US4980567A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Charged particle beam exposure system using line beams
Assignee: Fujitsu Semiconductor Ltd
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Filing: 1989-03-28
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Granted: 1990-12-25
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Expires: 2009-03-28
Abstract
Abstract In a charged particle beam exposure system, a line of individual blanking apertures (39 0 to 39 255 ) is provided to form a line of beams which are individually blanked and unblanked by applying voltages to electrodes within the blanking apertures.
Inventors
- 👤 Hiroshi Yasuda
- 👤 Junichi Kai
- 👤 Toyotaka Kataoka
- 👤 Yasushi Takahashi
- 👤 Shinji Miyaki
- 👤 Kiichi Sakamoto
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 10:58
CPC Classifications
B; B82; B82Y; B82Y10/00; B82Y40/00; H; H01; H01J; H01J37/00; H01J37/30; H01J37/3002; H01J37/3007; H01J37/317; H01J37/3174; H01J37/3177
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
122 words
A charged particle beam exposure system for projecting a charged particle beam on a target (51) mounted on a stage (7), comprising: means (30) for emitting a charged particle beam; a blanking aperture array (39) for passing said charged particle beam, said array having a line of blanking apertures (39 0 to 39 255 ) to each having electrode means; and means (62) for individually driving the electrode means of said blanking apertures in a manner such that the dose factor obtained by multiplying the intensity (I i ) of a charged particle beam passing through one of said blanking apertures and the ON-duty time period (τ i ) of the electrode means of said one of said blanking apertures is constant.
Claim 2
Dependent Claim
122 words
A charged particle beam exposure system for projecting a charged particle beam on a target (51) mounted on a stage (7), comprising: means (30) for emitting a charged particle beam; a blanking aperture array (39) for passing said charged particle beam, said array having a line of blanking apertures (39 0 to 39 255 ) to each having electrode means; and means (62) for individually driving the electrode means of said blanking apertures in a manner such that the dose factor obtained by multiplying the intensity (I i ) of a charged particle beam passing through one of said blanking apertures and the ON-duty time period (τ i ) of the electrode means of said one of said blanking apertures is constant.
Claim 3
Dependent Claim
53 words
A system as set forth in claim 1, further comprising means (20, 21) for moving said stage in parallelism with the line of said blanking apertures and said driving means (62) driving the electrode means so as to cause said charged particle beam to swing perpendicularly to the line of said blanking apertures.
Claim 4
Dependent Claim
69 words
A system as set forth in claim 2, further comprising: means (68) for detecting the position of said stage; means (652) for calculating a stage error between the detected position of said stage and a predetermined position thereof; deflection means (67, 49) for deflecting said charged particle beam which has passed through said blanking apertures along the motion direction of said stage so as to reduce said stage error.
Claim 5
Dependent Claim
39 words
A system as set forth in claim 1, further comprising flattening means for flattening the crossover into a line shape whenever said charged particle beam generated from said charged particle beam generating means forms a crossover by critical exposure.
Claim 6
Dependent Claim
19 words
A system as set forth in claim 5, wherein said smashing flattening means comprises a four-pole beam flattening lens.
Claim 7
Dependent Claim
94 words
A charged particle beam exposure system for projecting a charged particle beam on a target (52), comprising: means (30) for emitting a charged particle beam; a blanking aperture array (39) for passing said charged particle beam, said array having a line of blanking apertures (39 0 to 39 255 ) each having electrode means; means (62) for individually driving the electrode means of said blanking apertures; and means (64') for controlling the ON-duty ratio of the electrode means of each of said blanking apertures in accordance with the exposure dose in close proximity thereto.
Claim 8
Dependent Claim
94 words
A charged particle beam exposure system for projecting a charged particle beam on a target (52), comprising: means (30) for emitting a charged particle beam; a blanking aperture array (39) for passing said charged particle beam, said array having a line of blanking apertures (39 0 to 39 255 ) each having electrode means; means (62) for individually driving the electrode means of said blanking apertures; and means (64') for controlling the ON-duty ratio of the electrode means of each of said blanking apertures in accordance with the exposure dose in close proximity thereto.
Claim 9
Dependent Claim
34 words
A system as set forth in claim 6, wherein the exposure dose in close proximity to one blanking aperture is determined by the area of a shot to which said one blanking aperture belongs.
Claim 10
Dependent Claim
41 words
A system as set forth in claim 6, further comprising means (628) for reducing the voltage applied to the electrode means of said blanking apertures driven by said electrode driving means on the outer sides thereof as compared with the others.
Claim 11
Dependent Claim
53 words
A system as set forth in claim 6, further comprising means (20, 21) for moving said target in parallelism with the line of said blanking apertures and said driving means (62) driving the electrode means so as to cause said charged particle beam to swing perpendicularly to the line of said blanking apertures.
Claim 12
Dependent Claim
67 words
A system as set forth in claim 9, further comprising: means (68) for detecting the position of said target; means (652) for calculating an error between the detected position of said target and a predetermined position thereof; deflection means (67, 49) for deflecting said charged particle beam which has passed through said blanking apertures along the motion direction of said target so as to reduce said error.
Claim 13
Dependent Claim
39 words
A system as set forth in claim 6, further comprising flattening means for flattening the crossover into a line shape whenever said charged particle beam generated from said charged particle beam generating means forms a crossover by critical exposure.
Claim 14
Dependent Claim
16 words
A system as set forth in claim 11, wherein said means comprising a four-pole beam lens.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-12-24 | 1994-06-25 | 1994-12-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-12-24 | 1998-06-25 | 1998-12-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-12-24 | 2002-06-25 | 2002-12-25 | $7700.00 | Window Closed / Lapsed |