US5112437A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Oxide film removing apparatus and removing method thereof using azeotropic vapor mixture
Assignee: MORITA KAGAKU Co Ltd
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Filing: 1991-02-20
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Granted: 1992-05-12
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Expires: 2011-02-20
Abstract
Abstract In oxide film removing equipment for removing a SiO 2 film on a semiconductor substrate by using hydrogen fluoride, a liquid mixture of hydrogen fluoride and methyl alcohol is prepared in a chemical factory beforehand. The liquid mixture of hydrogen fluoride and methyl alcohol is heated to generate azeotropic vapor at a semiconductor works and the vapor is used to remove the SiO 2 film on the substrate. The liquid mixture of hydrogen fluoride and methyl alcohol previously prepared in the chemical factory increases safety during an operation at the semiconductor works.
Inventors
- 👤 Nobuatsu Watanabe
- 👤 Yong-Bo Chong
- 👤 Toshio Tatsuno
- 👤 Tomoyoshi Okada
- 👤 Akira Izumi
- 👤 Keiji Toei
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 10:13
CPC Classifications
H; H10; H10P; H10P70/00; H10P70/10; H10P70/12; H10P70/125; C; C03; C03C; C03C15/00; H10P72/00; H10P72/04; H10P72/0402; H10P72/0406; H10P72/0411
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
100 words
An oxide film removing method system for removing an oxide film from a substrate by using hydrogen fluoride, comprising the steps of: preparing a mixture of hydrogen fluoride and alcohol in a chemical factory wherein said hydrogen fluoride and alcohol are separately manufactured beforehand, generating azeotropic vapor of said prepared mixture, and removing said oxide film of the substrate by using said generated azeotropic vapor, said steps of generating said azeotropic vapor and removing the oxide film of the substrate by using said azeotropic vapor being performed at a facility where the removal of said oxide film is carried out.
Claim 2
Dependent Claim
100 words
An oxide film removing method system for removing an oxide film from a substrate by using hydrogen fluoride, comprising the steps of: preparing a mixture of hydrogen fluoride and alcohol in a chemical factory wherein said hydrogen fluoride and alcohol are separately manufactured beforehand, generating azeotropic vapor of said prepared mixture, and removing said oxide film of the substrate by using said generated azeotropic vapor, said steps of generating said azeotropic vapor and removing the oxide film of the substrate by using said azeotropic vapor being performed at a facility where the removal of said oxide film is carried out.
Claim 3
Dependent Claim
17 words
The oxide film removing method according to claim 1, further comprising diluting said azeotropic vapor with alcohol.
Claim 4
Dependent Claim
64 words
An oxide film removing apparatus for removing an oxide film from a substrate by using hydrogen fluoride, comprising: azeotropic vapor generating means for generating azeotropic vapor of hydrogen fluoride and alcohol by conditioning a liquid mixture of said hydrogen fluoride and alcohol to establish azeotropic conditions, and oxide film removing means for removing said oxide film from said substrate by using said azeotropic vapor.
Claim 5
Dependent Claim
64 words
An oxide film removing apparatus for removing an oxide film from a substrate by using hydrogen fluoride, comprising: azeotropic vapor generating means for generating azeotropic vapor of hydrogen fluoride and alcohol by conditioning a liquid mixture of said hydrogen fluoride and alcohol to establish azeotropic conditions, and oxide film removing means for removing said oxide film from said substrate by using said azeotropic vapor.
Claim 6
Dependent Claim
31 words
The oxide film removing apparatus according to claim 3, further comprising liquid mixture supplying means for supplying said liquid mixture of hydrogen fluoride and alcohol to said azeotropic vapor generating means.
Claim 7
Dependent Claim
23 words
The oxide film removing apparatus according to claim 4, further comprising alcohol vapor mixing means for mixing alcohol vapor with said azeotropic vapor.
Claim 8
Dependent Claim
19 words
The oxide film removing apparatus according to claim 4, wherein said azeotropic vapor is carried by an inert gas.
Claim 9
Dependent Claim
19 words
The oxide film removing apparatus according to claim 6, wherein said liquid mixture is carried by an inert gas.
Claim 10
Dependent Claim
18 words
The oxide film removing apparatus according to claim 4, wherein said azeotropic vapor generating means includes heating means.
Claim 11
Dependent Claim
66 words
An oxide film removing method for removing an oxide film from a substrate by using hydrogen fluoride, comprising the steps of: conditioning a liquid mixture of hydrogen fluoride and alcohol to establish azeotropic conditions, in a manner whereby said liquid mixture is effective for generating azeotropic vapor when placed under azeotropic conditions, and removing an oxide layer film from a substrate by using said azeotropic vapor.
Claim 12
Dependent Claim
66 words
An oxide film removing method for removing an oxide film from a substrate by using hydrogen fluoride, comprising the steps of: conditioning a liquid mixture of hydrogen fluoride and alcohol to establish azeotropic conditions, in a manner whereby said liquid mixture is effective for generating azeotropic vapor when placed under azeotropic conditions, and removing an oxide layer film from a substrate by using said azeotropic vapor.
Claim 13
Dependent Claim
25 words
The oxide film removing method according to claim 9, further comprising preparing a mixture of said hydrogen fluoride and alcohol prior to said conditioning step.
Claim 14
Dependent Claim
18 words
The oxide film removing method according to claim 10, further comprising mixing alcohol vapor with said azeotropic vapor.
Claim 15
Independent Claim
85 words
A method of removing an oxide film from a substrate by using hydrogen fluoride, comprising the steps of: providing separate supplies of hydrogen fluoride and alcohol and preparing, at a chemical factory, a mixture of hydrogen fluoride and alcohol; transporting said mixture of hydrogen fluoride and alcohol to a semiconductor manufacturing facility; generating an azeotropic vapor of said mixture of hydrogen fluoride and alcohol at said semiconductor manufacturing facility; and removing said oxide film of the substrate by exposing said substrate to said azeotropic vapor.
Claim 16
Independent Claim
85 words
A method of removing an oxide film from a substrate by using hydrogen fluoride, comprising the steps of: providing separate supplies of hydrogen fluoride and alcohol and preparing, at a chemical factory, a mixture of hydrogen fluoride and alcohol; transporting said mixture of hydrogen fluoride and alcohol to a semiconductor manufacturing facility; generating an azeotropic vapor of said mixture of hydrogen fluoride and alcohol at said semiconductor manufacturing facility; and removing said oxide film of the substrate by exposing said substrate to said azeotropic vapor.
Claim 17
Dependent Claim
16 words
The method of claim 12, wherein said generating step comprising controlling the temperature of said mixture.
Claim 18
Dependent Claim
19 words
The method of claim 13, wherein the alcohol is selected from the group of methanol, ethanol and isopropyl alcohol.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-05-12 | 1995-11-11 | 1996-05-12 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-05-12 | 1999-11-11 | 2000-05-12 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-05-12 | 2003-11-11 | 2004-05-12 | $7700.00 | Window Closed / Lapsed |