing reactant gases into said reactor chamber on the upstream side of said support means; outlet conduit means for extracting said gases from said reactor chamber on the downstream side of said support means; dispersion means operatively connected to said inlet conduit means; said dispersion means and said support means defining a reaction zone therebetween; and heater means interposed between said dispersion means and said support means for heating and activating said reactant gases; said dispersion means having a configuration to introduce reactant gases to said reaction zone with a substantially uniform velocity; said support means having a configuration and position to substantially reduce stagnation point flow of said reactant gases adjacent to the substrates supported within said reaction zone; said support means comprising an apertured plate interposed between said dispersion means and said outlet conduit means; said apertured plate comprising a plurality of uniform apertures configured and positioned in relationship to said dispersion means and heater means to substantially reduce stagnation point flow of said reactant gases adjacent to the substrates; and said support means thereby reducing the radial flow of said gases to provide substantially uniform coating of the substrates.
Claim 3
Dependent Claim
50 words
The apparatus of claim 1 wherein said dispersion means comprises: an apertured housing operatively connected to said inlet conduit means to introduce said reactant gases to said reaction zone with a substantially uniform axial velocity; said apertured housing comprising a plurality of apertures on the downstream surface of said housing.
Claim 4
Dependent Claim
43 words
The apparatus of claim 2 wherein said apertured housing extends transversely in said reactor chamber and is oriented within said reactor chamber such that the apertured surface of said housing is perpendicular to the axis of the gas flow through said reaction zone.
Claim 5
Dependent Claim
27 words
The apparatus of claim 1 wherein said heater means comprises: a filament network of predetermined shape and configuration; said filament network being comprised of resistively heatable wire.
Claim 6
Dependent Claim
30 words
The apparatus of claim 4 wherein the distance between said filament network and the substrate on said support means is in the range of about 3 mm to 20 mm.
Claim 7
Dependent Claim
24 words
The apparatus of claim 4 wherein said wire comprises a material selected from the group consisting of tantalum, tungsten, molybdenum, rhenium, and mixtures thereof.
Claim 8
Dependent Claim
52 words
The apparatus of claim 4 wherein said filament network comprises: a composite material having a core of material selected from the group consisting of a ceramic, graphite, carbon fiber and carbon-carbon composite and an outer coating of a material selected from the group consisting of tantalum, tungsten, molybdenum, rhenium, and mixtures thereof.
Claim 9
Dependent Claim
25 words
The apparatus of claim 7 wherein the thickness of said coating on said core is in the range of about 10 micron to 2000 microns.
Claim 10
Dependent Claim
22 words
The apparatus of claim 7 wherein the diameter of said composite material is in the range of about 1.0 to 3.0 mm.
Claim 11
Dependent Claim
21 words
The apparatus of claim 4 wherein the diameter of said wire is in the range of about 0.2 to 1.5 mm.
Claim 12
Dependent Claim
52 words
The apparatus of claim 4 wherein said filament network comprises a single continuous wire configured and positioned in said network such that said wire comprises a series of bends lying substantially in a plane parallel to said support means, such that said network extends beyond the outer edge of said support means.
Claim 13
Dependent Claim
52 words
The apparatus of claim 4 wherein said filament network comprises multiple wires each of which comprises a series of bends lying substantially in a plane parallel to said support means, such that said wires conduct electric heating current in parallel between electric contacts positioned beyond the outer edge of said support means.
Claim 14
Dependent Claim
27 words
The apparatus of claim 4 wherein the cross-sectional area of said filament network is greater than the cross-sectional area of the apertured surface of said dispersion means.
Claim 15
Dependent Claim
44 words
The apparatus of claim 4 wherein said filament network extends transversely in said reaction zone and is oriented within said reaction zone such that maximum cross-sectional area of said filament network is perpendicular to the axis of the gas flow through said reaction zone.
Claim 16
Dependent Claim
30 words
The apparatus of claim 1 wherein a substrate heater means is operably mounted to the downstream side of said support means to assist in controlling the temperature of the substrate.
Claim 17
Dependent Claim
351 words
An improved hot filament chemical vapor deposition apparatus for deposition of material on a plurality of substrates comprising: reactor wall means defining a reactor chamber; support means for supporting the plurality of substrates within said reactor chamber; inlet conduit means for introducing reactant gases into said reactor chamber on the upstream side of said support means; outlet conduit means for extracting said gases from said reactor chamber on the downstream side of said support means; dispersion means operatively connected to said inlet conduit means; said dispersion means and said support means defining a reaction zone therebetween; heater means interposed between said dispersion means and said support means for heating and activating said reactant gases comprising a filament network of predetermined shape and configuration and comprised of resistively heatable wire; said dispersion means having a configuration to introduce reactant gases to said reaction zone with a substantially uniform velocity comprising an apertured housing operatively connected to said inlet conduit means to introduce said reactant gases to said reaction zone with a substantially uniform axial velocity; said apertured housing comprising a plurality of uniform apertures on the downstream surface of said housing and extending transversely in said reactor chamber and oriented within said reactor chamber such that the apertured surface of said housing is perpendicular to the axis of the gas flow through said reaction zone; and said support means having a configuration and position to substantially reduce stagnation point flow of said reactant gases adjacent to the substrates supported within said reaction zone comprising an apertured plate interposed between said dispersion means and said outlet conduit means; said apertured plate comprising a plurality of apertures configured and positioned to substantially reduce stagnation point flow of said reactant gases adjacent to the substrates thereby reducing the radial flow of said gases to provide substantially uniform coating of the substrates; and substrate heater means operably mounted on the downstream side of said support means for assisting in the control of the temperature of the substrates; said substrate heater means having apertures axially aligned with said apertures in said apertured plate of said support means.
Claim 18
Dependent Claim
351 words
An improved hot filament chemical vapor deposition apparatus for deposition of material on a plurality of substrates comprising: reactor wall means defining a reactor chamber; support means for supporting the plurality of substrates within said reactor chamber; inlet conduit means for introducing reactant gases into said reactor chamber on the upstream side of said support means; outlet conduit means for extracting said gases from said reactor chamber on the downstream side of said support means; dispersion means operatively connected to said inlet conduit means; said dispersion means and said support means defining a reaction zone therebetween; heater means interposed between said dispersion means and said support means for heating and activating said reactant gases comprising a filament network of predetermined shape and configuration and comprised of resistively heatable wire; said dispersion means having a configuration to introduce reactant gases to said reaction zone with a substantially uniform velocity comprising an apertured housing operatively connected to said inlet conduit means to introduce said reactant gases to said reaction zone with a substantially uniform axial velocity; said apertured housing comprising a plurality of uniform apertures on the downstream surface of said housing and extending transversely in said reactor chamber and oriented within said reactor chamber such that the apertured surface of said housing is perpendicular to the axis of the gas flow through said reaction zone; and said support means having a configuration and position to substantially reduce stagnation point flow of said reactant gases adjacent to the substrates supported within said reaction zone comprising an apertured plate interposed between said dispersion means and said outlet conduit means; said apertured plate comprising a plurality of apertures configured and positioned to substantially reduce stagnation point flow of said reactant gases adjacent to the substrates thereby reducing the radial flow of said gases to provide substantially uniform coating of the substrates; and substrate heater means operably mounted on the downstream side of said support means for assisting in the control of the temperature of the substrates; said substrate heater means having apertures axially aligned with said apertures in said apertured plate of said support means.
Claim 19
Dependent Claim
30 words
The apparatus of claim 16 wherein the distance between said filament network and the substrate on said support means is in the range of about 3 mm to 20 mm.
Claim 20
Dependent Claim
24 words
The apparatus of claim 16 wherein said wire comprises: a material selected from the group consisting of tantalum, tungsten, molybdenum, rhenium, and mixtures thereof.
Claim 21
Dependent Claim
52 words
The apparatus of claim 16 wherein said filament network comprises: a composite material having a core of material selected from the group consisting of a ceramic, graphite, carbon fiber and carbon-carbon composite and an outer coating of a material selected from the group consisting of tantalum, tungsten, molybdenum, rhenium, and mixtures thereof.
Claim 22
Dependent Claim
25 words
The apparatus of claim 19 wherein the thickness of said coating on said core is in the range of about 10 micron to 2000 microns.
Claim 23
Dependent Claim
22 words
The apparatus of claim 19 wherein the diameter of said composite material is in the range of about 1.0 to 3.0 mm.
Claim 24
Dependent Claim
21 words
The apparatus of claim 16 wherein the diameter of said wire is in the range of about 0.2 to 1.5 mm.
Claim 25
Dependent Claim
52 words
The apparatus of claim 16 wherein said filament network comprises a single continuous wire configured and positioned in said network such that said wire comprises a series of bends lying substantially in a plane parallel to said support means, such that said network extends beyond the outer edge of said support means.
Claim 26
Dependent Claim
52 words
The apparatus of claim 16 wherein said filament network comprises multiple wires each of which comprises a series of bends lying substantially in a plane parallel to said support means, such that said wires conduct electric heating current in parallel between electric contacts positioned beyond the outer edge of said support means.
Claim 27
Dependent Claim
27 words
The apparatus of claim 16 wherein the cross-sectional area of said filament network is greater than the cross-sectional area of said apertured surface of said dispersion means.
Claim 28
Dependent Claim
44 words
The apparatus of claim 16 wherein said filament network extends transversely in said reaction zone and is oriented within said reaction zone such that maximum cross-sectional area of said filament network is perpendicular to the axis of the gas flow through said reaction zone.
Claim 29
Dependent Claim
17 words
The apparatus of claim 16 wherein said apertured housing contains a finely dispersed, inert solid packing material.
Claim 30
Dependent Claim
48 words
The apparatus of claim 16 wherein said apertured housing contains a finely dispersed, inert solid packing material selected from the group consisting of glass wool, stainless steel wool, glass beads, ceramic beads and mixtures thereof supported on the downstream side by a ceramic or stainless steel wire mesh.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-11-03 | 1996-05-04 | 1996-11-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-11-03 | 2000-05-04 | 2000-11-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-11-03 | 2004-05-04 | 2004-11-03 | $7700.00 | Window Closed / Lapsed |