US4995949A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Orifice sizing using chemical, electrochemical, electrical discharge machining, plating, coating techniques
Assignee: Extrude Hone LLC
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Filing: 1988-11-02
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Granted: 1991-02-26
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Expires: 2008-11-02
Abstract
Abstract A method of processing an orifice in a structure to attain a precise predetermined flow resistance through said orifice. Undersized orifices are machined by either electrochemical, chemical or electric discharge machining, while oversized orifices are electroplated, electroless plated or vapor deposition coated, such that the processing fluid, i.e. the electrolyte, corrosive fluid, dielectric or carrier gas as used in the machining, plating or coating process is passed through said orifice during said processing at a predetermined fixed pressure while measuring the dynamic flow resistance of said processing fluid through said orifice until said dynamic flow resistance is equal to that desired.
Inventors
- 👤 Lawrence J. Rhoades
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:24
CPC Classifications
B; B24; B24B; B24B31/00; B24B31/10; B24B31/116; B23; B23H; B23H9/00; B23H9/02; B23H9/14; B23P; B23P2700/00; B23P2700/06
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
193 words
The method of attaining a specific flow resistance of a fluid through an orifice in a structure by processing said orifice with a process utilizing a processing fluid, said process selected from the group consisting of chemical machining, electrochemical machining, electrical discharge machining, electroplating, electroless plating and vapor deposition, wherein said processing fluid is caused to flow through said orifice by a mechanical pump, said method comprising: A. Determining a target flow resistance of said processing fluid at a constant applied pressure as will provide said specific flow resistance of said fluid; B. Pumping said processing fluid through said orifice with said mechanical pump to process said orifice while maintaining said constant applied pressure with said mechanical pump; C. Measuring the dynamic flow resistance of said processing fluid through said orifice while said processing fluid is being pumped therethrough, and permitting the volumetric flow rate of said processing fluid to change in direct proportion to the processing effected on said orifice for the purpose of maintaining said constant applied pressure with said pump; and D. Stopping the processing of said orifice when said dynamic flow resistance is equal to said target flow resistance.
Claim 2
Independent Claim
193 words
The method of attaining a specific flow resistance of a fluid through an orifice in a structure by processing said orifice with a process utilizing a processing fluid, said process selected from the group consisting of chemical machining, electrochemical machining, electrical discharge machining, electroplating, electroless plating and vapor deposition, wherein said processing fluid is caused to flow through said orifice by a mechanical pump, said method comprising: A. Determining a target flow resistance of said processing fluid at a constant applied pressure as will provide said specific flow resistance of said fluid; B. Pumping said processing fluid through said orifice with said mechanical pump to process said orifice while maintaining said constant applied pressure with said mechanical pump; C. Measuring the dynamic flow resistance of said processing fluid through said orifice while said processing fluid is being pumped therethrough, and permitting the volumetric flow rate of said processing fluid to change in direct proportion to the processing effected on said orifice for the purpose of maintaining said constant applied pressure with said pump; and D. Stopping the processing of said orifice when said dynamic flow resistance is equal to said target flow resistance.
Claim 3
Dependent Claim
25 words
The method of claim 1 wherein said dynamic flow resistance is measured as a function of the axial displacement of said piston per unit time.
Claim 4
Dependent Claim
14 words
The method of claim 2 wherein said function is V o =kD p /t.
Claim 5
Dependent Claim
11 words
The method of claim 3 wherein k=A p /A o .
Claim 6
Dependent Claim
17 words
The method of claim 2 wherein said unit time is equal to or less than one second.
Claim 7
Dependent Claim
17 words
The method of claim 2 wherein said unit time is less than or equal to 0.1 second.
Claim 8
Independent Claim
196 words
The method of attaining a specific flow resistance of a fluid through an orifice in a structure by processing said orifice with a process utilizing a processing fluid, said process selected from the group consisting of chemical machining, electrochemical machining, electrical discharge machining, electroplating, electroless plating and vapor deposition, wherein said processing fluid is caused to flow through said orifice by a mechanical pump, said method comprising: A. Determining a target flow resistance of said processing fluid at a constant volumetric flow rate as will provide said specific flow resistance of said fluid; B. Pumping said processing fluid through said orifice with said mechanical pump to process said orifice while maintaining said constant volumetric flow rate with said mechanical pump; C. Measuring the dynamic flow resistance of said processing fluid through said orifice while said processing fluid is being pumped therethrouqh, and permitting the applied pressure of said processing fluid to change in inverse proportion to the processing effected on said orifice for the purpose of maintaining said constant volumetric flow rate with said mechanical pump; and D. Stopping the processing of said orifice when said dynamic flow resistance is equal to said target flow resistance.
Claim 9
Independent Claim
196 words
The method of attaining a specific flow resistance of a fluid through an orifice in a structure by processing said orifice with a process utilizing a processing fluid, said process selected from the group consisting of chemical machining, electrochemical machining, electrical discharge machining, electroplating, electroless plating and vapor deposition, wherein said processing fluid is caused to flow through said orifice by a mechanical pump, said method comprising: A. Determining a target flow resistance of said processing fluid at a constant volumetric flow rate as will provide said specific flow resistance of said fluid; B. Pumping said processing fluid through said orifice with said mechanical pump to process said orifice while maintaining said constant volumetric flow rate with said mechanical pump; C. Measuring the dynamic flow resistance of said processing fluid through said orifice while said processing fluid is being pumped therethrouqh, and permitting the applied pressure of said processing fluid to change in inverse proportion to the processing effected on said orifice for the purpose of maintaining said constant volumetric flow rate with said mechanical pump; and D. Stopping the processing of said orifice when said dynamic flow resistance is equal to said target flow resistance.
Claim 10
Independent Claim
142 words
The method of attaining a specific flow resistance of a fluid through an orifice in a structure by processing said orifice with a process utilizing a processing fluid, which is caused to flow through said orifice by displacement of a piston, said method comprising: A. Determining a target flow resistance of said processing fluid at a constant applied pressure as will provide said specific flow resistance of said fluid; B. Flowing said processing fluid through said orifice by displacement of said piston to process said orifice while maintaining said specific constant applied pressure with said piston C. Measuring the dynamic flow resistance of said processing fluid through said orifice while said processing fluid is flowing therethrough; and D. Continuing to process said orifice and said flowing of said processing fluid until said dynamic flow resistance is equal to said target flow resistance.
Claim 11
Independent Claim
142 words
The method of attaining a specific flow resistance of a fluid through an orifice in a structure by processing said orifice with a process utilizing a processing fluid, which is caused to flow through said orifice by displacement of a piston, said method comprising: A. Determining a target flow resistance of said processing fluid at a constant applied pressure as will provide said specific flow resistance of said fluid; B. Flowing said processing fluid through said orifice by displacement of said piston to process said orifice while maintaining said specific constant applied pressure with said piston C. Measuring the dynamic flow resistance of said processing fluid through said orifice while said processing fluid is flowing therethrough; and D. Continuing to process said orifice and said flowing of said processing fluid until said dynamic flow resistance is equal to said target flow resistance.
Claim 12
Dependent Claim
25 words
The method of claim 8 wherein said dynamic flow resistance is measured as a function of the axial displacement of said piston per unit time.
Claim 13
Dependent Claim
14 words
The method of claim 8 wherein said function is V o =kD p /t.
Claim 14
Dependent Claim
11 words
The method of claim 10 wherein k=A p /A o .
Claim 15
Dependent Claim
17 words
The method of claim 8 wherein said unit time is equal to or less than one second.
Claim 16
Dependent Claim
17 words
The method of claim 8 wherein said unit time is less than or equal to 0.1 second.
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