US5081005A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for reducing chemical interaction between copper features and photosensitive dielectric compositions
Assignee: Boeing Co
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Filing: 1989-03-24
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Granted: 1992-01-14
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Expires: 2009-03-24
Abstract
Abstract The surface of metallic features are coated with a desensitizer composition comprising an amino-silane to reduce the likelihood of chemical interaction between the metallic feature and a photosensitive functional group that is included in a dielectric composition that is coated over the metallic features. The chemical interaction adversely affects the photosensitivity of the dielectric composition and, thus, inhibits the formation of complete and well defined via interconnections through the dielectric composition.
Inventors
- 👤 Kishore K. Chakravorty
- 👤 Jay M. Cech
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 14:35
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/11; G03F7/075; G03F7/0755; H; H10; H10P; H10P14/00; H10P14/40; H10P14/46; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/056; H10W20/057; H10W20/071; H10W20/074; H10W20/077; H10W20/081; H05; H05K; H05K3/00; H05K3/38; H05K3/389; H05K3/46; H05K3/4644; Y; Y10; Y10S; Y10S430/00; Y10S430/155; Y10S430/162
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
104 words
A method of providing a patterned layer of a dielectric composition comprising a polyimide precursor that includes a photosensitive functional group, the method comprising: (a) applying a desensitizer composition comprising an amino-silane to a surface of a metallic feature, said photosensitive functional group being capable of chemically interacting with said metallic feature to alter the photosensitivity of said dielectric composition, the dielectric composition including a poly(amic acid) reacted to provide a photosensitive functional group therein; (b) coating said desensitizer composition comprising said amino-silane and said surface of said metallic feature with said dielectric composition; and (c) photolithographically patterning said layer of said dielectric composition.
Claim 2
Independent Claim
104 words
A method of providing a patterned layer of a dielectric composition comprising a polyimide precursor that includes a photosensitive functional group, the method comprising: (a) applying a desensitizer composition comprising an amino-silane to a surface of a metallic feature, said photosensitive functional group being capable of chemically interacting with said metallic feature to alter the photosensitivity of said dielectric composition, the dielectric composition including a poly(amic acid) reacted to provide a photosensitive functional group therein; (b) coating said desensitizer composition comprising said amino-silane and said surface of said metallic feature with said dielectric composition; and (c) photolithographically patterning said layer of said dielectric composition.
Claim 3
Dependent Claim
11 words
The method of claim 1, wherein said metallic feature comprises copper.
Claim 4
Dependent Claim
46 words
The method of claim 1, wherein said amino-silane is represented by the formula: ##STR2## wherein R 1 , R 2 , R 3 , R 5 , and R 6 are hydrogen or a lower alkyl radical, and wherein R 4 is a lower alkyl radical.
Claim 5
Dependent Claim
38 words
The method of claim 1, wherein said desensitizer composition comprising said amino-silane chemically alters said surface of said metallic feature such that said likelihood of chemical interaction between said photosensitive functional group and said metallic feature is reduced.
Claim 6
Dependent Claim
31 words
The method of claim 2, wherein said desensitizer composition comprising said amino-silane when applied to said surface of said metallic feature has a thickness ranging between about 20 and 100 angstroms.
Claim 7
Dependent Claim
36 words
The method of claim 1, wherein step (c) further comprises: photolithographically patterning fine geometry features into said layer of said dielectric composition, said fine geometry features having a width ranging between about 5 and 20 microns.
Claim 8
Dependent Claim
23 words
The method of claim 6, wherein said fine geometry features are via interconnects defined by an opening about 5 to 20 microns wide.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-01-13 | 1995-07-15 | 1996-01-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-01-13 | 1999-07-15 | 2000-01-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-01-13 | 2003-07-15 | 2004-01-14 | $7700.00 | Window Closed / Lapsed |