Manufacture of a suspended micromechanical element

Claim 2

A process for making a micromechanical device on a member comprising: providing a member having a first generally planar surface and a second generally planar surface extending generally parallel to said first generally planar surface, wall means extending between and joining said first and second generally planar surfaces, said wall means having a generally concave surface, forming a first sacrificial layer on said wall means and at least a portion of said first generally planar surface, forming a second sacrificial layer on top of said first sacrificial layer and on at least a portion of said second generally planar surface so the second sacrificial layer on said second generally planar surface is thinner than the combined first and second sacrificial layers on said first generally planar surface, forming a structural layer on top of at least a portion of said second sacrificial layer, and patterning said structural layer to form a moving structure for movement relative to said member and exposing portions of said sacrificial layer, and etching and removing said first and second sacrificial layers to release said moving structure from said member and providing relative movement between said moving structure and said member, whereby said moving structure is spaced from said first generally planar surface and contacts said second generally planar surface.

Claim 3

The process of claim 1, wherein: said first sacrificial layer is formed by being grown on said wall means and at least a portion of said first generally planar surface, and said second sacrificial layer is formed by being deposited onto the top of said first sacrificial layer and said second generally planar surface.

Claim 4

The process of claim 2, wherein: the member is a silicon wafer, the portion between said first and second generally planar surfaces is polysilicon, said second generally planar surface is nitride, said first sacrificial layer is oxide, and said second sacrificial layer is oxide deposited by the TEOS process.

Claim 5

The process of claim 3, wherein said first generally planar surface is nitride.

Claim 6

The process of claim 1, wherein said wall means is on a structure protruding from said first generally planar surface and said second generally planar surface is on the protruding structure.

Claim 7

The process of claim 5, wherein said wall means is annular and said structural layer has an annular recessed cavity receiving said protruding structure.

Claim 8

The process of claim 5, wherein said protruding structure is elongated and said structural layer has a slot receiving said protruding structure.

Claim 9

The process of claim 1, wherein said wall means and said first generally planar surface defines a depression and said second generally planar surface surrounds the depression.

Claim 10

The process of claim 8, wherein said wall means is annular.

Claim 11

The process of claim 8, wherein said wall means is elongated.

Claim 12

The process of claim 1, wherein said first sacrificial layer comprises one of silicon oxide or silicon nitride and said structural layer comprises one of polysilicon, silicon nitride, metal silicide, or metal.

Claim 13

A process for making a micromechanical device on a member comprising: providing a member having a first generally planar surface; masking and etching said first generally planar surface and said member to expose at least a second generally planar surface of said member and to form a structure with at least one wall means protruding from said second generally planar surface of said member; forming bumper means into said wall means of said protruding structure and forming a convexo-concave relationship with said wall means; etching said bumper means to remove the same from said wall means of said protruding structure while retaining the concave surface of said wall means; forming a first sacrificial layer on said wall means and at least a portion of said second generally planar surface of said member; forming a second sacrificial layer on top of said first sacrificial layer and on at least a portion of said first generally planar surface so the second sacrificial layer on said first generally planar surface is thinner than the combined first and second sacrificial layers on said second generally planar surface; forming a structural layer on at least a portion of said second sacrificial layer; patterning said structural layer to form a moving structure for movement relative to said protruding structure and exposing portions of said sacrificial layers; and etching and removing said first and second sacrificial layers to release said moving structure from said protruding structure and providing relative movement between said moving structure and said protruding structure, whereby said moving structure is spaced from said second generally planar surface and contacts said first generally planar surface.

Claim 14

A process for making a micromechanical device on a member comprising: providing a member having a first generally planar surface; masking and etching said first generally planar surface and said member to expose at least a second generally planar surface of said member and to form a structure with at least one wall means protruding from said second generally planar surface of said member; forming bumper means into said wall means of said protruding structure and forming a convexo-concave relationship with said wall means; etching said bumper means to remove the same from said wall means of said protruding structure while retaining the concave surface of said wall means; forming a first sacrificial layer on said wall means and at least a portion of said second generally planar surface of said member; forming a second sacrificial layer on top of said first sacrificial layer and on at least a portion of said first generally planar surface so the second sacrificial layer on said first generally planar surface is thinner than the combined first and second sacrificial layers on said second generally planar surface; forming a structural layer on at least a portion of said second sacrificial layer; patterning said structural layer to form a moving structure for movement relative to said protruding structure and exposing portions of said sacrificial layers; and etching and removing said first and second sacrificial layers to release said moving structure from said protruding structure and providing relative movement between said moving structure and said protruding structure, whereby said moving structure is spaced from said second generally planar surface and contacts said first generally planar surface.

Claim 15

The process of claim 12, wherein: said member is a silicon wafer, said bumper means is oxide, the portion between said first and second generally planar surfaces is polysilicon, said first generally planar surface is nitride, said first sacrificial layer is oxide, and said second sacrificial layer is oxide deposited by the TEOS process.

Claim 16

The process of claim 13, wherein said second generally planar surface is nitride.

Claim 17

The process of claim 12, wherein said wall means is annular and said structural layer has an annular recessed cavity receiving said protruding structure.

Claim 18

The process of claim 12, wherein said protruding structure is elongated and said wall means is elongated said structural layer has a slot receiving said protruding structure.

Claim 19

A process for making a micromechanical device on a member comprising: providing a member having a first generally planar surface; masking and etching said first generally planar surface and said member to expose a second generally planar surface of said member and to form a depression in said member which is defined by wall means and said second generally planar surface; forming bumper means into said wall means of said depression and forming a convexo-concave relationship with said wall means; etching said bumper means to remove the same from said wall means of said depression while retaining the concave surface of said wall means; forming a first sacrificial layer on said wall means and at least a portion of said second generally planar surface of said member; forming a second sacrificial layer on top of said first sacrificial layer and onto at least a portion of said first generally planar surface so the second sacrificial layer on said first generally planar surface is thinner than the combined first and second sacrificial layers on said second generally planar surface; forming a structural layer on at least a portion of said second sacrificial layer; patterning said structural layer to form a moving structure for movement relative to the structure forming said depression and exposing portions of said sacrificial layers; and etching and removing said first and second sacrificial layers to release said moving structure from the structure forming said depression and providing relative movement between said moving structure and the structure forming said depression, whereby said moving structure is spaced from said second generally planar surface and contacts said first generally planar surface.

Claim 20

A process for making a micromechanical device on a member comprising: providing a member having a first generally planar surface; masking and etching said first generally planar surface and said member to expose a second generally planar surface of said member and to form a depression in said member which is defined by wall means and said second generally planar surface; forming bumper means into said wall means of said depression and forming a convexo-concave relationship with said wall means; etching said bumper means to remove the same from said wall means of said depression while retaining the concave surface of said wall means; forming a first sacrificial layer on said wall means and at least a portion of said second generally planar surface of said member; forming a second sacrificial layer on top of said first sacrificial layer and onto at least a portion of said first generally planar surface so the second sacrificial layer on said first generally planar surface is thinner than the combined first and second sacrificial layers on said second generally planar surface; forming a structural layer on at least a portion of said second sacrificial layer; patterning said structural layer to form a moving structure for movement relative to the structure forming said depression and exposing portions of said sacrificial layers; and etching and removing said first and second sacrificial layers to release said moving structure from the structure forming said depression and providing relative movement between said moving structure and the structure forming said depression, whereby said moving structure is spaced from said second generally planar surface and contacts said first generally planar surface.

Claim 21

The process of claim 17, wherein: said member is a silicon wafer, said bumper means is oxide, the portion between said first and second generally planar surfaces is polysilicon, said first generally planar surface is nitride, said first sacrificial layer is oxide, and said second sacrificial layer is oxide deposited by the TEOS process.

Claim 22

The process of claim 18, wherein said second generally planar surface is nitride.

Claim 23

The process of claim 19, wherein said wall means is annular.

Claim 24

The process of claim 19, wherein said wall means is elongated.