Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
181 words
A method for attaching a silicon chip to a substrate wherein said silicon chip has a bottom surface having a surface area and said substrate has a gold top surface, said method comprising the steps of: (a) placing a gold lattice structure between said silicon chip bottom surface and said gold top surface so that said silicon chip bottom surface and said gold top surface are in contact with said gold lattice structure, said gold lattice structure having a contact area with said silicon chip which is less than ten percent of the surface area of said silicon chip bottom; (b) scrubbing said silicon chip bottom surface against said gold lattice structure with sufficient pressure and at a sufficient temperature to form a gold/silicon eutectic liquid between said gold lattice structure and said silicon chip bottom surface; and (c) continuing to scrub said silicon chip bottom surface against said gold lattice structure and said gold top surface for a sufficient time to form a gold/silicon eutectic attachment between substantially all of said silicon chip bottom surface and said gold top surface.
Claim 2
Independent Claim
181 words
A method for attaching a silicon chip to a substrate wherein said silicon chip has a bottom surface having a surface area and said substrate has a gold top surface, said method comprising the steps of: (a) placing a gold lattice structure between said silicon chip bottom surface and said gold top surface so that said silicon chip bottom surface and said gold top surface are in contact with said gold lattice structure, said gold lattice structure having a contact area with said silicon chip which is less than ten percent of the surface area of said silicon chip bottom; (b) scrubbing said silicon chip bottom surface against said gold lattice structure with sufficient pressure and at a sufficient temperature to form a gold/silicon eutectic liquid between said gold lattice structure and said silicon chip bottom surface; and (c) continuing to scrub said silicon chip bottom surface against said gold lattice structure and said gold top surface for a sufficient time to form a gold/silicon eutectic attachment between substantially all of said silicon chip bottom surface and said gold top surface.
Claim 3
Dependent Claim
28 words
A method according to claim 1 wherein said surface area of said silicon chip bottom is greater than or equal to about 0.04 square inch (0.26 square cm).
Claim 4
Dependent Claim
30 words
A method according to claim 1 wherein said gold lattice structure has a contact area which is less than one percent of the surface area of said silicon chip bottom.
Claim 5
Dependent Claim
25 words
A method according to claim 1 wherein said gold lattice structure comprises gold wire having a diameter of less than about 0.010 inch (0.025 cm).
Claim 6
Dependent Claim
19 words
A method according to claim 4 wherein the diameter of said gold wire is about 0.001 inch (0.002 cm).
Claim 7
Dependent Claim
23 words
A method according to claim 1 wherein the temperature at which said scrubbing occurs is equal to or less than about 475° C.
Claim 8
Dependent Claim
30 words
A method according to claim 2 wherein said gold lattice structure has a contact area which is less than one percent of the surface area of said silicon chip bottom.
Claim 9
Dependent Claim
25 words
A method according to claim 7 wherein said gold lattice structure comprises gold wire having a diameter of less than about 0.010 inch (0.025 cm).
Claim 10
Dependent Claim
19 words
A method according to claim 8 wherein the diameter of said gold wire is about 0.001 inch (0.002 cm).
Claim 11
Dependent Claim
25 words
A method according to claim 2 wherein said gold lattice structure comprises gold wire having a diameter of less than about 0.010 inch (0.025 cm).
Claim 12
Dependent Claim
19 words
A method according to claim 10 wherein the diameter of said gold wire is about 0.001 inch (0.002 cm).
Claim 13
Dependent Claim
99 words
In a method for eutectically attaching a silicon chip to a substrate having a gold top surface, wherein the bottom surface of said silicon chip is scrubbed against said gold top surface at a temperature above the melting point of the gold/silicon eutectic, the improvement comprising: placing a gold lattice structure between said silicon chip bottom surface and said gold top surface prior to scrubbing said chip against said gold top surface, wherein the contact area of said gold lattice with said silicon chip is less than ten percent of the surface area of said silicon chip bottom surface.
Claim 14
Dependent Claim
99 words
In a method for eutectically attaching a silicon chip to a substrate having a gold top surface, wherein the bottom surface of said silicon chip is scrubbed against said gold top surface at a temperature above the melting point of the gold/silicon eutectic, the improvement comprising: placing a gold lattice structure between said silicon chip bottom surface and said gold top surface prior to scrubbing said chip against said gold top surface, wherein the contact area of said gold lattice with said silicon chip is less than ten percent of the surface area of said silicon chip bottom surface.
Claim 15
Dependent Claim
29 words
The improved method according to claim 12 wherein the surface area of said silicon chip bottom is greater than or equal to about 0.04 square inch (0.26 square cm).
Claim 16
Dependent Claim
31 words
The improved method according to claim 12 wherein said gold lattice structure has a contact area which is less than one percent of the surface area of said silicon chip bottom.
Claim 17
Dependent Claim
26 words
The improved method according to claim 12 wherein said gold lattice structure comprises gold wire having a diameter of less than about 0.010 inch (0.025 cm).
Claim 18
Dependent Claim
20 words
The improved method according to claim 15 wherein the diameter of said gold wire is about 0.001 inch (0.002 cm).
Claim 19
Dependent Claim
23 words
The improved method according to claim 12 wherein the temperature at which said scrubbing occurs is equal to or less than 475° C.