US5043299B1
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for selective deposition of tungsten on semiconductor wafer
Assignee: Applied Materials Inc
•
Filing: 1989-12-01
•
Granted: 1997-02-25
•
Expires: 2009-12-01
Abstract
No abstract record available.
Inventors
- 👤 Mei Chang
- 👤 David N Wang
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 11:39
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/40; H10P14/42; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/056; H10W20/057; H10P14/43; H10P14/432; Y; Y10; Y10S; Y10S148/00; Y10S148/051; Y10S438/00; Y10S438/906; Y10S438/907; Y10S438/908
Claims Analysis
Total Claims: 0
No claims parsed yet. Click Sync Now above to re-index claims from Google Patents.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-02-25 | 2000-08-26 | 2001-02-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-02-25 | 2004-08-26 | 2005-02-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-02-25 | 2008-08-26 | 2009-02-25 | $7700.00 | Window Closed / Lapsed |