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US5138410A Expired / Lapsed US ⏱️ 0.0 years remaining

Nonvolatile semiconductor memory device having tunnel insulating film structure

Assignee: Toshiba Corp
•
Filing: 1990-12-06
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Granted: 1992-08-11
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Expires: 2010-12-06
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Abstract

Abstract For improving endurance and retention characteristics of a nonvolatile semiconductor memory device that comprises a semiconductor substrate having source and drain regions therein, a floating gate provided above the semiconductor substrate through a first gate insulating film, a control gate provided above the flosting gate through a second gate insulating film, and a tunnel region provided in the first gate insulating film, an aperture is provided in the first gate insulating film so as to reach the semiconductor substrate, thereby defining the tunnel region therewith, and a tunnel insulating layer including at least one silicon nitride film is provided within the aperture.

Inventors

  • 👤 Masataka Takebuchi

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 03:07
CPC Classifications
H; H10; H10D; H10D30/00; H10D30/60; H10D30/68; H10D30/681; H10D30/683; H10D64/00; H10D64/60; H10D64/66; H10D64/68; H10D64/681; H10D64/685; H10D64/693

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 91 words
A nonvolatile semiconductor memory device comprising: a semiconductor substrate having source and drain regions therein; a floating gate provided above said semiconductor substrate through a first gate insulating film; a control gate provided above said floating gate through a second gate insulating film; and a tunnel region provided in said first gate insulating film, said tunnel region including a tunnel insulating film formed of a silicon nitride film directly in contact with said semiconductor substrate and a silicon oxide film, said silicon nitride film being thicker than said silicon oxide film.
Claim 2
Dependent Claim 91 words
A nonvolatile semiconductor memory device comprising: a semiconductor substrate having source and drain regions therein; a floating gate provided above said semiconductor substrate through a first gate insulating film; a control gate provided above said floating gate through a second gate insulating film; and a tunnel region provided in said first gate insulating film, said tunnel region including a tunnel insulating film formed of a silicon nitride film directly in contact with said semiconductor substrate and a silicon oxide film, said silicon nitride film being thicker than said silicon oxide film.
Claim 3
Dependent Claim 22 words
The device according to claim 1, wherein said tunnel insulating film has a multilayer structure including at least one silicon nitride film.
Claim 4
Dependent Claim 26 words
The device according to claim 2, wherein said multilayer structure includes at least one silicon nitride film and at least one silicon oxide film alternately stacked.
Claim 5
Dependent Claim 36 words
The device according to claim 1, wherein a thickness of said silicon nitride film is given by 70 to 155 Å, while a thickness of said silicon oxide film is given by 10 to 70 Å.
Claim 6
Dependent Claim 19 words
The device according to claim 3, wherein said silicon nitride film is directly in contact with said semiconductor substrate.
Claim 7
Dependent Claim 20 words
The device according to claim 1, wherein a select gate is provided through an insulating film above said semiconductor substrate.
Claim 8
Dependent Claim 23 words
The device according to claim 6, wherein said insulating film is comprised of said first gate insulating film and said tunnel insulating film.

References Cited (Backward Citations)

JPS61147576A Cited
JPS62266872A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1995-08-11 1996-02-10 1996-08-11 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1999-08-11 2000-02-10 2000-08-11 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2003-08-11 2004-02-10 2004-08-11 $7700.00 Window Closed / Lapsed

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