US4983254A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Processing for stripping organic material
Assignee: Fujitsu Semiconductor Ltd
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Filing: 1990-01-04
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Granted: 1991-01-08
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Expires: 2010-01-04
Abstract
Abstract A process for stripping an organic material, which comprises forming gases including a gas containing oxygen and a gas containing a halogen into plasma in a plasma chamber, and supplying an active species of the halogen in the gas formed plasma to a reaction chamber to strip the organic material in the reaction chamber, wherein one mole or more of water vapor based upon two moles of the halogen molecule is fed to the reaction chamber, and the active species of the halogen are removed before contact thereof with the organic material.
Inventors
- 👤 Shuzo Fujimura
- 👤 Keisuke Shinagawa
- 👤 Kenichi Hikazutani
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 07:35
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/20; H10P50/28; H10P50/286; H10P50/287; G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/427; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32082; H01J37/32192; H01J37/32431; H01J37/3244; H01J37/32715; H01J37/32798; H01J37/32816; H01J37/32834; H10P72/00; H10P72/04; H10P72/0402
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
92 words
A process for stripping an organic material, which comprises forming gases including a gas containing oxygen and a gas containing a halogen into plasma in a plasma chamber, supplying an active species of the halogen in said gas formed plasma to a reaction chamber to strip the organic material in said reaction chamber, wherein at least one mole of water vapor based upon two moles of the dissociated halogen atom is introduced into said reaction chamber, and said active species of the halogen are removed before contact thereof with said organic material.
Claim 2
Dependent Claim
92 words
A process for stripping an organic material, which comprises forming gases including a gas containing oxygen and a gas containing a halogen into plasma in a plasma chamber, supplying an active species of the halogen in said gas formed plasma to a reaction chamber to strip the organic material in said reaction chamber, wherein at least one mole of water vapor based upon two moles of the dissociated halogen atom is introduced into said reaction chamber, and said active species of the halogen are removed before contact thereof with said organic material.
Claim 3
Dependent Claim
21 words
A process as claimed in claim 1, wherein the gases fed to the plasma chamber are oxygen and a fluorine-containing gas.
Claim 4
Dependent Claim
71 words
A process as claimed in claim 2, wherein the fluorine-containing gas is at least one compound selected from the group consisting of F 2 , CF 4 , C 2 F 6 , NF 3 , SF 6 , ClF 3 , CHF 3 , CClF 3 , C 2 ClF 5 , C 2 Cl 2 F 4 , CCl 2 F 2 , CBrF 3 , and xenon fluoride.
Claim 5
Dependent Claim
17 words
A process as claimed in claim 1, wherein the plasma is generated by microwave or radio frequency.
Claim 6
Dependent Claim
45 words
A process as claimed in claim 1, wherein O 2 and a fluorine-containing gas are used as the gas fed to the plasma chamber in an amount of a fluorine-containing gas/(O 2 +a fluorine-containing gas) of 0.05 to 0.3 in terms of a mole ratio.
Claim 7
Dependent Claim
28 words
A process as claimed in claim 5, wherein the ratio of a fluorine-containing gas/(O 2 +a fluorine-containing gas) is 0.1 to 0.25 in terms of a mole ratio.
Claim 8
Dependent Claim
47 words
A process as claimed in claim 1, wherein O 2 and a fluorine-containing gas are used as the gases fed to the plasma chamber and the water vapor is introduced in an amount of 1.2 to 2.4 moles based upon 2 moles of the dissociated halogen atom.
Claim 9
Dependent Claim
31 words
A process as claimed in claim 1, wherein the organic material is a resist coated on a wafer having a silicon dioxide or silicon nitride layer on the top surface thereof.
Claim 10
Dependent Claim
37 words
A process as claimed in claim 1, wherein the water vapor is generated from a water vessel by bubbling with at least one carrier gas selected from the group consisting of nitrogen, oxygen, hydrogen, argon, and helium.
Claim 11
Independent Claim
44 words
A device for stripping an organic material comprising: a reaction chamber provided with a stage for placing the organic material to be treated; a plasma generating means; a gas introducing inlet; a shower head; a water vapor inlet means; and a gas evacuating conduit.
Claim 12
Independent Claim
44 words
A device for stripping an organic material comprising: a reaction chamber provided with a stage for placing the organic material to be treated; a plasma generating means; a gas introducing inlet; a shower head; a water vapor inlet means; and a gas evacuating conduit.
Claim 13
Dependent Claim
53 words
A device as claimed in claim 10, wherein the device comprises a plasma chamber to which a gas containing oxygen and a gas containing a halogen are fed and a reaction chamber to which a water vapor is introduced, whereby the water-vapor is reacted with a halogen atom derived from the halogen-containing gas.
Claim 14
Dependent Claim
19 words
A device as claimed in claim 10, wherein the device further comprises a water vessel provided with a heater.
Claim 15
Dependent Claim
16 words
A device as claimed in claim 10, wherein the device further comprises a carrier gas bomb.
Claim 16
Dependent Claim
26 words
A device as claimed in claim 10, wherein a plurality of the inlets for the water vapor is provided at the periphery of the reaction chamber.
Claim 17
Dependent Claim
28 words
A device as claimed in claim 10, wherein the water vapor inlet means in the form of a slit elongated over the entire periphery of the reaction chamber.
References Cited (Backward Citations)
US4699689A
Cited
US4749440A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-01-07 | 1994-07-09 | 1995-01-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-01-07 | 1998-07-09 | 1999-01-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-01-07 | 2002-07-09 | 2003-01-08 | $7700.00 | Window Closed / Lapsed |