← Back to Patent Explorer
US5101111A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of measuring thickness of film with a reference sample having a known reflectance

Assignee: Dainippon Screen Manufacturing Co Ltd
•
Filing: 1990-07-06
•
Granted: 1992-03-31
•
Expires: 2010-07-06
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract Prior to measurement of the thickness dx of a thin film which is formed on a substrate, correlation data between the reflectance Rs of the film for light and the thickness dx thereof is stored in a data memory in the form of a table. A reference sample having a known reflectance Rp is prepared and the energy Ep of light reflected from the reference sample is measured. Also measured is the energy Es of light reflected from an objective sample having the thin film and the substrate. A value of the thickness dx is obtained through the table while setting Y=Rp therein, where y is calculated through a fomula y=(Rp/Ep)·Es.

Inventors

  • 👤 Noriyuki Kondo

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-05 06:46
CPC Classifications
G; G01; G01B; G01B11/00; G01B11/02; G01B11/06; G01B11/0616

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 153 words
A method of measuring a thickness dx of a transparent film provided in an objective sample, wherein said film is formed on a substrate and said objective sample has a known first correlation between a thickness dx and a reflectance Rs for light, said method comprising the steps of: (a) preparing a reference sample whose reflectance Rp for light is known; (b) modifying said first correlation into a second correlation between a ratio Rs/Rp and thickness dx; (c) applying a light to said reference sample and measuring an energy Ep of a light reflected on said reference sample with a measuring means; (d) applying a light to said transparent film of said objective sample and measuring an energy Es of a light reflected on said objective sample with said measuring means; (e) calculating a ratio w=Es/Ep; and (f) accessing a specific value of a thickness dx using said second correlation by setting w=Rs/Rp.
Claim 2
Independent Claim 153 words
A method of measuring a thickness dx of a transparent film provided in an objective sample, wherein said film is formed on a substrate and said objective sample has a known first correlation between a thickness dx and a reflectance Rs for light, said method comprising the steps of: (a) preparing a reference sample whose reflectance Rp for light is known; (b) modifying said first correlation into a second correlation between a ratio Rs/Rp and thickness dx; (c) applying a light to said reference sample and measuring an energy Ep of a light reflected on said reference sample with a measuring means; (d) applying a light to said transparent film of said objective sample and measuring an energy Es of a light reflected on said objective sample with said measuring means; (e) calculating a ratio w=Es/Ep; and (f) accessing a specific value of a thickness dx using said second correlation by setting w=Rs/Rp.
Claim 3
Dependent Claim 56 words
The method of claim 1, further comprising the step of: (g) arranging said second correlation in a form of a table and storing said table in a memory means; the step (f) including the step of: (f-1) converting said value w through said table in said memory means to obtain said value of said thickness dx.
Claim 4
Dependent Claim 28 words
The method of claim 2, wherein: the step (g) includes the step of: (g-1) storing said table in said memory means in a form of a look-up table.
Claim 5
Dependent Claim 89 words
The method of claim 3, wherein; the step (g) includes the step of: (g-1) making said table for discrete values v 1 , v 2 , . . . , v n of said ratio v; the step (f-1) includes the steps of: (f-1-1) obtaining a value v A which is nearest to said value w among said discrete values v 1 , v 2 , . . . , v n ; (f-1-2) converting said value v A through said table into said value of said thickness dx.

References Cited (Backward Citations)

US3017512A Cited
US4676647A Cited
US4899055A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1995-03-31 1995-09-30 1996-03-31 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1999-03-31 1999-09-30 2000-03-31 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2003-03-31 2003-09-30 2004-03-31 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag