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US5024991A Expired / Lapsed US ⏱️ 0.0 years remaining

Composition using Schiff base copper complex for preparing compound metal oxides

Assignee: Mitsubishi Metal Corp
•
Filing: 1988-08-01
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Granted: 1991-06-18
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Expires: 2008-08-01
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Abstract

Abstract A composition for forming a compound metal oxide of a specific composition and a process for preparing said compound oxide are disclosed. The composition comprises an alkoxide of a rare earth metal, an alkoxide of an alkaline earth metal and an organic acid salt of an organic complex of copper. The process comprises refluxing said composition for reaction and thermally decomposing the reaction product. Also a film-forming composition for forming a thin layer of a compound metal oxide is disclosed. Said film-forming compound comprises the above-mentioned composition plus a film forming resin and an organic solvent.

Inventors

  • 👤 Makoto Tsunashima
  • 👤 Hiroto Uchida
  • 👤 Kazuhiro Sakai
  • 👤 Masato Miyauchi

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 04:08
CPC Classifications
H; H10; H10N; H10N60/00; H10N60/01; H10N60/0268; H10N60/0296; H10N60/0324; C; C04; C04B; C04B35/00; C04B35/01; C04B35/45; C04B35/4504; C04B35/622; C04B35/626; C04B35/63; C04B35/632; C04B35/636; C04B35/6365; Y; Y10; Y10S; Y10S505/00; Y10S505/725; Y10S505/734

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 96 words
A composition for preparing a compound oxide of a rare earth metal, an alkaline earth metal and copper in a specific content ratio which comprises: (1) an alkoxide of a rare earth metal, (2) an alkoxide of an alkaline earth metal, and (3) a Schiff base chelate complex of copper, in such content ratio that the amount of the rare earth metal in said alkoxide, the amount of the alkaline earth metal in said alkoxide and the amount of copper in said complex correspond to the amounts of these metals in the object compound metal oxide.
Claim 2
Dependent Claim 96 words
A composition for preparing a compound oxide of a rare earth metal, an alkaline earth metal and copper in a specific content ratio which comprises: (1) an alkoxide of a rare earth metal, (2) an alkoxide of an alkaline earth metal, and (3) a Schiff base chelate complex of copper, in such content ratio that the amount of the rare earth metal in said alkoxide, the amount of the alkaline earth metal in said alkoxide and the amount of copper in said complex correspond to the amounts of these metals in the object compound metal oxide.
Claim 3
Dependent Claim 78 words
A composition as recited in claim 1, wherein said Schiff base chelate complex of copper has the formula ##STR10## wherein R 1 and R 3 are --CH 3 , --C 2 H 5 , --C 6 H 5 or --CF 3 ; R 2 is --H, --CH 3 , --C 2 H 5 , --C 6 H 5 or --CF 3 ; and B is --(CH 2 ) n --, wherein n is 2, 3 or 4, ##STR11##
Claim 4
Dependent Claim 94 words
A film-forming composition for forming a thin film of the compound metal oxide comprising (1) an alkoxide of a rare earth metal, (2) an alkoxide of an alkaline earth metal, and (3) a Schiff base chelate complex of copper, in such content ratio that the amount of the rare earth metal in said alkoxide, the amount of the alkaline earth metal in said alkoxide and the amount of copper in said complex correspond to the amounts of these metals in the object compound metal oxide, (4) a film-forming resin, and (5) an organic solvent.
Claim 5
Dependent Claim 94 words
A film-forming composition for forming a thin film of the compound metal oxide comprising (1) an alkoxide of a rare earth metal, (2) an alkoxide of an alkaline earth metal, and (3) a Schiff base chelate complex of copper, in such content ratio that the amount of the rare earth metal in said alkoxide, the amount of the alkaline earth metal in said alkoxide and the amount of copper in said complex correspond to the amounts of these metals in the object compound metal oxide, (4) a film-forming resin, and (5) an organic solvent.
Claim 6
Dependent Claim 79 words
A film-forming composition as recited in claim 3, wherein said Schiff base chelate complex of copper has the formula ##STR12## wherein R 1 and R 3 are --CH 3 , --C 2 H 5 , --C 6 H 5 or --CF 3 ; R 2 is --H, --CH 3 , --C 2 H 5 , --C 6 H 5 or --CF 3 ; and B is --(CH 2 ) n --, wherein n is 2, 3 or 4, ##STR13##

References Cited (Backward Citations)

US4148940A Cited
US4485094A Cited
US4719127A Cited
JPS60115841A Cited
JPS6262507A Cited
JPS62143826A Cited
JPS62267476A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1994-06-17 1994-12-17 1995-06-18 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1998-06-17 1998-12-17 1999-06-18 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2002-06-17 2002-12-17 2003-06-18 $7700.00 Window Closed / Lapsed

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