US5133850A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Sputtering cathode for coating substrates in cathode sputtering apparatus
Assignee: Balzers und Leybold Deutschland Holding AG
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Filing: 1991-02-11
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Granted: 1992-07-28
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Expires: 2011-02-11
Abstract
Abstract Cathode base (1) has a hollow target (8) disposed thereon with at least one planar sputtering surface (8a), of circular shape for example, which is encompassed by at least two concentric, continuous projections (8b, 8c), and with a magnet system (6) with pole faces (6c, 6d) of opposite polarity lying on both sides of the target (8) for the production of magnetic lines of force (11, 11', . . . ) running substantially parallel to the sputtering surface (16a), the wall surfaces (8d, 8e) of the projections (8b, 8c) of the target (8), adjoining the sputtering surface (8a) being disposed at an angle (α) to the perpendicular, is preferably in a range between 30 and 70 degrees.
Inventors
- 👤 Reiner Kukla
- 👤 Eggo Sichmann
- 👤 Wolf-Eckart Fritsche
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 09:35
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3411; H01J37/3414; H01J37/3423; C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3407; H01J37/3402; H01J37/3405; H01J37/3408
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
97 words
Sputtering cathode for coating substrates in cathode sputtering apparatus, comprising a cathode base an annular target disposed on said base and comprising a planar sputtering surface of ciruitous shaped bounded by two concentric upstanding projections, said projections having mutually facing diverging wall surfaces which adjoin the sputtering surface and are disposed at angles between 30 and 70 degrees to the perpendicular of the sputtering surface, and a magnet system having mutually facing pole faces of opposite polarity lying on opposite sides of said projections for producing magnetic lines of force running substantially parallel to said sputtering surface.
Claim 2
Dependent Claim
97 words
Sputtering cathode for coating substrates in cathode sputtering apparatus, comprising a cathode base an annular target disposed on said base and comprising a planar sputtering surface of ciruitous shaped bounded by two concentric upstanding projections, said projections having mutually facing diverging wall surfaces which adjoin the sputtering surface and are disposed at angles between 30 and 70 degrees to the perpendicular of the sputtering surface, and a magnet system having mutually facing pole faces of opposite polarity lying on opposite sides of said projections for producing magnetic lines of force running substantially parallel to said sputtering surface.
Claim 3
Dependent Claim
59 words
Sputtering cathode as in claim 1 wherein, during use, a sputtering pit having a bottom surface and lateral boundary surfaces is formed in said planar sputtering surface, said lateral boundary surfaces extending at respective angles to the bottom surface, said angles of said wall surfaces being selected to represent rectilinear extensions of said angles of said lateral boundary surfaces.
Claim 4
Dependent Claim
18 words
Sputtering cathode as in claim 1 wherein said projections consist of the same material as said sputtering surface.
Claim 5
Dependent Claim
22 words
Sputtering cathode as in claim 1 wherein said projections are formed of a material different from the material of the sputtering surface.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-07-28 | 1996-01-27 | 1996-07-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-07-28 | 2000-01-27 | 2000-07-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-07-28 | 2004-01-27 | 2004-07-28 | $7700.00 | Window Closed / Lapsed |