US5023110A
Expired / Lapsed
US
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Process for producing electron emission device
Assignee: Canon Inc
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Filing: 1989-05-01
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Granted: 1991-06-11
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Expires: 2009-05-01
Abstract
Abstract A process for producing an electron emission device having voltage controlled negative resistance (VCNR) characteristics. A conductive thin film containing fine particles of a metal, metal oxide, semiconductor or the like is formed on a substrate between opposing electrodes which are also form on the substrate. A voltage is applied across the conductive thin film to generate heat with which the conductive thin film is heat treated to have an island structure which is formed of a spatially discontinuous film of fine particles and which serves as an electron emitting region.
Inventors
- 👤 Ichiro Nomura
- 👤 Tetsuya Kaneko
- 👤 Yoshikazu Banno
- 👤 Toshihiko Takeda
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 16:08
CPC Classifications
H; H01; H01J; H01J1/00; H01J1/02; H01J1/30; H01J1/316
Claims Analysis
Total Claims: 36
Claim 1
Independent Claim
81 words
A process for producing an electron emission device having opposing electrodes arranged on a substrate and an electron emitting region formed between said opposing electrodes, the forming of said electron emitting region comprising the steps of: forming a conductive thin film containing fine particles of particle sizes ranging between several tens of Angstroms (Å) and several micrometers (μm) between the opposing electrodes; and effecting a heat treatment on said conductive thin film by supplying electric current to said conductive thin film.
Claim 2
Dependent Claim
81 words
A process for producing an electron emission device having opposing electrodes arranged on a substrate and an electron emitting region formed between said opposing electrodes, the forming of said electron emitting region comprising the steps of: forming a conductive thin film containing fine particles of particle sizes ranging between several tens of Angstroms (Å) and several micrometers (μm) between the opposing electrodes; and effecting a heat treatment on said conductive thin film by supplying electric current to said conductive thin film.
Claim 3
Dependent Claim
19 words
A process according to claim 1, wherein the distance between the opposing electrodes ranges between 1000Å and 10 μm.
Claim 4
Dependent Claim
36 words
A process according to claim 1, wherein said conductive thin film containing said fine particles is formed to exhibit an electrical resistance ranging between 1.0×10 4 Ω/□ and 2.0×10 7 Ω/□ in terms of sheet resistance.
Claim 5
Dependent Claim
23 words
A process according to claim 1, wherein said conductive thin film is formed by a gas deposition technique or a dispersion application technique.
Claim 6
Dependent Claim
28 words
A process according to claim 1, wherein said heat treatment is effected by applying a total voltage of 4 V to 14 V across said conductive thin film.
Claim 7
Dependent Claim
21 words
A process according to claim 1, wherein said heat treatment is conducted in a vacuum or in an inert gas atmosphere.
Claim 8
Dependent Claim
96 words
A process for producing an electron emission device having opposing electrodes arranged on a substrate and an electron emitting region formed between said opposing electrodes, the forming of said electron emitting region comprising the steps of: forming a conductive thin film containing fine particles of particle sizes ranging between several tens of Angstroms (Å) and several micrometers (μm) between the opposing electrodes; and effecting a heat treatment on said conductive thin film by supplying electric current to said conductive thin film to form a conductive thin film showing voltage controlled negative resistance characteristics between said electrodes.
Claim 9
Dependent Claim
96 words
A process for producing an electron emission device having opposing electrodes arranged on a substrate and an electron emitting region formed between said opposing electrodes, the forming of said electron emitting region comprising the steps of: forming a conductive thin film containing fine particles of particle sizes ranging between several tens of Angstroms (Å) and several micrometers (μm) between the opposing electrodes; and effecting a heat treatment on said conductive thin film by supplying electric current to said conductive thin film to form a conductive thin film showing voltage controlled negative resistance characteristics between said electrodes.
Claim 10
Dependent Claim
19 words
A process according to claim 7, wherein the distance between the opposing electrodes ranges between 1000Å and 10 μm.
Claim 11
Dependent Claim
36 words
A process according to claim 7, wherein said conductive thin film containing said fine particles is formed to exhibit an electrical resistance ranging between 1.0×10 4 Ω/□ and 2.0×10 7 Ω/□ in terms of sheet resistance.
Claim 12
Dependent Claim
23 words
A process according to claim 7, wherein said conductive thin film is formed by gas a deposition technique or a dispersion application technique.
Claim 13
Dependent Claim
28 words
A process according to claim 7, wherein said heat treatment is effected by applying a total voltage of 4 V to 14 V across said conductive thin film.
Claim 14
Dependent Claim
21 words
A process according to claim 7, wherein said heat treatment is conducted in a vacuum or in an inert gas atmosphere.
Claim 15
Dependent Claim
95 words
A process for producing an electron emission device having opposing electrodes arranged on a substrate and an electron emitting region formed between said opposing electrodes, the forming of said electron emitting region comprising the steps of: forming a conductive thin film containing fine particles of particle sizes ranging between several tens of Angstroms (Å) and several micrometers (μm) between the opposing electrodes; and effecting a heat treatment on said conductive thin film by supplying electric current to said conductive thin film, to form a conductive thin film spatially discontinuous and electrically connected, between said electrodes.
Claim 16
Dependent Claim
95 words
A process for producing an electron emission device having opposing electrodes arranged on a substrate and an electron emitting region formed between said opposing electrodes, the forming of said electron emitting region comprising the steps of: forming a conductive thin film containing fine particles of particle sizes ranging between several tens of Angstroms (Å) and several micrometers (μm) between the opposing electrodes; and effecting a heat treatment on said conductive thin film by supplying electric current to said conductive thin film, to form a conductive thin film spatially discontinuous and electrically connected, between said electrodes.
Claim 17
Dependent Claim
101 words
A process for producing an electron emission device having opposing electrodes arranged on a substrate and an electron emitting region formed between said opposing electrodes, the forming of said electron emitting region comprising the steps of: forming a conductive thin film containing fine particles of particle sizes ranging between several tens of Angstroms (Å) and several micrometers (μm) between said electrodes; and effecting a heat treatment on said conductive thin film by supplying electric current to said conductive thin film, to form a conductive thin film spatially discontinuous and electrically connected and showing voltage controlled negative resistance characteristics, between said electrodes.
Claim 18
Dependent Claim
101 words
A process for producing an electron emission device having opposing electrodes arranged on a substrate and an electron emitting region formed between said opposing electrodes, the forming of said electron emitting region comprising the steps of: forming a conductive thin film containing fine particles of particle sizes ranging between several tens of Angstroms (Å) and several micrometers (μm) between said electrodes; and effecting a heat treatment on said conductive thin film by supplying electric current to said conductive thin film, to form a conductive thin film spatially discontinuous and electrically connected and showing voltage controlled negative resistance characteristics, between said electrodes.
Claim 19
Dependent Claim
63 words
A process for producing an electron emission device having opposing electrodes arranged on a substrate and an electron emitting region formed between said opposing electrodes comprising the steps of: forming a conductive thin film containing fine particles of particle sizes ranging between several tens of Angstroms (Å) and several micrometers (μm) between said electrodes; and supplying a voltage to said conductive thin film.
Claim 20
Dependent Claim
63 words
A process for producing an electron emission device having opposing electrodes arranged on a substrate and an electron emitting region formed between said opposing electrodes comprising the steps of: forming a conductive thin film containing fine particles of particle sizes ranging between several tens of Angstroms (Å) and several micrometers (μm) between said electrodes; and supplying a voltage to said conductive thin film.
Claim 21
Dependent Claim
19 words
A process according to claim 15, wherein the distance between the opposing electrodes ranges between 1000Å and 10 μm.
Claim 22
Dependent Claim
36 words
A process according to claim 15, wherein said conductive thin film containing said fine particles is formed to exhibit an electrical resistance ranging between 1.0×10 4 Ω/□ and 2.0×10 7 Ω/□ in terms of sheet resistance.
Claim 23
Dependent Claim
21 words
A process according to claim 15, wherein said conductive thin film is formed by gas deposition technique or dispersion application technique.
Claim 24
Dependent Claim
28 words
A process according to claim 15, wherein said heat treatment is effected by applying a total voltage of 4 V to 14 V across said conductive thin film.
Claim 25
Dependent Claim
22 words
A process according to claim 15, wherein said supplying a voltage is conducted in a vacuum or in an inert gas atmosphere.
Claim 26
Dependent Claim
84 words
A process for producing an electron emission device having opposing electrodes arranged on a substrate and an electron emitting region formed between said opposing electrodes, the forming of said electron emitting region comprising the steps of: forming a conductive thin film containing fine particles of particle sizes ranging between several tens of Angstroms (Å) and several micrometers (μm) between said electrodes; and supplying a voltage of said conductive thin film to form a conductive film showing voltage controlled negative resistance characteristics between said electrodes.
Claim 27
Dependent Claim
84 words
A process for producing an electron emission device having opposing electrodes arranged on a substrate and an electron emitting region formed between said opposing electrodes, the forming of said electron emitting region comprising the steps of: forming a conductive thin film containing fine particles of particle sizes ranging between several tens of Angstroms (Å) and several micrometers (μm) between said electrodes; and supplying a voltage of said conductive thin film to form a conductive film showing voltage controlled negative resistance characteristics between said electrodes.
Claim 28
Dependent Claim
19 words
A process according to claim 21, wherein the distance between the opposing electrodes ranges between 1000Å and 10 μm.
Claim 29
Dependent Claim
36 words
A process according to claim 21, wherein said conductive thin film containing said fine particles is formed to exhibit an electrical resistance ranging between 1.0×10 4 Ω/□ and 2.0×10 7 Ω/□ in terms of sheet resistance.
Claim 30
Dependent Claim
23 words
A process according to claim 21, wherein said conductive thin film is formed by a gas deposition technique or a dispersion application technique.
Claim 31
Dependent Claim
28 words
A process according to claim 21, wherein said heat treatment is effected by applying a total voltage of 4 V to 14 V across said conductive thin film.
Claim 32
Dependent Claim
22 words
A process according to claim 21, wherein said supplying a voltage is conducted in a vacuum or in an inert gas atmosphere.
Claim 33
Dependent Claim
84 words
A process for producing an electron emission device having opposing electrodes arranged on a substrate and an electron emitting region formed between said opposing electrodes, the forming of said electron emitting region comprising the steps of: forming a conductive thin film containing fine particles of particle sizes ranging between several tens of Angstroms (Å) and several micrometers (μm) between said electrodes; and supplying a voltage of said conductive thin film, to form a conductive thin film spatially discontinuous and electrically connected, between said electrodes.
Claim 34
Dependent Claim
84 words
A process for producing an electron emission device having opposing electrodes arranged on a substrate and an electron emitting region formed between said opposing electrodes, the forming of said electron emitting region comprising the steps of: forming a conductive thin film containing fine particles of particle sizes ranging between several tens of Angstroms (Å) and several micrometers (μm) between said electrodes; and supplying a voltage of said conductive thin film, to form a conductive thin film spatially discontinuous and electrically connected, between said electrodes.
Claim 35
Dependent Claim
90 words
A process for producing an electron emission device having opposing electrodes arranged on a substrate and an electron emitting region formed between said opposing electrodes, the forming of said electron emitting region comprising the steps of: forming a conductive thin film containing fine particles of particle sizes ranging between several tens of Angstroms (Å) and several micrometers (μm) between said electrodes; and supplying a voltage of said conductive thin film, to form a conductive film spatially discontinuous and electrically connected and showing voltage controlled negative resistance characteristics, between said electrodes.
Claim 36
Dependent Claim
90 words
A process for producing an electron emission device having opposing electrodes arranged on a substrate and an electron emitting region formed between said opposing electrodes, the forming of said electron emitting region comprising the steps of: forming a conductive thin film containing fine particles of particle sizes ranging between several tens of Angstroms (Å) and several micrometers (μm) between said electrodes; and supplying a voltage of said conductive thin film, to form a conductive film spatially discontinuous and electrically connected and showing voltage controlled negative resistance characteristics, between said electrodes.
References Cited (Backward Citations)
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1994-06-10 | 1994-12-10 | 1995-06-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-06-10 | 1998-12-10 | 1999-06-11 | $3760.00 | Window Closed / Lapsed |
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