US5136167A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Electron beam lens and deflection system for plural-level telecentric deflection
Assignee: GlobalFoundries Inc
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Filing: 1991-01-07
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Granted: 1992-08-04
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Expires: 2011-01-07
Abstract
Abstract A charged particle beam deflection system provides a three or more level charged particle beam deflection arrangement and is therefore capable of extremely high speed and positional accuracy. The system preferably employs a major/minor magnetic deflection arrangement as well as orthogonal electrostatic deflectors at a level of speed and positional accuracy and which minimizes the need for dynamic correction to achieve high linearity and positioning accuracy at extremely low aberration levels. The system can also be made relatively noise insensitive by providing one or more split deflectors which are also useful in providing increased speed and adjustment of radial and azimuthal telecentricity. The use of a transfer lens allows the cluster and subfield deflectors to be optimally placed to exploit different forms of LAD to obtain telecentricity at all levels of the deflection hierarchy. The use of such lens assisted deflection allows the electron optical system and drivers therefor to be minimized in number or enabled noise to be reduced and adjustments of telecentricity to be made without increase of complexity over the prior art. By employing the deflection arrangement of the present invention in electron beam lithography apparatus, the throughput of such apparatus can be greatly improved.
Inventors
- 👤 Guenther O. Langner
- 👤 Paul F. Petric
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 18:02
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/02; H01J37/04; H01J37/147; H01J37/1472; H01J37/30; H01J37/3002; H01J37/3007; H01J2237/00; H01J2237/10; H01J2237/30; H01J2237/317; H01J2237/3175
Claims Analysis
Total Claims: 38
Claim 1
Independent Claim
60 words
A charged particle beam deflection apparatus including a transfer lens means for imaging a demagnified spot image at a predetermined plane, a collimator lens having a back focal plane coincident with said predetermined plane, and at least one deflector means having a virtual deflection center located between said back focal plane of said collimator lens and said transfer lens means.
Claim 2
Dependent Claim
60 words
A charged particle beam deflection apparatus including a transfer lens means for imaging a demagnified spot image at a predetermined plane, a collimator lens having a back focal plane coincident with said predetermined plane, and at least one deflector means having a virtual deflection center located between said back focal plane of said collimator lens and said transfer lens means.
Claim 3
Dependent Claim
27 words
A charged particle beam deflection apparatus as recited in claim 1, further including an additional deflector means located at said back focal plane of said collimator lens.
Claim 4
Dependent Claim
49 words
A charged particle beam defection apparatus as recited in claim 2, further including a projection lens having a back focal plane wherein said additional deflector means is located in relation to said collimator lens at a point which is conjugate to said back focal plane of said projection lens.
Claim 5
Dependent Claim
25 words
A charged particle beam deflection apparatus as recited in claim 3, including a further deflection means located between said collimator lens and said projection lens.
Claim 6
Dependent Claim
51 words
A charged particle beam deflection apparatus as recited in claim 1, further including a projection lens having a back focal plane wherein said at least one deflector means is located in relation to said collimator lens at a point which is conjugate to said back focal plane of said projection lens.
Claim 7
Dependent Claim
25 words
A charged particle beam deflection apparatus as recited in claim 5, including a further deflection means located between said collimator lens and said projection means.
Claim 8
Dependent Claim
54 words
A charged particle beam deflection apparatus as recited in claim 1, wherein said at least one deflector means is formed as a plurality of partial deflector means, said partial deflector means being individually positionable with respect to each other and with respect to an electron optical axis of said charged particle beam deflection apparatus.
Claim 9
Dependent Claim
42 words
A charged particle beam deflection apparatus as recited in claim 7, wherein at least two of said partial deflector means each include separate driver means and said at least two partial deflector means are independently driven by said separate partial driver means.
Claim 10
Dependent Claim
50 words
A charged particle beam deflection apparatus having a first lens means for imaging a demagnified spot image at a predetermined plane and at least one second lens means wherein said first lens means includes means for at least focussing an image formed by said at least one second lens means.
Claim 11
Dependent Claim
50 words
A charged particle beam deflection apparatus having a first lens means for imaging a demagnified spot image at a predetermined plane and at least one second lens means wherein said first lens means includes means for at least focussing an image formed by said at least one second lens means.
Claim 12
Dependent Claim
30 words
A charged particle beam deflection apparatus as recited in claim 9, wherein said first lens means includes means for correcting astigmatism in the image formed by said second lens means.
Claim 13
Independent Claim
56 words
A method of deflecting a charged particle in a charged particle deflection apparatus having a collimator lens means, a projection lens means and at least one deflector means, including the step of deflecting a path of a charged particle by static operation of at least one of said collimator lens means and said projection lens means.
Claim 14
Independent Claim
56 words
A method of deflecting a charged particle in a charged particle deflection apparatus having a collimator lens means, a projection lens means and at least one deflector means, including the step of deflecting a path of a charged particle by static operation of at least one of said collimator lens means and said projection lens means.
Claim 15
Dependent Claim
69 words
A method as recited in claim 11, including the further step of deflecting said charged particle by said at least one deflector means and wherein said step of deflecting said charged particle by static operation of at least one of said collimator lens means and said projection lens means produces a deflection which is substantially complementary to a deflection produced by said further step of deflecting said charged particle.
Claim 16
Dependent Claim
47 words
A method as recited in claim 12, including the further step of adjusting said collimator lens means to return said path of said charged particle to telecentric orientation after said deflection of said charged particle by said further step of deflecting said path of said charged particle.
Claim 17
Dependent Claim
79 words
A method as recited in claim 12, wherein said projection lens has a variable axis and wherein said collimator lens means deflects said path of said charged particle to traverse a back focal plane of said projection lens means at the location of said variable axis and said projection lens returns said path of said charged particle to telecentric orientation after said deflection of said charged particle by said further step of deflecting said path of said charged particle.
Claim 18
Dependent Claim
58 words
An electron beam lithography apparatus including a transfer lens means for imaging a demagnified spot image at a predetermined plane, a collimator lens having a back focal plane coincident with said predetermined plane, and at least one deflector means having a virtual deflection center located between said back focal plane of collimator lens and said transfer leans means.
Claim 19
Dependent Claim
58 words
An electron beam lithography apparatus including a transfer lens means for imaging a demagnified spot image at a predetermined plane, a collimator lens having a back focal plane coincident with said predetermined plane, and at least one deflector means having a virtual deflection center located between said back focal plane of collimator lens and said transfer leans means.
Claim 20
Dependent Claim
26 words
An electron beam lithography apparatus as recited in claim 15, further including an additional deflector means located at said back focal plane of said collimator lens.
Claim 21
Dependent Claim
48 words
An electron beam lithography apparatus as recited in claim 16, further including a projection lens having a back focal plane wherein said additional deflector means is located in relation to said collimator lens at a point which is conjugate to said back focal plane of said projection lens.
Claim 22
Dependent Claim
24 words
An electron beam lithography apparatus as recited in claim 17, including a further deflection means located between said collimator lens and said projection lens.
Claim 23
Dependent Claim
24 words
An electron beam lithography apparatus as recited in claim 17, including a further deflection means located between said collimator lens and said projection means.
Claim 24
Dependent Claim
50 words
An electron beam lithography apparatus as recited in claim 15, further including a projection lens having a back focal plane wherein said at least one deflector means is located in relation to said collimator lens at a point which is conjugate to said back focal plane of said projection lens.
Claim 25
Dependent Claim
24 words
A electron beam lithography apparatus as recited in claim 20, including a further deflection means located between said collimator lens and said projection means.
Claim 26
Dependent Claim
53 words
An electron beam lithography apparatus as recited in claim 15, wherein said at least one deflector means is formed as a plurality of partial deflector means, said partial deflector means being individually positionable with respect to each other and with respect to an electron optical axis of said charged particle beam deflection apparatus.
Claim 27
Dependent Claim
41 words
An electron beam lithography apparatus as recited in claim 22, wherein at least two of said partial deflector means each include separate driver means and said at least two partial deflector means are independently driven by said separate partial driver means.
Claim 28
Dependent Claim
93 words
A charged particle beam deflection apparatus including a transfer lens means for imaging a demagnified spot image at a predetermined plane, a collimator lens having a back focal plane coincident with said predetermined plane, at least one deflector means having a virtual deflection center located between said collimator lens and said transfer lens means, and a projection lens having a back focal plane wherein said at least one deflector means is located in relation to said collimator lens at a point which is conjugate to said back focal plane of said projection lens.
Claim 29
Dependent Claim
93 words
A charged particle beam deflection apparatus including a transfer lens means for imaging a demagnified spot image at a predetermined plane, a collimator lens having a back focal plane coincident with said predetermined plane, at least one deflector means having a virtual deflection center located between said collimator lens and said transfer lens means, and a projection lens having a back focal plane wherein said at least one deflector means is located in relation to said collimator lens at a point which is conjugate to said back focal plane of said projection lens.
Claim 30
Dependent Claim
25 words
A charged particle beam deflection apparatus as recited in claim 24, including a further deflection means located between said collimator lens and said projection means.
Claim 31
Dependent Claim
96 words
A charged particle beam deflection apparatus including a transfer lens means for imaging a demagnified spot image at a predetermined plane, a collimator lens having a back focal plane coincident with said predetermined plane, at least one deflector means having a virtual deflection center located at said back focal plane of said collimator lens, and a projection lens having a back focal plane and an additional deflector means wherein said additional deflector means is located in relation to said collimator lens at a point which is conjugate to said back focal plane of said projection lens.
Claim 32
Dependent Claim
96 words
A charged particle beam deflection apparatus including a transfer lens means for imaging a demagnified spot image at a predetermined plane, a collimator lens having a back focal plane coincident with said predetermined plane, at least one deflector means having a virtual deflection center located at said back focal plane of said collimator lens, and a projection lens having a back focal plane and an additional deflector means wherein said additional deflector means is located in relation to said collimator lens at a point which is conjugate to said back focal plane of said projection lens.
Claim 33
Dependent Claim
25 words
A charged particle beam deflection apparatus as recited in claim 26, including a further deflection means located between said collimator lens and said projection lens.
Claim 34
Dependent Claim
92 words
An electron beam lithography apparatus including a transfer lens means for imaging a demagnified spot image at a predetermined plane, a collimator lens having a back focal plane coincident with said predetermined plane, at least one deflector means having a virtual deflection center located between said collimator lens and said transfer lens means, and a projection leans having a back focal plane wherein said at least one deflector means is located in relation to said collimator lens at a point which is conjugate to said back focal plane of said projection lens.
Claim 35
Dependent Claim
92 words
An electron beam lithography apparatus including a transfer lens means for imaging a demagnified spot image at a predetermined plane, a collimator lens having a back focal plane coincident with said predetermined plane, at least one deflector means having a virtual deflection center located between said collimator lens and said transfer lens means, and a projection leans having a back focal plane wherein said at least one deflector means is located in relation to said collimator lens at a point which is conjugate to said back focal plane of said projection lens.
Claim 36
Dependent Claim
24 words
A electron beam lithography apparatus as recited in claim 28, including a further deflection means located between said collimator lens and said projection lens.
Claim 37
Dependent Claim
95 words
An electron beam lithography apparatus including a transfer lens means for imaging a demagnified spot image at a predetermined plane, a collimator lens having a back focal plane coincident with said predetermined plane, at least one deflector means having a virtual deflection center located at said back focal plane of said collimator lens, and a projection lens having a back focal plane and an additional deflector means wherein said additional deflector means is located in relation to said collimator lens at a point which is conjugate to said back focal plane of said projection lens.
Claim 38
Dependent Claim
95 words
An electron beam lithography apparatus including a transfer lens means for imaging a demagnified spot image at a predetermined plane, a collimator lens having a back focal plane coincident with said predetermined plane, at least one deflector means having a virtual deflection center located at said back focal plane of said collimator lens, and a projection lens having a back focal plane and an additional deflector means wherein said additional deflector means is located in relation to said collimator lens at a point which is conjugate to said back focal plane of said projection lens.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-08-04 | 1996-02-03 | 1996-08-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-08-04 | 2000-02-03 | 2000-08-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-08-04 | 2004-02-03 | 2004-08-04 | $7700.00 | Window Closed / Lapsed |