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US5131995A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of manufacturing titanium magnetic disk substrate

Assignee: JFE Engineering Corp
•
Filing: 1991-02-28
•
Granted: 1992-07-21
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Expires: 2011-02-28
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Abstract

Abstract After the surface roughness of a titanium substrate is set to be R max ≦0.08 μm, a hardened layer having a hardness of H v ≧250 is formed thereon to have a thickness of 50 to 250 μm by sputtering, thereby manufacturing a titanium magnetic disk substrate.

Inventors

  • 👤 Hiroyoshi Suenaga
  • 👤 Hideaki Fukai
  • 👤 Toshio Sakiyama
  • 👤 Kuninori Minakawa

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 01:56
CPC Classifications
G; G11; G11B; G11B5/00; G11B5/84; G11B5/62; G11B5/73; G11B5/7368; G11B5/739; G11B5/73911; G11B5/73917; G11B5/73919

Claims Analysis

Total Claims: 14
Claim 1
Independent Claim 57 words
A method of manufacturing a titanium magnetic disk substrate, comprising the steps of: preparing a titanium substrate; setting the surface roughness of said titanium substrate to be R max ≦0.08 μm; and forming a hardened layer having a hardness of H v ≧250 on said titanium substrate to a thickness of 50 to 250 μm by sputtering.
Claim 2
Independent Claim 57 words
A method of manufacturing a titanium magnetic disk substrate, comprising the steps of: preparing a titanium substrate; setting the surface roughness of said titanium substrate to be R max ≦0.08 μm; and forming a hardened layer having a hardness of H v ≧250 on said titanium substrate to a thickness of 50 to 250 μm by sputtering.
Claim 3
Dependent Claim 15 words
A method according to claim 1, wherein said titanium substrate is formed of pure titanium.
Claim 4
Dependent Claim 28 words
A method according to claim 1, wherein said step of setting the surface roughness of said titanium substrate is achieved by polishing the surface of said titanium substrate.
Claim 5
Dependent Claim 16 words
A method according to claim 1, wherein said titanium substrate is formed of a titanium alloy.
Claim 6
Dependent Claim 12 words
A method according to claim 1, wherein said hardened layer is nonmagnetic.
Claim 7
Dependent Claim 31 words
A method according to claim 1, wherein the surface roughness of said titanium magnetic disk substrate is R max ≦0.1 μm after said step of forming a hardened layer is performed.
Claim 8
Independent Claim 76 words
A method of manufacturing a titanium magnetic disk, comprising the steps of: preparing a titanium substrate; setting the surface roughness of said titanium substrate to be R max ≦0.08 μm; forming a hardened layer having a hardness of H v ≧250 on said titanium substrate to a thickness of 50 to 250 μm by sputtering; and forming a magnetic film on said hardened layer after said hardened layer si formed, without performing an intermediate polishing step.
Claim 9
Independent Claim 76 words
A method of manufacturing a titanium magnetic disk, comprising the steps of: preparing a titanium substrate; setting the surface roughness of said titanium substrate to be R max ≦0.08 μm; forming a hardened layer having a hardness of H v ≧250 on said titanium substrate to a thickness of 50 to 250 μm by sputtering; and forming a magnetic film on said hardened layer after said hardened layer si formed, without performing an intermediate polishing step.
Claim 10
Dependent Claim 15 words
A method according to claim 7, wherein said titanium substrate is formed of pure titanium.
Claim 11
Dependent Claim 16 words
A method according to claim 7, wherein said titanium substrate is formed of a titanium alloy.
Claim 12
Dependent Claim 28 words
A method according to claim 7, wherein said step of setting the surface roughness of said titanium substrate is achieved by polishing the surface of said titanium substrate.
Claim 13
Dependent Claim 12 words
A method according to claim 7, wherein said hardened layer is nonmagnetic.
Claim 14
Dependent Claim 31 words
A method according to claim 7, wherein the surface roughness of said titanium magnetic disk substrate is R max ≦0.1 μm after said step of forming a hardened layer is performed.

References Cited (Backward Citations)

JPS52105804A Cited
JPS5750324A Cited
US4552820A Cited
JPH01112521A Cited
US4990362A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1995-07-21 1996-01-20 1996-07-21 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1999-07-21 2000-01-20 2000-07-21 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2003-07-21 2004-01-20 2004-07-21 $7700.00 Window Closed / Lapsed

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