US5120622A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Lift-off process for patterning dichroic filters
Assignee: Eastman Kodak Co
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Filing: 1990-02-05
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Granted: 1992-06-09
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Expires: 2010-02-05
Abstract
Abstract A lithographic lift-off process includes coating a layer of positive resist material using a dynamic dispense on top of a preexisting layer of a different positive resist material. Thereafter, patternwise exposing both layers simultaneously and developing the exposed portions of both layers for a sufficient time to provide openings in the resists wherein the dynamic dispense layer overhangs the preexisting layer.
Inventors
- 👤 Michael J. Hanrahan
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-10 01:48
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/094; G03F7/0005; G03F7/0007
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
126 words
A lithographic patterning process which results in an overhang lift-off structure consisting of the steps of: (a) coating a layer of a first positive photoresist material on a substrate; (b) depositing a layer of a second positive photoresist material upon the first photoresist material by dispensing the second photoresist coating solution onto the middle of the coated substrate while it is spinning, the second photoresist layer having a lower unexposed dissolution rate than the first photoresist in a given developer; (c) patternwise exposing the first and second photoresist layers simultaneously; and (d) developing the exposed portions of the first and second resists with the given developer for a sufficient time to provide openings in the photoresists wherein the second photoresist layer overhangs the first photoresist layer.
Claim 2
Dependent Claim
126 words
A lithographic patterning process which results in an overhang lift-off structure consisting of the steps of: (a) coating a layer of a first positive photoresist material on a substrate; (b) depositing a layer of a second positive photoresist material upon the first photoresist material by dispensing the second photoresist coating solution onto the middle of the coated substrate while it is spinning, the second photoresist layer having a lower unexposed dissolution rate than the first photoresist in a given developer; (c) patternwise exposing the first and second photoresist layers simultaneously; and (d) developing the exposed portions of the first and second resists with the given developer for a sufficient time to provide openings in the photoresists wherein the second photoresist layer overhangs the first photoresist layer.
Claim 3
Dependent Claim
170 words
A process for forming dielectric color filter arrays consisting of the steps of: (a) coating a layer of a first positive photoresist material on a substrate; (b) coating a layer of a second positive photoresist material upon the first resist by dispensing the second photoresist coating solution on the coated substrate while it is spinning, the second photoresist layer having a lower unexposed dissolution rate than the first photoresist in a given developer; (c) patternwise exposing the first and second photoresist layers simultaneously; (d) developing the exposed portions of the first and second photoresists with the given developer for a sufficient time to provide openings in the photoresists wherein the second photoresist overhangs the first photoresist layer; (e) depositing a stack of dielectric layers on the unexposed portions of the second photoresist layer and in the openings to provide color filter arrays; and (f) applying a solvent to dissolve the first photoresist layer and to lift-off the dielectric stack on the second photoresist layer without affecting the color filter arrays.
Claim 4
Dependent Claim
170 words
A process for forming dielectric color filter arrays consisting of the steps of: (a) coating a layer of a first positive photoresist material on a substrate; (b) coating a layer of a second positive photoresist material upon the first resist by dispensing the second photoresist coating solution on the coated substrate while it is spinning, the second photoresist layer having a lower unexposed dissolution rate than the first photoresist in a given developer; (c) patternwise exposing the first and second photoresist layers simultaneously; (d) developing the exposed portions of the first and second photoresists with the given developer for a sufficient time to provide openings in the photoresists wherein the second photoresist overhangs the first photoresist layer; (e) depositing a stack of dielectric layers on the unexposed portions of the second photoresist layer and in the openings to provide color filter arrays; and (f) applying a solvent to dissolve the first photoresist layer and to lift-off the dielectric stack on the second photoresist layer without affecting the color filter arrays.
References Cited (Backward Citations)
US3873313A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-06-09 | 1995-12-09 | 1996-06-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-06-09 | 1999-12-09 | 2000-06-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-06-09 | 2003-12-09 | 2004-06-09 | $7700.00 | Window Closed / Lapsed |