Plasma CVD apparatus

Claim 2

A plasma CVD apparatus having a vacuum chamber wall for forming a deposition film on a base, comprising: an electrode; means for causing a discharge in a space between the base and said electrode; and a non-consumable auxiliary member removably disposed on a surface of said electrode between the base and said electrode, said auxiliary member substantially covering said electrode and being in electrical contact with said electrode to act as said electrode, wherein said auxiliary member covers the vacuum chamber wall of the CVD plasma apparatus and contributes to said discharge.

Claim 3

A plasma CVD apparatus according to claim 1 wherein said auxiliary member has a thickness no larger than 2 mm.

Claim 4

A plasma CVD apparatus according to claim 1 wherein said auxiliary member is in total contact with said electrode.

Claim 5

A plasma CVD apparatus according to claim 1 wherein said auxiliary member is in contact with the entire area of said electrode contributing to the discharge.

Claim 6

A plasma CVD apparatus according to claim 1 wherein said auxiliary member is in contact with a portion of the surface of said electrode and contributing to the discharge.

Claim 7

A plasma CVD apparatus according to claim 1, wherein the configuration of said auxiliary member is mesh-shaped.

Claim 8

A plasma CVD apparatus according to claim 1, wherein the configuration of said auxiliary member is cylindrical.

Claim 9

A plasma CVD apparatus according to claim 1, wherein said electrode also serves as said vacuum chamber wall.

Claim 10

A plasma CVD apparatus according to claim 1, wherein said electrode and said vacuum chamber wall are provided separately.

Claim 11

A plasma CVD apparatus according to claim 1, wherein said non-consumable auxiliary member is made of an electrically conductive material.

Claim 12

A plasma CVD apparatus according to claim 1, wherein said conductive material is stainless steel.

Claim 13

A plasma CVD apparatus with a vacuum chamber wall for depositing a film on a removable base member, comprising: support means for supporting a removable base member at a deposition site; electrode means, spaced from said deposition site, and having an electrode surface, for creating a discharge in a gas located in the space between the removable base member and said electrode means upon the application of a potential between said electrode means and the base member, the discharge causing the deposition of a film on the base member; and removable shield means for shielding said electrode surface during the discharge, said shield means substantially covering said electrode surface so as to prevent the deposition of film on said electrode surface, said shield means being removable and in electrical contact with said electrode means to a ct as said electrode surface to thereby contribute to the creating of the discharge upon the application of the potential, and wherein said shield means covers the vacuum chamber wall of the plasma CVD apparatus.

Claim 14

A plasma CVD apparatus with a vacuum chamber wall for depositing a film on a removable base member, comprising: support means for supporting a removable base member at a deposition site; electrode means, spaced from said deposition site, and having an electrode surface, for creating a discharge in a gas located in the space between the removable base member and said electrode means upon the application of a potential between said electrode means and the base member, the discharge causing the deposition of a film on the base member; and removable shield means for shielding said electrode surface during the discharge, said shield means substantially covering said electrode surface so as to prevent the deposition of film on said electrode surface, said shield means being removable and in electrical contact with said electrode means to a ct as said electrode surface to thereby contribute to the creating of the discharge upon the application of the potential, and wherein said shield means covers the vacuum chamber wall of the plasma CVD apparatus.

Claim 15

A plasma CVD apparatus according to claim 12 wherein said removable shield means is in total contact with said electrode surface.

Claim 16

A plasma CVD apparatus according to claim 12 wherein said removable shield means is in contact with the entire area of said electrode surface contributing to the discharge.

Claim 17

A plasma CVD apparatus according to claim 12 wherein said removable shield means is in contact with a portion of the surface of said electrode surface and contributes to the discharge.

Claim 18

A plasma CVD apparatus according to claim 12, wherein the configuration of said removable shield means is mesh-shaped.

Claim 19

A plasma CVD apparatus according to claim 12 wherein the configuration of said removable shield means is cylindrical.

Claim 20

A plasma CVD apparatus according to claim 12 wherein said removable shield means is made of an electrically conductive material.

Claim 21

A plasma CVD apparatus according to claim 12 wherein said conductive material is stainless steel.

Claim 22

A plasma CVD apparatus according to claim 12, wherein said removable shield means has a thickness no larger than 2 mm.

Claim 23

A plasma CVD apparatus according to claim 12, wherein said electrode means also serves as said vacuum chamber wall.

Claim 24

A plasma CVD apparatus according to claim 12, wherein said electrode means and said vacuum chamber wall are provided separately.

Claim 25

A plasma CVD apparatus having a vacuum chamber wall for forming a deposition film on a base, including: means for supporting the base and causing it to rotate; an electrode; means or causing a discharge in a space between the base and said electrode; and a non-consumable auxiliary member removably disposed on a surface of said electrode between the base and said electrode, said auxiliary member substantially covering said electrode and being in electrical contact with said electrode to act as said electrode, wherein said auxiliary member contributes

Claim 26

A plasma CVD apparatus having a vacuum chamber wall for forming a deposition film on a base, including: means for supporting the base and causing it to rotate; an electrode; means or causing a discharge in a space between the base and said electrode; and a non-consumable auxiliary member removably disposed on a surface of said electrode between the base and said electrode, said auxiliary member substantially covering said electrode and being in electrical contact with said electrode to act as said electrode, wherein said auxiliary member contributes

Claim 27

A plasma CVD apparatus according to claim 23, wherein said supporting means supports a cylindrical base.

Claim 28

A plasma CVD apparatus according to claim 23, wherein said non-consumable auxiliary member is made of an electrically conductive material.

Claim 29

A plasma CVD apparatus according to claim 25, wherein said supporting means supports a cylindrical base.

Claim 30

A plasma CVD apparatus according to claim 23, wherein said conductive material is stainless steel.

Claim 31

A plasma CVD apparatus according to claim 23, wherein said electrode also serves as said vacuum chamber wall.

Claim 32

A plasma CVD apparatus according to claim 23, wherein said electrode and said vacuum chamber wall are provided separately.

Claim 33

A plasma CVD apparatus with a vacuum chamber wall for depositing a film on a removable base member, including: support means for supporting a removable base member at a deposition site and causing it to rotate; electrode means, spaced from said deposition site, and having an electrode surface, for creating a discharge in a gas located in the space between the removable base member and said electrode means upon the application of a potential between said electrode means and the base member, the discharge causing the deposition of a film on the base member; and removable shield means for shielding said electrode surface during the discharge, said shield means substantially covering said electrode surface so as to prevent the deposition of film on said electrode surface, said shield means being removable and in electrical contact with said electrode means to act as said electrode surface to thereby contribute to the creation of the discharge upon the application of the potential.

Claim 34

A plasma CVD apparatus with a vacuum chamber wall for depositing a film on a removable base member, including: support means for supporting a removable base member at a deposition site and causing it to rotate; electrode means, spaced from said deposition site, and having an electrode surface, for creating a discharge in a gas located in the space between the removable base member and said electrode means upon the application of a potential between said electrode means and the base member, the discharge causing the deposition of a film on the base member; and removable shield means for shielding said electrode surface during the discharge, said shield means substantially covering said electrode surface so as to prevent the deposition of film on said electrode surface, said shield means being removable and in electrical contact with said electrode means to act as said electrode surface to thereby contribute to the creation of the discharge upon the application of the potential.

Claim 35

A plasma CVD apparatus according to claim 30, wherein said electrode means and said vacuum chamber wall are provided separately.

Claim 36

A plasma CVD apparatus according to claim 30, wherein said removable shield means has a thickness no larger than 2 mm.

Claim 37

A plasma CVD apparatus according to claim 30, wherein said removable shield means is in total contact with said electrode surface.

Claim 38

A plasma CVD apparatus according to claim 30, wherein said removable shield means is in contact with the entire area of said electrode surface contributing to the discharge.

Claim 39

A plasma CVD apparatus according to claim 30, wherein said removable shield means is in contact with a portion of the surface of said electrode surface and contributes to the discharge.

Claim 40

A plasma CVD apparatus according to claim 30, wherein the configuration of said removable shield means is mesh-shaped.

Claim 41

A plasma CVD apparatus according to claim 30, wherein the configuration of said removable shield means is cylindrical.

Claim 42

A plasma CVD apparatus according to claim 30, wherein said removable shield means is made of an electrically conductive material.

Claim 43

A plasma CVD apparatus according to claim 30, wherein said conductive material is stainless steel.

Claim 44

A plasma CVD apparatus according to claim 30, wherein said electrode means also serves as said vacuum chamber wall.