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US5035479A Expired / Lapsed US ⏱️ 0.0 years remaining

Device for optical signal processing showing transistor operation

Assignee: Imec
•
Filing: 1989-06-19
•
Granted: 1991-07-30
•
Expires: 2009-06-19
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Abstract

Abstract An optical device provided with a junction region for reflecting radiation to be transmitted in the device, and a gate for controlling the electron density in said junction region, is fast and simple to manufacture.

Inventors

  • 👤 Roger A. Vounckx

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-27 23:52
CPC Classifications
G; G02; G02F; G02F1/00; G02F1/29; G02F1/31; G02F1/313; G02F1/3132; G02F1/3133; G02F1/01; G02F1/015; G02F1/025

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 94 words
A device for optical signal processing comprising: a substrate; a waveguide of doped semiconductor material on top of the substrate, the waveguide having a refractive index which is not greater than the refractive index of the substrate; a junction region between the waveguide and the substrate; and a gate for receiving an electric potential with respect to the substrate is positioned on top of the waveguide, whereby the passage of light through the waveguide in a direction parallel to the junction region is controllable by the application of an electrical potential to the gate.
Claim 2
Independent Claim 94 words
A device for optical signal processing comprising: a substrate; a waveguide of doped semiconductor material on top of the substrate, the waveguide having a refractive index which is not greater than the refractive index of the substrate; a junction region between the waveguide and the substrate; and a gate for receiving an electric potential with respect to the substrate is positioned on top of the waveguide, whereby the passage of light through the waveguide in a direction parallel to the junction region is controllable by the application of an electrical potential to the gate.
Claim 3
Dependent Claim 59 words
A device for optical signal processing as recited in claim 1, wherein the materials chosen for the substrate and the waveguide are selected such that there is a discontinuity between their conducting bands, causing electrons in the waveguide to migrate to the substrate, thereby creating a two-dimensional gas of electrons having a very high mobility in the junction region.
Claim 4
Dependent Claim 27 words
A device for optical signal processing as recited in claim 2, the plasma frequency of the electron gas is preferably higher than the frequency of the light.
Claim 5
Dependent Claim 21 words
A device for optical signal processing as recited in claim 1, wherein the substrate comprises GaAs and the waveguide comprises AlGaAs:Si.
Claim 6
Dependent Claim 36 words
A device for optical signal processing as recited in claim 1, wherein the waveguide consists of non-doped GaAs, the substrate consists of GaAs, and the junction region comprises a double heterojunction structure of GaAs and AlAs:Si.
Claim 7
Dependent Claim 47 words
A device for optical signal processing as recited in claim 1, wherein the waveguide consists of non-doped AlAs, the substrate comprises a non-doped AlAs layer of 1 μm thickness and the junction region between the waveguide and the substrate comprises a double heterojunction of GaAs and AlAs:Si.
Claim 8
Dependent Claim 43 words
A device for optical signal processing as recited in claim 1, wherein the waveguide consists of non-doped SdTe, the substrate comprises CdTe and the junction region between the waveguide and the substrate comprises a double heterojunction between InSb and SdTe doped with Si.
Claim 9
Dependent Claim 84 words
A device for optical signal processing as recited in claim 1, wherein the substrate comprises undoped n-type GaAs, the waveguide undoped p-type GaAs and the junction region comprises an undoped layer of GaAs having a thickness equal to or greater than 100 nm and a doping concentration of 3.10 18 cm -3 <N D <1.10 19 cm -3 , which is directly on top of the substrate and a barrier layer on top of the junction region of approximately 30 nm of undoped AlAs.

References Cited (Backward Citations)

US4211488A Cited
US4784451A Cited
US4721983A Cited
JPS62190779A Cited
EP0258530A2 Cited
DE3712864A1 Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1994-07-29 1995-01-28 1995-07-30 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1998-07-29 1999-01-28 1999-07-30 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2002-07-29 2003-01-28 2003-07-30 $7700.00 Window Closed / Lapsed

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