US5009930A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for forming a deposited layer on a skirted substrate
Assignee: Philips North America LLC
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Filing: 1989-12-08
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Granted: 1991-04-23
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Expires: 2009-12-08
Abstract
Abstract A method whereby the thickness distribution of a vapor deposited layer, such as an interference filter deposited on a skirted substrate such as a glass faceplate for a projection television tube, is improved by shielding the substrate from indirect flux of vapor so as to reduce the shadowing effect of the skirt upon the thickness distribution of the deposited layer, thereby improving the white field uniformity of the resultant projection image.
Inventors
- 👤 Matthew S. Brennesholtz
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 00:23
CPC Classifications
H; H01; H01J; H01J9/00; H01J9/20; C; C03; C03C; C03C17/00; C03C17/001; C23; C23C; C23C14/00; C23C14/22; C23C16/00; C23C16/44; C23C16/455; H01J29/00; H01J29/02; H01J29/10; H01J29/18; H01J29/185
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
90 words
A method for reducing the shadowing effect of the skirt of a skirted substrate on the thickness uniformity of a deposited layer on the substrate, said skirt extending in the direction of a primary source of deposited material, the method comprising: providing at least one shield between the primary source of the deposited material and the substrate to at least partially shield the substrate from secondary indirect sources of deposited material located outside the area of direct flux of the particles from the primary source to the substrate, during deposition.
Claim 2
Independent Claim
90 words
A method for reducing the shadowing effect of the skirt of a skirted substrate on the thickness uniformity of a deposited layer on the substrate, said skirt extending in the direction of a primary source of deposited material, the method comprising: providing at least one shield between the primary source of the deposited material and the substrate to at least partially shield the substrate from secondary indirect sources of deposited material located outside the area of direct flux of the particles from the primary source to the substrate, during deposition.
Claim 3
Dependent Claim
40 words
The method of claim 1 in which the primary source of deposited material is located substantially on or near an axis normal to the substrate surface, and the shields surround at least a portion of the area of direct flux.
Claim 4
Dependent Claim
20 words
The method of claim 2 in which the shields extend from the vicinity of the skirt edge toward the source.
Claim 5
Dependent Claim
44 words
The method of claim 1 in which additional shields are placed within the area of direct flux to both partially shield the substrate from indirect flux of deposition material, as well as to collimate the beam of particles in the region of direct flux.
Claim 6
Dependent Claim
19 words
The method of claim 4 in which there is relative motion between the substrates and the shields during deposition.
Claim 7
Dependent Claim
22 words
The method of claim 5 in which the substrate moves in a circular path, and the shields are distributed along the path.
Claim 8
Dependent Claim
13 words
The method of claim 6 in which the shields are arranged substantially radially.
Claim 9
Dependent Claim
20 words
The method of claim 6 in which the shields form a pattern that includes both radial and circumferential vector components.
References Cited (Backward Citations)
US4380212A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-04-22 | 1994-10-22 | 1995-04-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-04-22 | 1998-10-22 | 1999-04-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-04-22 | 2002-10-22 | 2003-04-23 | $7700.00 | Window Closed / Lapsed |