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US5086014A
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Schottky diode manufacturing process employing the synthesis of a polycrystalline diamond thin film
Assignee: Kobe Steel Ltd
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Filing: 1990-09-18
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Granted: 1992-02-04
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Expires: 2010-09-18
Abstract
Abstract A schottky diode manufacturing process employing diamond film comprises forming a B-doped p-type polycrystalline diamond film on a low-resistance p-type Si substrate by CVD using a source gas consisting of CH 4 , H 2 and B 2 H 6 , forming an ohmic contact on the back of the p-type Si substrate, and forming a metal electrode of Al, Pt Au, Ti or W on the B-doped p-type polycrystalline diamond film. The B/C concentration ratio of the source gas is greater than 0.01 ppm and less than 20 ppm.
Inventors
- 👤 Koichi Miyata
- 👤 Kazuo Kumagai
- 👤 Koji Kobashi
- 👤 Yuichi Matsui
- 👤 Akimitsu Nakaue
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 02:10
CPC Classifications
H; H10; H10D; H10D8/00; H10D8/60; H10D62/00; H10D62/80; H10D62/83; H10D62/8303; H10D64/00; H10D64/01; H10D64/012; H10D64/0121; H10D64/60; H10D64/62; H10D8/01; H10D8/051; H10D8/30; H10P; H10P14/00; H10P14/20; H10P14/24; H10P14/29; H10P14/2901; H10P14/2902; H10P14/2905; H10P14/34; H10P14/3402; H10P14/3404; H10P14/3406; H10P14/3438; H10P14/3441; H10P14/3444; Y; Y10; Y10S; Y10S148/00; Y10S148/14
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
85 words
A Schottky diode manufacturing process employing the synthesis of a polycrystalline diamond film, comprising: a deposition of a B-doped p-type polycrystalline diamond film on a low-resistance p-type Si substrate by using a source gas consisting of CH 4 , H 2 and B 2 H 6 and having boron/carbon concentration ratio greater than 0.01 ppm and less than 20 ppm; forming an ohmic contact on the back of the p-type Si substrate; and forming a metal electrode on the B-doped p-type polycrystalline diamond thin film.
Claim 2
Dependent Claim
85 words
A Schottky diode manufacturing process employing the synthesis of a polycrystalline diamond film, comprising: a deposition of a B-doped p-type polycrystalline diamond film on a low-resistance p-type Si substrate by using a source gas consisting of CH 4 , H 2 and B 2 H 6 and having boron/carbon concentration ratio greater than 0.01 ppm and less than 20 ppm; forming an ohmic contact on the back of the p-type Si substrate; and forming a metal electrode on the B-doped p-type polycrystalline diamond thin film.
Claim 3
Dependent Claim
30 words
A Schottky diode manufacturing process according to claim 1, wherein the metal electrode is formed of a metal chosen from the group consisting of Al, Pt, Au, Ti and W.
Claim 4
Dependent Claim
150 words
A Schottky diode manufacturing process employing the synthesis of a polycrystalline diamond film, comprising the steps of: polishing a surface of a p type silicon substrate with a diamond grit having submicron diamond particles; placing said substrate in a CVD system; heating said substrate to 800° C.; flowing gas consisting of CH 4 , H 2 and B 2 H 6 through said CVD system, wherein CH 4 gas constitutes 0.5 percent of the flowing gas, the ratio of boron to carbon in said gas being between 0.01 and 20, to one million, the gas flow rate being sufficient to maintain the pressure in the system at 31.5 Torr; igniting a microwave plasma in said CVD chamber; growing a boron doped diamond film on said surface, for several hours; forming an ohmic contact on the uncoated surface of said silicon substrate; and forming a Schottky contact upon said diamond film.
Claim 5
Dependent Claim
150 words
A Schottky diode manufacturing process employing the synthesis of a polycrystalline diamond film, comprising the steps of: polishing a surface of a p type silicon substrate with a diamond grit having submicron diamond particles; placing said substrate in a CVD system; heating said substrate to 800° C.; flowing gas consisting of CH 4 , H 2 and B 2 H 6 through said CVD system, wherein CH 4 gas constitutes 0.5 percent of the flowing gas, the ratio of boron to carbon in said gas being between 0.01 and 20, to one million, the gas flow rate being sufficient to maintain the pressure in the system at 31.5 Torr; igniting a microwave plasma in said CVD chamber; growing a boron doped diamond film on said surface, for several hours; forming an ohmic contact on the uncoated surface of said silicon substrate; and forming a Schottky contact upon said diamond film.
Claim 6
Dependent Claim
42 words
A process according to claim 3, wherein said Schottky contact is formed by contacting a needle electrode tip to said diamond film, wherein said needle is formed from an element chosen from the group consisting of Al, Pt, Au, Ti and W.
Claim 7
Dependent Claim
41 words
A process according to claim 3, wherein said Schottky contact is formed by preparing a planar electrode on said diamond film, wherein said electrode is formed from a metal chosen from the group consisting of Al, Pt, Au, Ti and W.
References Cited (Backward Citations)
US4925701A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-02-03 | 1995-08-05 | 1996-02-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-02-03 | 1999-08-05 | 2000-02-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-02-03 | 2003-08-05 | 2004-02-04 | $7700.00 | Window Closed / Lapsed |