US5037506A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of stripping layers of organic materials
Assignee: Best Label Co Inc
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Filing: 1990-09-06
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Granted: 1991-08-06
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Expires: 2010-09-06
Abstract
Abstract Gaseous sulfur trioxide is used to remove various organic coatings, polymerized photoresist, and especially implant and deep-UV hardened photoresist layers, during the manufacture of semiconductor or ceramic devices.
Inventors
- 👤 Subhash Gupta
- 👤 Bhanwar Singh
- 👤 Ahmad Waleh
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 21:51
CPC Classifications
H; H10; H10P; H10P70/00; H10P70/10; H10P70/12; G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; H10P50/00; H10P50/20; H10P50/28; H10P50/286; H10P50/287; H05; H05K; H05K3/00; H05K3/22; H05K3/26; Y; Y10; Y10S; Y10S134/00; Y10S134/902; Y10S438/00; Y10S438/906
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
47 words
A process for substantially completely removing organic coatings on the surface of a semiconductor wafer, said process comprising exposing said organic coating to a vapor consisting essentially of water-free gaseous sulfur trioxide, said wafer being maintained at a temperature ranging from about room temperature to 150° C.
Claim 2
Dependent Claim
47 words
A process for substantially completely removing organic coatings on the surface of a semiconductor wafer, said process comprising exposing said organic coating to a vapor consisting essentially of water-free gaseous sulfur trioxide, said wafer being maintained at a temperature ranging from about room temperature to 150° C.
Claim 3
Dependent Claim
24 words
The process of claim 1 further comprising rinsing said surface in a solvent subsequent to exposing said organic coating to said gaseous sulfur trioxide.
Claim 4
Dependent Claim
26 words
The process of claim 2 wherein said solvent consists essentially of a member selected from the group consisting of water, lower alkanols, acetone, and mixtures thereof.
Claim 5
Dependent Claim
14 words
The process of claim 3 wherein said solvent consists essentially of water or iso-propanol.
Claim 6
Dependent Claim
23 words
The process of claim 1 wherein said organic coating is exposed to said gaseous sulfur trioxide at a temperature of about room temperature.
Claim 7
Dependent Claim
22 words
The process of claim 4 wherein said exposure is performed for a period of time ranging from about 5 to 150 sec.
Claim 8
Dependent Claim
12 words
The process of claim 1 wherein said organic coating comprises a photoresist.
Claim 9
Dependent Claim
62 words
A process for substantially completely removing organic coatings on surfaces, said process comprising (a) exposing said organic coating to a vapor consisting essentially of water-free gaseous sulfur trioxide, said organic coating being maintained at a temperature ranging from about room temperature to 150° C., and (b) rinsing said surface in water subsequent to exposing said organic coating to said gaseous sulfur trioxide.
Claim 10
Dependent Claim
62 words
A process for substantially completely removing organic coatings on surfaces, said process comprising (a) exposing said organic coating to a vapor consisting essentially of water-free gaseous sulfur trioxide, said organic coating being maintained at a temperature ranging from about room temperature to 150° C., and (b) rinsing said surface in water subsequent to exposing said organic coating to said gaseous sulfur trioxide.
Claim 11
Dependent Claim
15 words
The process of claim 8 further comprising repeating steps (a) and (b) at least once.
Claim 12
Dependent Claim
19 words
The process of claim 8 wherein said organic coating is exposed to said gaseous sulfur trioxide at room temperature.
Claim 13
Dependent Claim
22 words
The process of claim 10 wherein said exposure is performed for a period of time ranging from about 5 to 150 sec.
Claim 14
Dependent Claim
12 words
The process of claim 8 wherein said organic coating comprises a photoresist.
Claim 15
Dependent Claim
75 words
A process for substantially completely removing photoresist coatings on semiconductor wafers, comprising: (a) placing said wafer in a chamber; (b) purging said chamber with a dry gas selected from the group consisting of an inert gas and nitrogen; and (c) introducing a vapor consisting essentially of water-free gaseous sulfur trioxide into said chamber to react with said photoresist coating, said photoresist coating being maintained at a temperature ranging from about room temperature to 150° C.
Claim 16
Dependent Claim
75 words
A process for substantially completely removing photoresist coatings on semiconductor wafers, comprising: (a) placing said wafer in a chamber; (b) purging said chamber with a dry gas selected from the group consisting of an inert gas and nitrogen; and (c) introducing a vapor consisting essentially of water-free gaseous sulfur trioxide into said chamber to react with said photoresist coating, said photoresist coating being maintained at a temperature ranging from about room temperature to 150° C.
Claim 17
Dependent Claim
25 words
The process of claim 13 wherein said water is subsequently rinsed in a solvent consisting essentially of water or iso-propanol to remove any reaction products.
Claim 18
Dependent Claim
33 words
The process of claim 14 wherein a process cycle comprises exposing said wafer to said gaseous sulfur trioxide and rinsing said wafer in said solvent, said process cycle being performed at least twice.
Claim 19
Dependent Claim
23 words
The process of claim 13 wherein said organic coating is exposed to said gaseous sulfur trioxide at a temperature of about room temperature.
Claim 20
Dependent Claim
27 words
The process of claim 13 wherein said wafer is exposed to said gaseous sulfur trioxide for a period of time ranging from about 5 to 150 sec.
References Cited (Backward Citations)
US4520046A
Cited
US4778536A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-08-05 | 1995-02-04 | 1995-08-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-08-05 | 1999-02-04 | 1999-08-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-08-05 | 2003-02-04 | 2003-08-06 | $7700.00 | Window Closed / Lapsed |