Material for the conduction of protons and method of making the same

Claim 2

A material of an amorphous structure on a base of potassium hydrodisilicate, wherein, in addition to the potassium hydrodisilicate, the material contains oxometallates up to a molar ratio of about 1:5 potassium hydrodisilicate to oxometallates, and wherein doping elements of the third group of the Periodic Table up to about 50 mol. % are incorporated instead of 100 mol. % silicon ions, and up to about 50 mol. % of potassium ions are replaced by bivalent metal ions of approximately a same ionic radius as the potassium ions, and additionally silicon dioxide is contained, on a molar basis, up to four times the combined amount of said silicon ions and said doping elements.

Claim 3

A material according to claim 1, wherein metal ions of the oxometallates are transition metals.

Claim 4

A material according to claim 2, wherein the transition metals are at least one of titanates, vanadates, chromates, zirconates, niobates, molybdates, hafnates, tantalates and wolframates.

Claim 5

A material according to claim 1, wherein the doping element is aluminum and replaces up to about 15 mol. % of the silicon ions.

Claim 6

A material according to claim 2, wherein the doping element is aluminum and replaces up to about 15 mol. % of the silicon ions.

Claim 7

A material according to claim 1, wherein the doping element is boron and replaces up to about 50 mol. % of the silicon ions.

Claim 8

A material according to claim 2, wherein the doping element is boron and replaces up to about 50 mol. % of the silicon ions.

Claim 9

A material according to claim 1, wherein, as a replacement for the potassium ions, barium ions are incorporated into the amorphous structure.

Claim 10

A material according to claim 1, wherein the molar ratio between potassium hydrodisilicate, oxometallates, doping elements, bivalent metal ions and silicon dioxide is adjusted within the given limits in such a manner that the material has a proton conducting capacity of over about 10 -2 S cm -1 at an operating temperature of about 200° C.

Claim 11

A process for producing a proton conducting material of an amorphous structure on a substrate comprising the steps of: (a) preparing a suspension made of a potassium silicate solution and a finely distributed powder having a composition relative to about one mol of potassium hydrodisilicate of about 0 to 5 mols of one of oxometallate and oxometallate forming agents, about 0 to 0.5 mols of a trivalent metal ion in one of an oxidic bond and as an anion of a salt with approximately a same ionic radius as a silicon ion, about 0 to 0.5 mols of a bivalent metal ion as one of an oxide, hydroxide and anion of a salt with an approximately identical ionic radius as a potassium ion; and about 0 to 4 mols silicon dioxide, in which case a lower limit with two constituents can be 0; (b) applying the suspension to a substrate; (c) heating the suspension and the substrate under high pressure to temperatures between about 500° and about 800° C. at a pressure of from about 20 to about 400 bar to form a proton conducting glass layer with a substrate.

Claim 12

A process for producing a proton conducting material of an amorphous structure on a substrate comprising the steps of: (a) preparing a suspension made of a potassium silicate solution and a finely distributed powder having a composition relative to about one mol of potassium hydrodisilicate of about 0 to 5 mols of one of oxometallate and oxometallate forming agents, about 0 to 0.5 mols of a trivalent metal ion in one of an oxidic bond and as an anion of a salt with approximately a same ionic radius as a silicon ion, about 0 to 0.5 mols of a bivalent metal ion as one of an oxide, hydroxide and anion of a salt with an approximately identical ionic radius as a potassium ion; and about 0 to 4 mols silicon dioxide, in which case a lower limit with two constituents can be 0; (b) applying the suspension to a substrate; (c) heating the suspension and the substrate under high pressure to temperatures between about 500° and about 800° C. at a pressure of from about 20 to about 400 bar to form a proton conducting glass layer with a substrate.

Claim 13

A process according to claim 10, wherein the heating step takes place in a water vapor containing atmosphere.

Claim 14

A process according to claim 10, wherein the substrate is formed as a porous electrode material of a fuel cell.

Claim 15

A process according to claim 10, wherein after the heating step, the substrate is removed from the proton conducting glass layer.

Claim 16

A process according to claim 13, further comprising the step of pressing the glass layer together on one side with a porous electrode material for fuel cells at a softening temperature of the glass layer.

Claim 17

A process according to claim 14, wherein the glass layer, in several layers, is pressed together with the electrode material for fuel cells.

Claim 18

A process according to claim 13, wherein the glass layer is pressed together, on both sides, with an electrode material for fuel cells.

Claim 19

A process for producing a material of an amphorous structure on a substrate comprising the steps of: (a) preparing a suspension made of a potassium silicate solution and finely distributed powder having a composition relative to about one mol of potassium hydrodisilicate of about 1 to about 3 mols of one of oxometallate and oxometallate forming agents, about 0.02 to about 0.3 mols of a trivalent metal ion in one of an oxidic bond and as an anion of a salt with approximately a same ionic radius as a silicon ion, about 0.05 to about 0.2 mols of a bivalent metal ion as one of an oxide, hydroxide and anion of a salt with an approximately identical ionic radius as a potassium ion; and about 1 to about 3 mols silicon dioxide; (b) applying the suspension to a substrate; (c) heating the suspension and the substrate under high pressure to temperatures between about 550° and about 700° C. at a pressure of about 70 to about 300 bar to form a proton conducting glass layer with a substrate.

Claim 20

A process for producing a material of an amphorous structure on a substrate comprising the steps of: (a) preparing a suspension made of a potassium silicate solution and finely distributed powder having a composition relative to about one mol of potassium hydrodisilicate of about 1 to about 3 mols of one of oxometallate and oxometallate forming agents, about 0.02 to about 0.3 mols of a trivalent metal ion in one of an oxidic bond and as an anion of a salt with approximately a same ionic radius as a silicon ion, about 0.05 to about 0.2 mols of a bivalent metal ion as one of an oxide, hydroxide and anion of a salt with an approximately identical ionic radius as a potassium ion; and about 1 to about 3 mols silicon dioxide; (b) applying the suspension to a substrate; (c) heating the suspension and the substrate under high pressure to temperatures between about 550° and about 700° C. at a pressure of about 70 to about 300 bar to form a proton conducting glass layer with a substrate.

Claim 21

A process according to claim 17, wherein the heating step takes place in a water vapor containing atmosphere.

Claim 22

A process according to claim 17, wherein the substrate is a porous electrode material of a fuel cell.

Claim 23

A process according to claim 17, wherein after the heating step, the substrate is removed from the glass layer.

Claim 24

A process according to claim 20, wherein the glass layer is pressed together on one side with a porous electrode material for fuel cells at a softening temperature of the glass layer.

Claim 25

A process according to claim 21, wherein the glass layer, in several layers, is pressed together with the electrode material for fuel cells.

Claim 26

A process according to claim 20, wherein the glass layer is pressed together, on both sides, with electrode material for fuel cells.