US5149378A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Tungsten film forming apparatus
Assignee: HASHIMOTO KASEI KABUSHIKI-KAISYA
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Filing: 1990-04-04
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Granted: 1992-09-22
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Expires: 2010-04-04
Abstract
Abstract A tungsten film forming apparatus includes a reaction chamber, means for introducing WF 6 into said reaction chamber, and means for introducing H 2 gas into said reaction chamber, wherein at least the portion of at least said reaction chamber is made of the metal material whose surface is covered with the fluorinated paasivation film mainly consisting of the almost stoichiometric metal fluoride. It becomes possible to form a high quality tungsten film at a low substrate temperature by use of said tungsten film forming apparatus.
Inventors
- 👤 Tadahiro Ohmi
- 👤 Nobuhiro Miki
- 👤 Matagoroh Maeno
- 👤 Hirohisa Kikuyama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 05:42
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/40; H10P14/42; H10P14/43; C; C23; C23C; C23C16/00; C23C16/06; C23C16/08; C23C16/14; C23C16/44; C23C16/4401; C23C16/4402; C23C16/4404
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
84 words
A tungsten film forming apparatus comprising a reaction chamber, means for introducing WF 6 gas to said reaction chamber and including a container of WF 6 gas, and means for introducing H 2 gas to said reaction chamber and including a container of H 2 gas, wherein at least the portion of said reaction chamber which is to be in contact with WF 6 is made of a metal material having a fluorinated passivation film comprising a substantially stoichiometric metal fluoride on the surface.
Claim 2
Dependent Claim
84 words
A tungsten film forming apparatus comprising a reaction chamber, means for introducing WF 6 gas to said reaction chamber and including a container of WF 6 gas, and means for introducing H 2 gas to said reaction chamber and including a container of H 2 gas, wherein at least the portion of said reaction chamber which is to be in contact with WF 6 is made of a metal material having a fluorinated passivation film comprising a substantially stoichiometric metal fluoride on the surface.
Claim 3
Dependent Claim
20 words
A tungsten film forming apparatus according to claim 1 including means for introducing F 2 gas to said reaction chamber.
Claim 4
Dependent Claim
44 words
A tungsten film forming apparatus according to claim 1 wherein at least the portion of said WF 6 introducing means which is to be in contact with WF 6 gas is made of a stainless steel having an oxidized passivation film on the surface.
Claim 5
Dependent Claim
50 words
A tungsten film forming apparatus according to claim 1 wherein at least the portion of said WF 6 gas introducing means which is to be in contact with WF 6 is made of the metal materials having the fluorinated passivation film comprising a substantially stoichiometric metal fluoride on the surface.
Claim 6
Dependent Claim
43 words
A tungsten film forming apparatus according to claim 2 wherein at least the portion of a F 2 introducing means which is to be in contact with F 2 is made of a stainless steel having the oxidized passivation film on the surface.
Claim 7
Dependent Claim
49 words
A tungsten film forming apparatus according to claim 2 wherein at least the portion of the F 2 introducing means which is to be in contact with F 2 is made of a metal material having the fluorinated passivation film comprising a substantially stoichiometric metal fluoride on the surface.
Claim 8
Dependent Claim
38 words
A tungsten film forming apparatus according to claim 1 including valves, regulators and/or filters, wherein the portion to be in contact with flowing gases is made of a stainless steel having the oxidation passivation film on the surface.
Claim 9
Dependent Claim
43 words
A tungsten film forming apparatus according to claim 1 including valves, regulators and/or filters, wherein the portion to be in contact with flowing gases is made of metal materials having the fluorinated passivation film comprising a substantially stoichiometric metal fluoride on the surface.
Claim 10
Dependent Claim
19 words
A tungsten film forming apparatus according to claim 2 including means for heating the whole of said reaction chamber.
Claim 11
Dependent Claim
27 words
A tungsten film forming apparatus according to claim 1 wherein the fluorinated passivation film is formed on the surface having a flatness R max of 0.03-1.0 μm
Claim 12
Dependent Claim
32 words
A tungsten film forming apparatus according to claim 1 wherein metal materials are stainless steel, nickel, nickel alloy, aluminum, aluminum alloy, copper, copper alloy, chromium, cobalt, cobalt alloy, titan, and titan alloy.
Claim 13
Dependent Claim
30 words
A tungsten film forming apparatus according to claim 1 wherein a surface flatness R max is in the range from 0.03-1.0 μm within any circle having radius of 5 μm.
Claim 14
Dependent Claim
44 words
A tungsten film forming apparatus according to claim 2 wherein at least the portion of said WF 6 introducing means which is to be in contact with WF 6 gas is made of a stainless steel having an oxidized passivation film on the surface.
Claim 15
Dependent Claim
50 words
A tungsten film forming apparatus according to claim 2 wherein at least the portion of said WF 6 gas introducing means which is to be in contact with WF 6 is made of the metal materials having the fluorinated passivation film comprising a substantially stoichiometric metal fluoride on the surface.
Claim 16
Dependent Claim
38 words
A tungsten film forming apparatus according to claim 6 including valves, regulators and/or filters, wherein the portion to be in contact with flowing gases is made of a stainless steel having the oxidation passivation film on the surface.
Claim 17
Dependent Claim
43 words
A tungsten film forming apparatus according to claim 6 including valves, regulators and/or filters, wherein the portion to be in contact with flowing gases is made of metal materials having the fluorinated passivation film comprising a substantially stoichiometric metal fluoride on the surface.
Claim 18
Dependent Claim
19 words
A tungsten film forming apparatus according to claim 8 including means for heating the whole of said reaction chamber.
Claim 19
Dependent Claim
27 words
A tungsten film forming apparatus according to claim 4 wherein the fluorinated passivation film is formed on the surface having a flatness R max of 0.03-1.0 μm
Claim 20
Dependent Claim
32 words
A tungsten film forming apparatus according to claim 4 wherein metal materials are stainless steel, nickel, nickel alloy, aluminum, aluminum alloy, copper, copper alloy, chromium, cobalt, cobalt alloy, titan, and titan alloy.
Claim 21
Dependent Claim
30 words
A tungsten film forming apparatus according to claim 4 wherein a surface flatness R max is in the range from 0.03-1.0 μm within any circle having radius of 5 μm.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-09-22 | 1996-03-23 | 1996-09-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-09-22 | 2000-03-23 | 2000-09-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-09-22 | 2004-03-23 | 2004-09-22 | $7700.00 | Window Closed / Lapsed |