US5091103A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photoresist stripper
Assignee: International Business Machines Corp
•
Filing: 1990-05-01
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Granted: 1992-02-25
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Expires: 2010-05-01
Abstract
Abstract Photo resist stripper compositions comprising N-alkyl-2-pyrrolidone, 1,2-propanediol and tetraalkylammonium hydroxide. The photoresist strippers are useful at high stripping temperatures (105 DEG C.-125 DEG C.) to remove hard baked photoresist without damaging semiconductor substrates or metallurgy.
Inventors
- 👤 Alicia Dean
- 👤 John A. Fitzsimmons
- 👤 Janos Havas
- 👤 Barry C. McCormick
- 👤 Prabodh R. Shah
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 14:00
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/425
Claims Analysis
Total Claims: 26
Claim 1
Independent Claim
50 words
A composition of matter useful for removing hard baked photoresist compositions from a substrate comprising essentially of 60 to 90% by weight of an N-alkyl-2-pyrrolidone, 10 to 40% by weight of 1,2-propanediol, and a sufficient amount of a tetraalkylammonium hydroxide to provide a solution being from 0.1 to 0.22 N.
Claim 2
Dependent Claim
50 words
A composition of matter useful for removing hard baked photoresist compositions from a substrate comprising essentially of 60 to 90% by weight of an N-alkyl-2-pyrrolidone, 10 to 40% by weight of 1,2-propanediol, and a sufficient amount of a tetraalkylammonium hydroxide to provide a solution being from 0.1 to 0.22 N.
Claim 3
Dependent Claim
10 words
The composition of claim 1 wherein the N-alkyl-2-pyrrolidone is N-methyl-2-pyrrolidone.
Claim 4
Dependent Claim
17 words
The composition of claim 1 wherein the N-alkyl-2-pyrrolidone is present in an amount from 65 to 5%.
Claim 5
Dependent Claim
17 words
The composition of claim 1 wherein the N-alkyl-2-pyrrolidone is present in an amount from 70 to 80%.
Claim 6
Dependent Claim
17 words
The composition of claim 1 wherein the 1,2-propanediol is present in an amount from 15 to 35%.
Claim 7
Dependent Claim
17 words
The composition of claim 1 wherein the 1,2-propanediol is present in an amount from 20 to 30%.
Claim 8
Dependent Claim
12 words
The composition of claim 1 wherein the tetraalkylammonium hydroxide is tetramethylammonium hydroxide.
Claim 9
Dependent Claim
24 words
The composition of claim 1 wherein the tetraalkylammonium hydroxide is present in an amount sufficient to provide a solution from 0.12 to 0.20 N.
Claim 10
Dependent Claim
24 words
The composition of claim 1 wherein the tetraalkylammonium hydroxide is present in an amount sufficient to provide a solution from 0.16 to 0.18 N.
Claim 11
Independent Claim
92 words
A method for removing a hard baked photoresist composition from a substrate without damage to the substrate comprising the steps of contacting the hard baked photoresist composition with a stripper composition consisting essentially of 60 to 90% by weight of an N-alkyl-2-pyrrolidone, 10 to 40% by weight of 1,2-propanediol, and a sufficient amount of a tetraalkylammonium hydroxide to provide a solution being from 0.1 to 0.22N, maintaining the stripper composition at from 105° to 135° C. for more than 15 minutes while in contact with said hard-baked photoresist, and rinsing the substrate.
Claim 12
Independent Claim
92 words
A method for removing a hard baked photoresist composition from a substrate without damage to the substrate comprising the steps of contacting the hard baked photoresist composition with a stripper composition consisting essentially of 60 to 90% by weight of an N-alkyl-2-pyrrolidone, 10 to 40% by weight of 1,2-propanediol, and a sufficient amount of a tetraalkylammonium hydroxide to provide a solution being from 0.1 to 0.22N, maintaining the stripper composition at from 105° to 135° C. for more than 15 minutes while in contact with said hard-baked photoresist, and rinsing the substrate.
Claim 13
Dependent Claim
11 words
The method of claim 10 wherein the substrate has patterned metallurgy.
Claim 14
Dependent Claim
19 words
The method of claim 10 wherein the stripper composition is maintained at a temperature of 120° to 125° C.
Claim 15
Dependent Claim
15 words
The method of claim 11 wherein the metallurgy is not attacked by the stripper composition.
Claim 16
Dependent Claim
10 words
The method of claim 10 wherein the N-alkyl-2-pyrrolidone is N-methyl-2-pyrrolidone.
Claim 17
Dependent Claim
16 words
The method of claim 10 wherein the stripper composition comprises 65 to 85% by weight N-alkyl-2-pyrrolidone.
Claim 18
Dependent Claim
17 words
The method of claim 10 wherein the stripper composition comprises 70 to 80% by weight or N-alkyl-2-pyrrolidone.
Claim 19
Dependent Claim
17 words
The method of claim 10 wherein the stripper composition comprises 15 to 35% by weight of 1,2-propanediol.
Claim 20
Dependent Claim
17 words
The method of claim 10 wherein the stripper composition comprises 20 to 30% by weight of 1,2-propanediol.
Claim 21
Dependent Claim
21 words
The method of claim 10 wherein the stripper composition comprises sufficient tetraalkylammonium hydroxide to provide a 0.12 to 0.2 N solution.
Claim 22
Dependent Claim
21 words
The method of claim 10 wherein the stripper composition comprises sufficient tetraalkylammonium hydroxide to provide a 0.16 to 0.18 N solution.
Claim 23
Dependent Claim
13 words
The method of claim 10 wherein the tetraalkylammonium hydroxide is tetramethyl ammonium hydroxide.
Claim 24
Dependent Claim
22 words
A method for precleaning semiconductor substrates prior to photoresist deposition whereby the semiconductor substrates are contacted with the composition of claim 1.
Claim 25
Dependent Claim
22 words
A method for precleaning semiconductor substrates prior to insulator deposition whereby the semiconductor substrates are contacted with the composition of claim 1.
Claim 26
Dependent Claim
19 words
The method of claim 23 wherein the insulator is selected from the group of polyimide, silicon nitride and quartz.
References Cited (Backward Citations)
US3673099A
Cited
US4906303A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-02-24 | 1995-08-26 | 1996-02-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-02-24 | 1999-08-26 | 2000-02-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-02-24 | 2003-08-26 | 2004-02-25 | $7700.00 | Window Closed / Lapsed |