US4977108A
Expired / Lapsed
US
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Method of making self-aligned, planarized contacts for semiconductor devices
Assignee: GlobalFoundries Inc
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Filing: 1989-04-13
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Granted: 1990-12-11
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Expires: 2009-04-13
Abstract
Abstract A novel process is provided for fabricating contacts (46s, 40g, 46d) in a novel, completely self-aligned, planarized configuration for transistors (14), with self-aligned interconnections (46c). The process of the invention permits higher packing densities, and allows feature distances to approach 0.5 μm and lower. A unique combination of masks in conjunction with a multi-layer structure (28) formed on the surface of a semiconductor wafer (16), the multi-layer structure including a buried etch-stop layer therein (28b), defines the source (18), gate (22), and drain (20) elements and their geometry relative to each other and to interconnects. Polysilicon plug (40, 46) contacts through slots in the multi-structure layer permit vertical contact to be made to the various elements. Silicidation (56) of the polysilicon plugs reduces series resistance in the vertical direction and permits strapping of N + and P + polysilicon plugs.
Inventors
- 👤 Jacob D. Haskell
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 20:54
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/064; H10W20/066; H10D; H10D64/00; H10D64/01; H10D64/011; H10D64/0111; H10D64/0113; H10W20/032; H10W20/056; H10W20/40; Y; Y10; Y10S; Y10S148/00; Y10S148/05; Y10S148/141
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
126 words
A process for forming self-aligned planarized contacts, with conducting plugs formed to regions of a semiconductor device formed in a major surface of a semiconductor, suitably isolated from adjacent devices, said plugs separated by dielectric material and terminating in the plane defined by the surface of said dielectric material, said process comprising: (a) forming a layer of resist on said surface of said conducting plugs and said dielectric material; (b) applying an anti-contact mask to said layer of resist to leave resist where contacts to said conducting plugs are required; (c) etching back exposed portions of said conducting plugs where no contacts thereto are required; (d) stripping said layer of resist; and (e) filling in said etch-back areas with a planarizing material to planarize the structure.
Claim 2
Dependent Claim
126 words
A process for forming self-aligned planarized contacts, with conducting plugs formed to regions of a semiconductor device formed in a major surface of a semiconductor, suitably isolated from adjacent devices, said plugs separated by dielectric material and terminating in the plane defined by the surface of said dielectric material, said process comprising: (a) forming a layer of resist on said surface of said conducting plugs and said dielectric material; (b) applying an anti-contact mask to said layer of resist to leave resist where contacts to said conducting plugs are required; (c) etching back exposed portions of said conducting plugs where no contacts thereto are required; (d) stripping said layer of resist; and (e) filling in said etch-back areas with a planarizing material to planarize the structure.
Claim 3
Dependent Claim
13 words
The process of claim 1 wherein said conducting plugs comprise polysilicon or tungsten.
Claim 4
Dependent Claim
10 words
The process of claim 1 wherein said interconnects are planar.
Claim 5
Dependent Claim
111 words
A process for forming self-aligned, planarized contacts, with conducting plugs formed to source, gate and drain regions of a field effect transistor formed in a major surface of a semiconductor, suitably isolated from adjacent transistors, said plugs separated by dielectric material, comprising: (a) forming a layer of resist on the surface of said conducting plugs and said dielectric material; (b) applying an anti-contact mask to leave resist where contacts to said conducting plugs are required; (c) etching back exposed portions of said conducting plugs where no contacts thereto are required; (d) stripping said layer of resist; and (e) filling in said etch-back areas with a planarizing material to planarize the structure.
Claim 6
Dependent Claim
111 words
A process for forming self-aligned, planarized contacts, with conducting plugs formed to source, gate and drain regions of a field effect transistor formed in a major surface of a semiconductor, suitably isolated from adjacent transistors, said plugs separated by dielectric material, comprising: (a) forming a layer of resist on the surface of said conducting plugs and said dielectric material; (b) applying an anti-contact mask to leave resist where contacts to said conducting plugs are required; (c) etching back exposed portions of said conducting plugs where no contacts thereto are required; (d) stripping said layer of resist; and (e) filling in said etch-back areas with a planarizing material to planarize the structure.
Claim 7
Dependent Claim
13 words
The process of claim 4 wherein said conducting plugs comprise polysilicon or tungsten.
Claim 8
Dependent Claim
10 words
The process of claim 4 wherein said interconnects are planar.
Claim 9
Dependent Claim
109 words
A process for forming self-aligned, planarized contacts, with polysilicon plugs formed to source, gate and drain regions of a CMOS device formed in a major surface of a semiconductor, suitably isolated from adjacent devices, said plugs separated by dielectric material, comprising: (a) forming a layer of resist on the surface of said plugs and said dielectric material; (b) applying an anti-contact mask to leave resist where contacts to said polysilicon plugs are required; (c) etching back exposed portions of said polysilicon plugs where no contacts thereto are required; (d) stripping said layer of resist; and (e) filling in said etch-back areas with a planarizing material to planarize the structure.
Claim 10
Dependent Claim
109 words
A process for forming self-aligned, planarized contacts, with polysilicon plugs formed to source, gate and drain regions of a CMOS device formed in a major surface of a semiconductor, suitably isolated from adjacent devices, said plugs separated by dielectric material, comprising: (a) forming a layer of resist on the surface of said plugs and said dielectric material; (b) applying an anti-contact mask to leave resist where contacts to said polysilicon plugs are required; (c) etching back exposed portions of said polysilicon plugs where no contacts thereto are required; (d) stripping said layer of resist; and (e) filling in said etch-back areas with a planarizing material to planarize the structure.
Claim 11
Dependent Claim
10 words
The process of claim 7 wherein said interconnects are planar.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-12-10 | 1994-06-11 | 1994-12-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-12-10 | 1998-06-11 | 1998-12-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-12-10 | 2002-06-11 | 2002-12-11 | $7700.00 | Window Closed / Lapsed |