US5091285A
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Method of forming pattern by using an electroconductive composition
Assignee: Fujitsu Ltd
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Filing: 1990-04-27
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Granted: 1992-02-25
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Expires: 2010-04-27
Abstract
Abstract A pattern-forming method using an electroconductive composition comprising at least one TCNQ complex salt selected from the group consisting of isoquinolinium-TCNQ complex salts, quinolinium-TCNQ complex salts, alkyl pyridinium-TCNQ complex salts, and morpholinium-TCNQ complex salts, a specific polymer, and a solvent are disclosed. This composition gives an electroconductive film having a superior long-term storage stability and electroconductive characteristics. When this electroconductive composition is coated on a resist to form an electroconductive film, and a pattern is formed by an irradiation with charging beams, such as electron beams, an accumulation of charges (charge-up) is prevented and a fine resist pattern in which a misregistration is completely prevented is obtained.
Inventors
- 👤 Keiji Watanabe
- 👤 Yasuhiro Yoneda
- 👤 Koichi Kobayashi
- 👤 Keiko Yano
- 👤 Tomio Nakamura
- 👤 Shigeru Shimizu
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 21:40
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/0047; H; H10; H10P; H10P76/00; H10P76/20; H10P76/204; Y; Y10; Y10S; Y10S430/00; Y10S430/143
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
397 words
A pattern-forming method comprising the steps of: (1) forming a resist film on a substrate, (2) coating an electroconductive composition on the resist film to form an electroconductive film (3) irradiating the coated substrate with electron beams or ion beams for forming a pattern by exposure, and (4) developing the electroconductive film and resist film to form a resist pattern using a liquid developer to simultaneously remove the electroconductive film and the resist film, wherein said electroconductive composition comprises (A) 0.05 to 30 parts by weight of at least one tetracyanoquinodimethane (TCNQ) complex salt selected from the group consisting of isoquinolinium TCNQ complex salts represented by the following formula (I): ##STR8## wherein R 1 represents an alkyl group having 3 to 24 carbon atoms, (TCNQ) + represents a negatively charged TCNQ radical, (TCNQ)° represents a neutral TCNQ radical, and m is a rational number of from 0 to 2, quinolinium TCNQ complex salts represented by the following formula (II): ##STR9## wherein R 2 represents an alkyl group having 3 to 24 carbon atoms, (TCNQ) + represents a negatively charged TCNQ radical, (TCNQ)° represents a neutral TCNQ radical, and m is a rational number of from 0 to 2, alkyl pyridinium TCNQ complex salts represented by the following formula (III): ##STR10## wherein R 3 represents an alkyl group having 3 to 24 carbon atoms, R 4 represents an alkyl group having 1 to 6 carbon atoms, (TCNQ) + represents a negatively charged TCNQ radical, (TCNQ)° represents a neutral TCNQ radical, and m is a rational number of from 0 to 2, and morpholinium TCNQ complex salts represented by the following formula (IV): ##STR11## wherein R 5 represents an alkyl group having 3 to 24 carbon atoms, R 6 represents hydrogen or an alkyl group having 1 to 6 carbon atoms, (TCNQ) + represents a negatively charged TCNQ radical, TCNQ)° represents a neutral TCNQ radical, and m is a rational number of from 0 to 2, (B) 0.05 to 100 parts by weight of a polymer comprising 50 to 100% by weight of units of a monomer represented by the following formula: ##STR12## wherein R represents a hydrogen atom or a methyl group and R' represents an alkyl group having 1 to 6 carbon atoms, and 0 to 50% by weight of units of at least one monoethylenically unsaturated monomer, and (c) 100 parts by weight of a solvent.
Claim 2
Dependent Claim
397 words
A pattern-forming method comprising the steps of: (1) forming a resist film on a substrate, (2) coating an electroconductive composition on the resist film to form an electroconductive film (3) irradiating the coated substrate with electron beams or ion beams for forming a pattern by exposure, and (4) developing the electroconductive film and resist film to form a resist pattern using a liquid developer to simultaneously remove the electroconductive film and the resist film, wherein said electroconductive composition comprises (A) 0.05 to 30 parts by weight of at least one tetracyanoquinodimethane (TCNQ) complex salt selected from the group consisting of isoquinolinium TCNQ complex salts represented by the following formula (I): ##STR8## wherein R 1 represents an alkyl group having 3 to 24 carbon atoms, (TCNQ) + represents a negatively charged TCNQ radical, (TCNQ)° represents a neutral TCNQ radical, and m is a rational number of from 0 to 2, quinolinium TCNQ complex salts represented by the following formula (II): ##STR9## wherein R 2 represents an alkyl group having 3 to 24 carbon atoms, (TCNQ) + represents a negatively charged TCNQ radical, (TCNQ)° represents a neutral TCNQ radical, and m is a rational number of from 0 to 2, alkyl pyridinium TCNQ complex salts represented by the following formula (III): ##STR10## wherein R 3 represents an alkyl group having 3 to 24 carbon atoms, R 4 represents an alkyl group having 1 to 6 carbon atoms, (TCNQ) + represents a negatively charged TCNQ radical, (TCNQ)° represents a neutral TCNQ radical, and m is a rational number of from 0 to 2, and morpholinium TCNQ complex salts represented by the following formula (IV): ##STR11## wherein R 5 represents an alkyl group having 3 to 24 carbon atoms, R 6 represents hydrogen or an alkyl group having 1 to 6 carbon atoms, (TCNQ) + represents a negatively charged TCNQ radical, TCNQ)° represents a neutral TCNQ radical, and m is a rational number of from 0 to 2, (B) 0.05 to 100 parts by weight of a polymer comprising 50 to 100% by weight of units of a monomer represented by the following formula: ##STR12## wherein R represents a hydrogen atom or a methyl group and R' represents an alkyl group having 1 to 6 carbon atoms, and 0 to 50% by weight of units of at least one monoethylenically unsaturated monomer, and (c) 100 parts by weight of a solvent.
Claim 3
Dependent Claim
34 words
A pattern-forming method according to claim 1, wherein any two TCNQ complex salts selected from the group of formulas I, II, III and IV are employed as an ingredient (A) in the electroconductive composition.
Claim 4
Dependent Claim
34 words
A pattern-forming method according to claim 1, wherein any three TCNQ complex salts selected from the group of formulas I, II, III and IV are employed as an ingredient (A) in the electroconductive composition.
Claim 5
Dependent Claim
28 words
A pattern-forming method according to claim 1, wherein the mixture of N-buthylisoquinolinium-TCNQ complex salt and N-octylisoquinolinium-TCNQ complex salt is employed as an ingredient (A) in the electroconductive composition.
Claim 6
Dependent Claim
28 words
A pattern-forming method according to claim 1, wherein the mixture of N-butylisoquinolinium-TCNQ complex salt and N-buthyl-α-picolinium-TCNQ complex salt is employed as an ingredient (A) in the electroconductive composition.
Claim 7
Dependent Claim
28 words
A pattern-forming method according to claim 1, wherein the mixture of N-buthylisoquinolinium-TCNQ complex salt and N-methyl-N-buthylmorpholinium-TCNQ complex salt is employed as an ingredient (A) in the electroconductive composition.
Claim 8
Dependent Claim
31 words
A pattern-forming method according to claim 1, wherein the mixture of N-buthylisoquinolinium-TCNQ complex salt, N-buthyl-α-picolinium-TCNQ complex salt, and N-methyl-N-buthylmorpholinium-TCNQ complex salt is employed as an ingredient (A) in the electroconductive composition.
Claim 9
Dependent Claim
44 words
A pattern-forming method according to claim 1, wherein said electroconductive composition comprises (A) 0.75 part by weight of an N-octylisoquinolinium-TCNQ complex salt, (B) 5 parts by weight of a methyl methacrylate/butyl acrylate copolymer and (C) 100 parts by weight of a cyclohexanone/methylcellosolve mixed solvent.
Claim 10
Dependent Claim
57 words
A pattern-forming method according to claim 1, wherein said electroconductive composition comprises (A) 0.75 part by weight of a mixture comprising an N-octylisoquinolinium-TCNQ complex salt and an N-butyl-N-methylmorpholinium-TCNQ complex salt at a weight ratio of 5/5, (B) 5 parts by weight of a methyl methacrylate/styrene copolymer and (C) 100 parts by weight of a cyclohexanone/methylcollsolve mixed solvent.
Claim 11
Dependent Claim
62 words
A pattern-forming method according to claim 1, wherein said electroconductive composition comprises (A) 0.75 part by weight of a mixture comprising an N-butyl-isoquinolinium-TCNQ complex salt, an N-butyl-α-picolinium-TCNQ complex salt and an N-butyl-N-methylmorpholinium-TCNQ complex salt at a weight ratio of 4/5/1, (B) 5 parts by weight of a methyl methacrylate/butyl acrylate copolymer and (C) 100 parts by weight of a cyclohexanone/methylcellosolve mixed solvent.
Claim 12
Dependent Claim
17 words
A pattern-forming method according to claim 1, wherein post baking is carried out after the step (2).
References Cited (Backward Citations)
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