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US5089425A Expired / Lapsed US ⏱️ 0.0 years remaining

Photoelectric converting device having an electrode formed across an insulating layer on a control electrode and method for producing the same

Assignee: Canon Inc
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Filing: 1989-09-22
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Granted: 1992-02-18
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Expires: 2009-09-22
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Abstract

Abstract A method for producing a photoelectric converting device having an electrode formed across an insulating layer on a control electrode region. The control electrode region and main electrode region are formed by a self-alignment process utilizing a field insulating layer as a mask. The insulating layer is formed on the control electrode region with the electrode formed thereon.

Inventors

  • 👤 Junichi Hoshi
  • 👤 Tamotsu Satoh
  • 👤 Shiro Arikawa

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-06 05:32
CPC Classifications
H; H10; H10F; H10F39/00; H10F39/10; H10F39/12; H10F39/197; H10F39/011; H10F39/016; H10F39/80

Claims Analysis

Total Claims: 4
Claim 1
Independent Claim 241 words
A method for producing a photoelectric conversion device comprising a phototransistor cell including a first and a second main electrode region of a first conductivity-type semiconductor material and a control electrode region of a second conductivity-type semiconductor material different from said first conductivity-type semiconductor material in which an electrode for controlling a potential of said control electrode region is formed on a portion of said control electrode region, comprising the steps of: preparing a substrate provided with a first semiconductor region of said first conductivity-type semiconductor material so as to form said first main electrode region; forming a field insulating layer region on said first semiconductor region so as to define the cell; forming a second semiconductor region of the second conductivity-type semiconductor material within said first semiconductor region by a self-alignment process utilizing said field insulating layer region as a mask, so as to form said control electrode region; forming an electrode on a portion of said second semiconductor region and a portion of said field insulating layer region; forming a third semiconductor region of the first conductivity-type semiconductor material within said second semiconductor region by a self-alignment process utilizing said field insulating region and said electrode as a mask, so as to form said second main electrode region; forming an insulating layer on said third semiconductor region; forming a contact hole in said insulating layer; and forming an electrode connected to said third semiconductor region via said contact hole.
Claim 2
Independent Claim 241 words
A method for producing a photoelectric conversion device comprising a phototransistor cell including a first and a second main electrode region of a first conductivity-type semiconductor material and a control electrode region of a second conductivity-type semiconductor material different from said first conductivity-type semiconductor material in which an electrode for controlling a potential of said control electrode region is formed on a portion of said control electrode region, comprising the steps of: preparing a substrate provided with a first semiconductor region of said first conductivity-type semiconductor material so as to form said first main electrode region; forming a field insulating layer region on said first semiconductor region so as to define the cell; forming a second semiconductor region of the second conductivity-type semiconductor material within said first semiconductor region by a self-alignment process utilizing said field insulating layer region as a mask, so as to form said control electrode region; forming an electrode on a portion of said second semiconductor region and a portion of said field insulating layer region; forming a third semiconductor region of the first conductivity-type semiconductor material within said second semiconductor region by a self-alignment process utilizing said field insulating region and said electrode as a mask, so as to form said second main electrode region; forming an insulating layer on said third semiconductor region; forming a contact hole in said insulating layer; and forming an electrode connected to said third semiconductor region via said contact hole.
Claim 3
Dependent Claim 13 words
A method according to claim 1, wherein said transistor is a bipolar type.
Claim 4
Dependent Claim 14 words
A method according to claim 1, wherein a plurality of said cells are provided.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1995-02-17 1995-08-19 1996-02-18 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1999-02-17 1999-08-19 2000-02-18 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2003-02-17 2003-08-19 2004-02-18 $7700.00 Window Closed / Lapsed

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