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US5146308A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor package utilizing edge connected semiconductor dice

Assignee: Round Rock Research LLC
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Filing: 1990-10-05
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Granted: 1992-09-08
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Expires: 2010-10-05
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Abstract

Abstract Die bond locations on a semiconductor die are formed as vertical inserts along the edge of the die. The vertical inserts are isolated from substrate and are exposed by a wafer saw process, in which dice are singulated from a wafer. The configuration offers the advantages of a more efficient layout, allowing the entire top surface of the die to be passivated, a better contact configuration, and more convenient assembly for packaging.

Inventors

  • 👤 Randal W. Chance
  • 👤 Eugene H. Cloud

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-03 20:04
CPC Classifications
H; H10; H10W; H10W72/00; H10W72/90; H10W90/00; H10W72/50; H10W72/541; H10W72/5449; H10W72/551; H10W72/552; H10W72/5522; H10W72/59; H10W72/60; H10W72/834; H10W72/941; H10W90/701; H10W90/751; H10W90/754; H10W90/756; H10W90/791; H10W90/794

Claims Analysis

Total Claims: 18
Claim 1
Independent Claim 194 words
Semiconductor integrated circuit apparatus comprising: a) a supporting substrate having a top surface; b) a plurality of semiconductor dies mounted to said supporting substrate, each of the plurality of semiconductor dies having at least one exposed edge, the plurality of semiconductor dies being mounted to said supporting substrate such that said exposed edge on each die abuts the top surface of the supporting substrate; c) the semiconductor dies each having a semiconductor substrate and circuitry within the die; d) a plurality of depressions in said semiconductor dies, the depressions extending to the exposed edge; e) the semiconductor substrate being a first conductivity type; f) one or more wells in said substrate of a second conductivity type, said depressions being within said wells; g) bond pads disposed within said depressions, the bond pads being connected to said circuitry within the die to form bond pad locations for external electrical connection to the semiconductor dies; h) a first group of contacts on said supporting substrate, contacting said bond pads, and thereby establishing connections to said circuitry within the die; and i) the supporting substrate establishing electrical contact with the bond locations formed along said exposed edge.
Claim 2
Dependent Claim 194 words
Semiconductor integrated circuit apparatus comprising: a) a supporting substrate having a top surface; b) a plurality of semiconductor dies mounted to said supporting substrate, each of the plurality of semiconductor dies having at least one exposed edge, the plurality of semiconductor dies being mounted to said supporting substrate such that said exposed edge on each die abuts the top surface of the supporting substrate; c) the semiconductor dies each having a semiconductor substrate and circuitry within the die; d) a plurality of depressions in said semiconductor dies, the depressions extending to the exposed edge; e) the semiconductor substrate being a first conductivity type; f) one or more wells in said substrate of a second conductivity type, said depressions being within said wells; g) bond pads disposed within said depressions, the bond pads being connected to said circuitry within the die to form bond pad locations for external electrical connection to the semiconductor dies; h) a first group of contacts on said supporting substrate, contacting said bond pads, and thereby establishing connections to said circuitry within the die; and i) the supporting substrate establishing electrical contact with the bond locations formed along said exposed edge.
Claim 3
Dependent Claim 36 words
Semiconductor integrated circuit apparatus of claim 1, further comprising: said depressions being formed to extend into the semiconductor dies more than 1/500 the thickness of the substrate, but less than 1/2 the thickness of the substrate.
Claim 4
Dependent Claim 37 words
Semiconductor integrated circuit apparatus of claim 1, further comprising: said depressions being formed to extend into the semiconductor dies more than 1/100 the thickness of the substrate, but less than about 1/5 the thickness of the substrate.
Claim 5
Dependent Claim 22 words
The semiconductor integrated circuit apparatus of claim 1, wherein said first conductivity type is p and said second conductivity type is n.
Claim 6
Dependent Claim 30 words
Semiconductor integrated circuit apparatus of claim 1, further comprising: a) a resistor, the resistor including substrate material within one of said wells; and b) said depressions being within said wells.
Claim 7
Dependent Claim 36 words
Semiconductor integrated circuit apparatus of claim 5, wherein: a) said material within one of said wells being a second conductivity type; and b) said first conductivity type is p and said second conductivity type is n.
Claim 8
Dependent Claim 48 words
Semiconductor integrated circuit apparatus of claim 1, further comprising: a) a layer of polysilicon in at least one of said depressions between the substrate and the bond pad located within said depression and above said layer of polysilicon; and b) said polysilicon being doped to a predetermined level.
Claim 9
Dependent Claim 31 words
Semiconductor integrated circuit apparatus of claim 1, further comprising: a layer of dielectric in at least one of said depressions between the substrate and the bond pad located within said recess.
Claim 10
Dependent Claim 204 words
Semiconductor integrated circuit apparatus comprising: a) a supporting substrate having a top surface; b) a plurality of semiconductor dies mounted to said supporting substrate, each of the plurality of semiconductor dies having at least one exposed edge, the plurality of semiconductor dies being mounted to said supporting substrate such that said exposed edge on each die abuts the top surface of the supporting substrate; c) the semiconductor dies each having a semiconductor substrate and circuitry within the die; d) a plurality of depressions in said semiconductor dies, the depressions extending to the exposed edge; e) bond pads disposed within said depressions, the bond pads being connected to said circuitry within the die to form bond pad locations for external electrical connection to the semiconductor dies; f) a first group of contacts on said supporting substrate, contacting said bond pads, and thereby establishing connections to said circuitry within the die; g) the supporting substrate establishing electrical contact with the bond locations formed along said exposed edge; h) a layer of polysilicon in at least one of said depressions between the substrate and the bond pad located within said depression and above said layer of polysilicon; and i) said polysilicon being doped to a predetermined level.
Claim 11
Dependent Claim 204 words
Semiconductor integrated circuit apparatus comprising: a) a supporting substrate having a top surface; b) a plurality of semiconductor dies mounted to said supporting substrate, each of the plurality of semiconductor dies having at least one exposed edge, the plurality of semiconductor dies being mounted to said supporting substrate such that said exposed edge on each die abuts the top surface of the supporting substrate; c) the semiconductor dies each having a semiconductor substrate and circuitry within the die; d) a plurality of depressions in said semiconductor dies, the depressions extending to the exposed edge; e) bond pads disposed within said depressions, the bond pads being connected to said circuitry within the die to form bond pad locations for external electrical connection to the semiconductor dies; f) a first group of contacts on said supporting substrate, contacting said bond pads, and thereby establishing connections to said circuitry within the die; g) the supporting substrate establishing electrical contact with the bond locations formed along said exposed edge; h) a layer of polysilicon in at least one of said depressions between the substrate and the bond pad located within said depression and above said layer of polysilicon; and i) said polysilicon being doped to a predetermined level.
Claim 12
Dependent Claim 36 words
Semiconductor integrated circuit apparatus of claim 9, further comprising: said depressions being formed to extend into the semiconductor dies more than 1/500 the thickness of the substrate, but less than 1/2 the thickness of the substrate.
Claim 13
Dependent Claim 36 words
Semiconductor integrated circuit apparatus of claim 9, further comprising: said depressions being formed to extend into the semiconductor dies more than 1/100 the thickness of the substrate, but less than 1/5 the thickness of the substrate.
Claim 14
Dependent Claim 31 words
Semiconductor integrated circuit apparatus of claim 9, further comprising: a layer of dielectric in at least one of said depressions between the substrate and the bond pad located within said recess.
Claim 15
Dependent Claim 189 words
Semiconductor integrated circuit apparatus comprising: a) a supporting substrate having a top surface; b) a plurality of semiconductor dies mounted to said supporting substrate, each of the plurality of semiconductor dies having at least one exposed edge, the plurality of semiconductor dies being mounted to said supporting substrate such that said exposed edge on each die abuts the top surface of the supporting substrate; c) the semiconductor dies each having a semiconductor substrate and circuitry within the die; d) a plurality of depressions in said semiconductor dies, the depressions extending to the exposed edge; e) bond pads disposed within said depressions, the bond pads being connected to said circuitry within the die to form bond pad locations for external electrical connection to the semiconductor dies; f) a layer of dielectric in at least one of said depressions between the substrate and the bond pad located within said recess; g) a first group of contacts on said supporting substrate, contacting said bond pads, and thereby establishing connections to said circuitry within the die; and h) the supporting substrate establishing electrical contact with the bond locations formed along said exposed edge.
Claim 16
Dependent Claim 189 words
Semiconductor integrated circuit apparatus comprising: a) a supporting substrate having a top surface; b) a plurality of semiconductor dies mounted to said supporting substrate, each of the plurality of semiconductor dies having at least one exposed edge, the plurality of semiconductor dies being mounted to said supporting substrate such that said exposed edge on each die abuts the top surface of the supporting substrate; c) the semiconductor dies each having a semiconductor substrate and circuitry within the die; d) a plurality of depressions in said semiconductor dies, the depressions extending to the exposed edge; e) bond pads disposed within said depressions, the bond pads being connected to said circuitry within the die to form bond pad locations for external electrical connection to the semiconductor dies; f) a layer of dielectric in at least one of said depressions between the substrate and the bond pad located within said recess; g) a first group of contacts on said supporting substrate, contacting said bond pads, and thereby establishing connections to said circuitry within the die; and h) the supporting substrate establishing electrical contact with the bond locations formed along said exposed edge.
Claim 17
Dependent Claim 36 words
Semiconductor integrated circuit apparatus of claim 13, further comprising: said depressions being formed to extend into the semiconductor dies more than 1/500 the thickness of the substrate, but less than 1/2 the thickness of the substrate.
Claim 18
Dependent Claim 36 words
Semiconductor integrated circuit apparatus of claim 13, further comprising: said depressions being formed to extend into the semiconductor dies more than 1/100 the thickness of the substrate, but less than 1/5 the thickness of the substrate.

References Cited (Backward Citations)

US3492536A Cited
JPS5258468A Cited
JPS5671926A Cited
US4697204A Cited
JPS6188547A Cited
JPS6278859A Cited
JPS63143A Cited
US4922378A Cited
JPS63208252A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1995-09-08 1996-03-09 1996-09-08 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1999-09-08 2000-03-09 2000-09-08 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2003-09-08 2004-03-09 2004-09-08 $7700.00 Window Closed / Lapsed

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