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US5101249A Expired / Lapsed US ⏱️ 0.0 years remaining

Nonvolatile semiconductor memory device

Assignee: Fujitsu Ltd
•
Filing: 1986-05-06
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Granted: 1992-03-31
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Expires: 2006-05-06
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Abstract

Abstract A nonvolatile semiconductor memory device comprising: a substrate, a pair of source and drain regions; a channel region between the source and drain regions; a pair of first and second insulating layers on the channel region, and a floating-gate or traps between the first and second insulating layer. The band gap of the first insulating layer increases gradually from the substrate to the floating gate or the traps.

Inventors

  • 👤 Shinpei Hijiya
  • 👤 Takao Nozaki
  • 👤 Takashi Ito
  • 👤 Hajime Ishikawa

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 07:35
CPC Classifications
H; H10; H10D; H10D30/00; H10D30/60; H10D30/68; H10D30/681; H10D30/684; H10D30/686

Claims Analysis

Total Claims: 14
Claim 1
Independent Claim 87 words
A nonvolatile semiconductor memory device comprising: a semiconductor substrate of a first conductivity type; a first insulating layer disposed on said semiconductor substrate, said first insulating layer being in direct contact with said semiconductor substrate, said first insulating layer comprising direct-thermally grown oxidized silicon nitride having a thickness which is substantially 100 Å and having a graded composition in the direction of its thickness; a second insulating layer disposed on said first insulating layer; and means for storing charges disposed between said first and second insulating layers.
Claim 2
Dependent Claim 87 words
A nonvolatile semiconductor memory device comprising: a semiconductor substrate of a first conductivity type; a first insulating layer disposed on said semiconductor substrate, said first insulating layer being in direct contact with said semiconductor substrate, said first insulating layer comprising direct-thermally grown oxidized silicon nitride having a thickness which is substantially 100 Å and having a graded composition in the direction of its thickness; a second insulating layer disposed on said first insulating layer; and means for storing charges disposed between said first and second insulating layers.
Claim 3
Dependent Claim 16 words
A device as set forth in claim 1, wherein said charge storing means comprises a floating-gate.
Claim 4
Dependent Claim 41 words
A device as set forth in claim 1, wherein the materials of said first and second insulating layers are different from each other, and wherein said charge storing means comprises traps at the interface of said first and second insulating layers.
Claim 5
Dependent Claim 18 words
A device as set forth in claim 1, wherein said second insulating layer is made of silicon dioxide.
Claim 6
Dependent Claim 19 words
A device as set forth in claim 1, further comprising a control gate disposed on said second insulating layer.
Claim 7
Dependent Claim 60 words
A device as set forth in claim 2 further comprising a pair of source and drain regions of a second conductivity type opposite to said first conductivity type formed in said substrate apart from each other, and a channel region disposed between said source and drain regions in said substrate, said first insulating layer being disposed above said channel region.
Claim 8
Dependent Claim 62 words
A device as set forth in claim 6, wherein a writing operation is performed by causing avalanche breakdown in the vicinity of said drain region and injecting hot carriers of a first polarity into said floating-gate, and an erasing operation is performed by causing avalanche breakdown and injecting hot carriers of a second polarity opposite to said first polarity into said floating-gate.
Claim 9
Dependent Claim 56 words
A device as set forth in claim 6, wherein a writing operation is performed by tunneling carriers of a first polarity from said substrate through said first insulating layer to said floating-gate, and an erasing operation is performed by tunneling carriers of said first polarity from said floating-gate through said first insulating layer to said substrate.
Claim 10
Dependent Claim 56 words
A device as set forth in claim 6, wherein a writing operation is performed by tunneling carriers of a first polarity from said substrate through said first insulating layer to said traps, and an erasing operation is performed by tunneling carriers of said first polarity from said traps through said first insulating layer to said substrate.
Claim 11
Dependent Claim 60 words
A device as set forth in claim 3 further comprising a pair of source and drain regions of a second conductivity type opposite to said first conductivity type formed in said substrate apart from each other, and a channel region disposed between said source and drain regions in said substrate, said first insulating layer being disposed above said channel region.
Claim 12
Dependent Claim 62 words
A device as set forth in claim 10, wherein a writing operation is performed by causing avalanche breakdown in the vicinity of said drain region and injecting hot carriers of a first polarity into said floating-gate, and an erasing operation is performed by causing avalanche breakdown and injecting hot carriers of a second polarity opposite to said first polarity into said floating-gate.
Claim 13
Dependent Claim 56 words
A device as set forth in claim 10, wherein a writing operation is performed by tunneling carriers of a first polarity from said substrate through said first insulating layer to said floating-gate, and an erasing operation is performed by tunneling carriers of said first polarity from said floating-gate through said first insulating layer to said substrate.
Claim 14
Dependent Claim 56 words
A device as set forth in claim 10, wherein a writing operation is performed by tunneling carriers of a first polarity from said substrate through said first insulating layer to said traps, and an erasing operation is performed by tunneling carriers of said first polarity from said traps through said first insulating layer to said substrate.

References Cited (Backward Citations)

US3660819A Cited
US3878549A Cited
US3856587A Cited
US3984822A Cited
US4104675A Cited
US4257832A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1995-03-31 1995-09-30 1996-03-31 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1999-03-31 1999-09-30 2000-03-31 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2003-03-31 2003-09-30 2004-03-31 $7700.00 Window Closed / Lapsed

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