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US5077499A Expired / Lapsed US ⏱️ 0.0 years remaining

High-frequency feeding method for use in plasma apparatus and device for carrying out the method

Assignee: Mitsubishi Electric Corp
•
Filing: 1990-11-21
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Granted: 1991-12-31
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Expires: 2010-11-21
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Abstract

Abstract In a plasma apparatus, electric power is transmitted from a high-frequency power supply to an electrode in a plasma chamber through a feeding cable. A stub connected to the feeding cable as a matching component removes the capacitive component of the impedance of a plasma produced in the plasma chamber and equalizes the resistive component of the impedance of the plasma to the characteristic impedance of the feeding cable. As a result, the impedance of the plasma and the characteristic impedance of the feeding cable are matched, and the transmitting efficiency of the electric power is enhanced. A phase shift circuit may be used instead of the stub.

Inventors

  • 👤 Kouji Oku

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 01:01
CPC Classifications
H; H05; H05H; H05H1/00; H05H1/24; H05H1/46; H03; H03H; H03H7/00; H03H7/38

Claims Analysis

Total Claims: 14
Claim 1
Independent Claim 136 words
A method of feeding high-frequency electrical power to a plasma in a plasma apparatus comprising: initiating the plasma in the plasma apparatus, the plasma having an impedance including a resistive component and a capacitive component; transmitting high-frequency electrical power from a power supply to an electrode in the plasma apparatus through a feeding cable having a characteristic impedance including a resistive component and a reactive component to sustain the plasma in the plasma apparatus; and matching the characteristic impedance of said feeding cable to the impedance of the plasma produced in said plasma apparatus so that the capacitive component of the impedance of the plasma and the reactive component of the impedance of said feeding cable cancel each other and the resistive components of the impedances of the plasma and said feeding cable are substantially equal.
Claim 2
Independent Claim 136 words
A method of feeding high-frequency electrical power to a plasma in a plasma apparatus comprising: initiating the plasma in the plasma apparatus, the plasma having an impedance including a resistive component and a capacitive component; transmitting high-frequency electrical power from a power supply to an electrode in the plasma apparatus through a feeding cable having a characteristic impedance including a resistive component and a reactive component to sustain the plasma in the plasma apparatus; and matching the characteristic impedance of said feeding cable to the impedance of the plasma produced in said plasma apparatus so that the capacitive component of the impedance of the plasma and the reactive component of the impedance of said feeding cable cancel each other and the resistive components of the impedances of the plasma and said feeding cable are substantially equal.
Claim 3
Dependent Claim 153 words
A feeding device for supplying high-frequency electrical power to an electrode in a plasma apparatus comprising: the plasma apparatus including the electrode for establishing and sustaining plasma in the apparatus in a reaction gas, the plasma being sustained by high-frequency electrical energy supplied to the plasma, the plasma having an impedance including a capacitive component and a resistive component; a power supply for producing high-frequency electrical energy; a feeding cable having a characteristic impedance including a resistive component and a reactive component connecting said power supply to said electrode in said plasma apparatus; and matching means for matching the characteristic impedance of said feeding cable to the impedance of the plasma produced in said plasma apparatus by cancelling the capacitive component of the impedance of the plasma with the reactive component of the impedance of said feeding cable and equalizing the resistive components of the impedances of the plasma and said feeding cable.
Claim 4
Dependent Claim 153 words
A feeding device for supplying high-frequency electrical power to an electrode in a plasma apparatus comprising: the plasma apparatus including the electrode for establishing and sustaining plasma in the apparatus in a reaction gas, the plasma being sustained by high-frequency electrical energy supplied to the plasma, the plasma having an impedance including a capacitive component and a resistive component; a power supply for producing high-frequency electrical energy; a feeding cable having a characteristic impedance including a resistive component and a reactive component connecting said power supply to said electrode in said plasma apparatus; and matching means for matching the characteristic impedance of said feeding cable to the impedance of the plasma produced in said plasma apparatus by cancelling the capacitive component of the impedance of the plasma with the reactive component of the impedance of said feeding cable and equalizing the resistive components of the impedances of the plasma and said feeding cable.
Claim 5
Dependent Claim 22 words
A feeding device as claimed in claim 2, wherein said matching means includes at least one stub connected to said feeding cable.
Claim 6
Dependent Claim 53 words
A feeding device as claimed in claim 3, wherein said matching means includes three stubs connected in parallel, each stub including a first short-circuited end and a second end connected to said feeding cable, said stubs being respectively connected to said feeding cable at intervals of 1/4 wavelength of the high-frequency electrical energy.
Claim 7
Dependent Claim 25 words
A feeding device as claimed in claim 2, wherein said matching means is a phase shift circuit including three stubs connected to said feeding cable.
Claim 8
Dependent Claim 54 words
A feeding device as claimed in claim 5, wherein said phase shift circuit comprises two 90° phase shifters respectively connected to said feeding cable in series, first and second variable phase shifters connected to said feeding cable, and a third variable phase shifter connected to said feeding cable between said two 90° phase shifters.
Claim 9
Dependent Claim 24 words
A feeding device as claimed in claim 6, wherein said 90° phase shifters respectively include a π circuit including a inductance and two capacitances.
Claim 10
Dependent Claim 51 words
A feeding device as claimed in claim 6, wherein said variable phase shifters respectively comprise a coil having first and second ends, said first end being connected to said feeding cable and said second end being electrically open, and a sliding tap sliding on said coil to vary the phase shift.
Claim 11
Dependent Claim 50 words
A feeding device as claimed in claim 6, wherein said variable phase shifters respectively comprise a coil having first and second ends, said first end being connected to said feeding cable and said second end being short-circuited, and a sliding tap sliding on said coil to vary the phase shift.
Claim 12
Dependent Claim 19 words
A feeding device as claimed in claim 6, wherein said variable phase shifters respectively comprise a power delay circuit.
Claim 13
Dependent Claim 16 words
A feeding device as claimed in claim 2, wherein said feeding cable is a coaxial cable.
Claim 14
Dependent Claim 17 words
A feeding device as claimed in claim 2, wherein said feeding cable is a copper plate strap.

References Cited (Backward Citations)

US3569777A Cited
US4877999A Cited
US4792732A Cited
US4887005A Cited
US4956582A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1994-12-30 1995-07-01 1995-12-31 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1998-12-30 1999-07-01 1999-12-31 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2002-12-30 2003-07-01 2003-12-31 $7700.00 Window Closed / Lapsed

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