US5028359A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process of consolidating low-melting materials
Assignee: Syensqo Specialty Polymers Italy SpA
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Filing: 1988-10-12
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Granted: 1991-07-02
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Expires: 2008-10-12
Abstract
Abstract A process for the consolidation of discrete, particulate, low-melting or liquid materials, characterized in that said materials are consolidated in their particulate discrete form by application of vapors of at least one p-xylylene monomer and/or of a derivative thereof, which is polymerized under vacuum. The materials are thus given the surface characteristics of a solid, with enhanced properties of mechanical, physical and/or chemical strength, even in the presence of high temperatures. The invention is particularly useful for the metered addition of predetermined amounts of compositions or for moving mechanical parts.
Inventors
- 👤 Aldo Cicuta
- 👤 Vincenzo Massa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 01:57
CPC Classifications
C; C08; C08G; C08G61/00; C08G61/02; C08G61/025; C08G2261/00; C08G2261/30; C08G2261/34; C08G2261/342; C08G2261/3424
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
79 words
Process of consolidating low-melting or liquid discrete particulate materials in their discrete particulate form, comprising applying a coating of at least one p-xylylene monomer and/or derivatives thereof polymerized under vacuum, said process including the steps of vapor vacuum depositing the p-xylylene monomer onto molds, applying an individual particle of the low melting or liquid material to each of the molds, applying a second layer of the p-xylene monomer by vapor vacuum deposition and removing consolidated particle from the molds.
Claim 2
Dependent Claim
79 words
Process of consolidating low-melting or liquid discrete particulate materials in their discrete particulate form, comprising applying a coating of at least one p-xylylene monomer and/or derivatives thereof polymerized under vacuum, said process including the steps of vapor vacuum depositing the p-xylylene monomer onto molds, applying an individual particle of the low melting or liquid material to each of the molds, applying a second layer of the p-xylene monomer by vapor vacuum deposition and removing consolidated particle from the molds.
Claim 3
Dependent Claim
104 words
Process according to claim 1, wherein the p-xylylene monomer corresponds to formula (I): ##STR4## wherein: X represents a (C 1 -C 6 )-alkyl group, a (C 6 -C 10 )-aryl group, a (C 7 -C 16 )-aralkyl group, a haloalkyl or halo-aralkyl group, an acetoxy group, an alkenyl group, an aminoalkyl group, an arylamino group, a cyano group, an alkoxy group, a hydroxy group, a nitro group, a halogen atom, a sulphonic radical and a sulphonic ester, phosphorus-containing substitutents, sulphonic groups, sulphide groups, alkyl-sulphoxide groups, or a hydrogen atom, and m is equal to 0 or is an integer of from 1 to 4.
Claim 4
Dependent Claim
124 words
Process according to claim 1 or 2, wherein the p-xylylene monomer of formula (I) is obtained by thermal cracking, at a temperature higher than 400° C., of the corresponding (2,2)-para-p-cyclophane having formula (II): ##STR5## wherein: X and X', equal to or different from each other, represent (C 1 -C 6 )-alkyl groups, (C 6 -C 10 )-aryl groups, (C 7 -C 16 )-aralkyl groups, haloalkyl or haloaralkyl groups, acetoxy groups, alkenyl groups, aminoalkyl groups, aryalamino groups, cyano groups, alkoxy groups, hydroxy groups, nitro groups, halogen atoms, sulphonic radicals or sulphonic esters, phosphorus-containing substituents, sulphonic groups, sulphide groups, alkyl-sulphoxide groups, or hydrogen atoms, and m and n, equal to or different from each other, are equal to 0, or represent integers from 1 to 4.
Claim 5
Dependent Claim
30 words
Process according to claim 1 or 2, wherein the p-xylylene monomer is selected from the class consisting of chloro-p-xylylene, cyano-p-xylylene, iodo-p-xylylene, fluoro-p-xylylene, hydroxymethyl-p-xylylene, ethyl-p-xylylene, methyl-p-xylylene, aminomethyl-p-xylylene, carbomethoxy-p-xylylene, and their mixtures.
Claim 6
Dependent Claim
28 words
Process according to claim 1 or 2, wherein the process is carried out by the "vapor vacuum deposition" technique inside a deposition chamber revolving around a horizontal axis.
Claim 7
Dependent Claim
31 words
Process according to claim 1 or 2, wherein the process is carried by the "vapor vacuum deposition" technique inside a deposition chamber equipped with support plates revolving around a vertical axis.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-07-01 | 1994-12-31 | 1995-07-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-07-01 | 1998-12-31 | 1999-07-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-07-01 | 2002-12-31 | 2003-07-02 | $7700.00 | Window Closed / Lapsed |