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US4990225A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of manufacturing high magnetic flux density electrodeposited quaternary alloy thin film

Assignee: Panasonic Holdings Corp
•
Filing: 1990-04-19
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Granted: 1991-02-05
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Expires: 2010-04-19
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Abstract

Abstract A method of manufacturing a high magnetic flux density quaternary alloy electrodeposited thin film, comprising the steps of: forming an FeCoNiCr or an FeCoNiCu quaternary alloy thin film on a cathode by using an electrodepositing electrolyte bath to which four types of ions of Fe, Co, Ni and Cr or Cu have been supplied through sulfate and/or hydrochloride, each of which contains bivalent or tervalent Fe, Co, Ni, Cr and Cu ions, by using a bath having on the basis of the density of [Ni 2+ ] ion such compositions as 0.02<[Co 2+ ]/[Ni 2+ ]<0.9, 0.095<[Fe 2+ ]/[Ni 2+ ]<0.4 and 0.075<[Cr 3+ ]/[Ni 2+ ]<0.4, or 0.001<[Cu 2+ ]/[Ni 2+ ]<0.03; and arranging electrodeposition current density J to be in a range of J<60 (mA/cm 2 ) at the cathode.

Inventors

  • 👤 Yuuji Omata

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 16:09
CPC Classifications
G; G11; G11B; G11B5/00; G11B5/127; G11B5/31; C; C25; C25D; C25D3/00; C25D3/02; C25D3/56; C25D3/562; H; H01; H01F; H01F41/00; H01F41/14; H01F41/24; H01F41/26

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 143 words
A method of manufacturing a high magnetic flux density quaternary alloy electrodeposited thin film, comprising the steps of: forming an FeCoNiCr or an FeCoNiCu quaternary alloy thin film on a cathode by using an electrodepositing electrolyte bath to which four kinds of ions of Fe, Co, Ni and Cr or Cu have been supplied through sulfate and/or hydrochloride, each of which contains bivalent or tervalent Fe, Co, Ni, and Cr or Cu ions, by using a bath having on the basis of the density of [Ni 2+ ] ion such compositions as ______________________________________ 0.02 < [Co.sup.2+ ]/[Ni.sup.2+ ] < 0.9, 0.095 < [Fe.sup.2+ ]/[Ni.sup.2+ ] < 0.4 and 0.075 < [Cr.sup.3+ ]/[Ni.sup.2+ ] < 0.4, or 0.001 < [Cu.sup.2+ ]/[Ni.sup.2+ ] < 0.03; ______________________________________ and setting electrodeposition current density J to be in a range of J<60 (mA/cm 2 ) at said cathode.
Claim 2
Independent Claim 143 words
A method of manufacturing a high magnetic flux density quaternary alloy electrodeposited thin film, comprising the steps of: forming an FeCoNiCr or an FeCoNiCu quaternary alloy thin film on a cathode by using an electrodepositing electrolyte bath to which four kinds of ions of Fe, Co, Ni and Cr or Cu have been supplied through sulfate and/or hydrochloride, each of which contains bivalent or tervalent Fe, Co, Ni, and Cr or Cu ions, by using a bath having on the basis of the density of [Ni 2+ ] ion such compositions as ______________________________________ 0.02 < [Co.sup.2+ ]/[Ni.sup.2+ ] < 0.9, 0.095 < [Fe.sup.2+ ]/[Ni.sup.2+ ] < 0.4 and 0.075 < [Cr.sup.3+ ]/[Ni.sup.2+ ] < 0.4, or 0.001 < [Cu.sup.2+ ]/[Ni.sup.2+ ] < 0.03; ______________________________________ and setting electrodeposition current density J to be in a range of J<60 (mA/cm 2 ) at said cathode.
Claim 3
Dependent Claim 50 words
A method of manufacturing a high magnetic flux density quaternary alloy electrodeposited thin film according to claim 1, wherein said electrodeposition is performed in such a manner that uniaxial anisotropy is induced to said film by a magnetic field fixed in the vicinity of said cathode in said electrodepositing bath.
Claim 4
Dependent Claim 44 words
A method of manufacturing a high magnetic flux density quaternary alloy electrodeposited thin film according to claim 1, wherein a ternary FeCoNi thin film or a permalloy thin film obtained by evaporation is used as a material for said cathode electrode for said electrodeposition.
Claim 5
Dependent Claim 28 words
A method of manufacturing a high magnetic flux density quaternary alloy electrodeposited thin film according to claim 1, wherein the pH value of said electrodepositing bath is 1.5<pH<5.0.

References Cited (Backward Citations)

DE1227753B Cited
US3374156A Cited
US3480522A Cited
US3533922A Cited
JPS5013747A Cited
US4673471A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1994-02-04 1994-08-06 1995-02-05 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1998-02-04 1998-08-06 1999-02-05 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2002-02-04 2002-08-06 2003-02-05 $7700.00 Window Closed / Lapsed

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