US4970093A
Expired / Lapsed
US
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Chemical deposition methods using supercritical fluid solutions
Assignee: University of Colorado Foundation Inc
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Filing: 1990-04-12
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Granted: 1990-11-13
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Expires: 2010-04-12
Abstract
Abstract A method for depositing a film of a desired material on a substrate comprises dissolving at least one reagent in a supercritical fluid comprising at least one solvent. Either the reagent is capable of reacting with or is a precursor of a compound capable of reacting with the solvent to form the desired product, or at least one additional reagent is included in the supercritical solution and is capable of reacting with or is a precursor of a compound capable of reacting with the first reagent or with a compound derived from the first reagent to form the desired material. The supercritical solution is expanded to produce a vapor or aerosol and a chemical reaction is induced in the vapor or aerosol so that a film of the desired material resulting from the chemical reaction is deposited on the substrate surface. In an alternate embodiment, the supercritical solution containing at least one reagent is expanded to produce a vapor or aerosol which is then mixed with a gas containing at least one additional reagent. A chemical reaction is induced in the resulting mixture so that a film of the desired material is deposited.
Inventors
- 👤 Robert E. Sievers
- 👤 Brian N. Hansen
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 05:42
CPC Classifications
C; C23; C23C; C23C18/00; B; B05; B05D; B05D1/00; B05D1/02; B05D1/025; C23C16/00; C23C16/44; C23C16/448; C23C16/4485; H; H10; H10N; H10N60/00; H10N60/01; H10N60/0268; H10N60/0296; H10N60/0548; B05D2401/00; B05D2401/90
Claims Analysis
Total Claims: 26
Claim 1
Independent Claim
187 words
A method for depositing a film of a desired material on a substrate, comprising the steps of: (a) dissolving at least one reagent in a supercritical fluid comprising at least one solvent to form a supercritical solution, wherein said at least one reagent is capable of reacting with or is a precursor of a compound capable of reacting with said solvent to form the desired material or wherein said supercritical solution contains at least one additional reagent dissolved therein which is capable of reacting with or is a precursor of a compound capable of reacting with said at least one reagent or with a compound of which said at least one reagent is a precursor to form the desired material; (b) rapidly expanding the supercritical solution to produce a vapor or aerosol containing said at least one reagent, said at least one solvent and any additional reagents dissolved in the supercritical solution; and (c) inducing a chemical reaction in said vapor or aerosol at or near the substrate surface and deposition of a film of the desired material resulting from the chemical reaction on the substrate surface.
Claim 2
Independent Claim
187 words
A method for depositing a film of a desired material on a substrate, comprising the steps of: (a) dissolving at least one reagent in a supercritical fluid comprising at least one solvent to form a supercritical solution, wherein said at least one reagent is capable of reacting with or is a precursor of a compound capable of reacting with said solvent to form the desired material or wherein said supercritical solution contains at least one additional reagent dissolved therein which is capable of reacting with or is a precursor of a compound capable of reacting with said at least one reagent or with a compound of which said at least one reagent is a precursor to form the desired material; (b) rapidly expanding the supercritical solution to produce a vapor or aerosol containing said at least one reagent, said at least one solvent and any additional reagents dissolved in the supercritical solution; and (c) inducing a chemical reaction in said vapor or aerosol at or near the substrate surface and deposition of a film of the desired material resulting from the chemical reaction on the substrate surface.
Claim 3
Dependent Claim
30 words
A method as defined by claim 1, wherein said at least one reagent or a compound derived therefrom reacts with said at least one solvent to form the desired material.
Claim 4
Dependent Claim
49 words
A method as defined by claim 1, wherein said at least one additional reagent is dissolved in said supercritical fluid and the at least one additional reagent or a compound derived therefrom, reacts with said at least one reagent or a compound derived therefrom to form the desired material.
Claim 5
Dependent Claim
20 words
A method as defined by claim 1, wherein the supercritical solution is rapidly expanded by passing through a restrictor orifice.
Claim 6
Dependent Claim
20 words
A method as defined by claim 4, wherein the rapidly expanded supercritical solution is in the form of a vapor.
Claim 7
Dependent Claim
20 words
A method as defined by claim 4, wherein the rapidly expanded supercritical solution is in the form of an aerosol.
Claim 8
Dependent Claim
30 words
A method as defined by claim 1, wherein the chemical reaction and film deposition are induced by oxidation or reduction of at least one component of said vapor or aerosol.
Claim 9
Dependent Claim
23 words
A method as defined by claim 7, wherein said at least one reagent is oxidized or reduced by said at least one solvent.
Claim 10
Dependent Claim
24 words
A method as defined by claim 7, wherein said at least one reagent is oxidized or reduced by said at least one additional reagent.
Claim 11
Dependent Claim
29 words
A method as defined by claim 1, wherein the chemical reaction and film deposition are reduced by thermal decomposition of at least one component of said vapor or aerosol.
Claim 12
Dependent Claim
28 words
A method as defined by claim 1, wherein the chemical reaction and film deposition are induced by hydrolysis of at least one component of said vapor or aerosol.
Claim 13
Dependent Claim
30 words
A method as defined by claim 1, wherein the chemical reaction and film deposition are induced by irradiating at least one component of said vapor or aerosol with electromagnetic radiation.
Claim 14
Dependent Claim
28 words
A method as defined by claim 1, wherein the chemical reaction and film deposition are induced by ionization of at least one component of said vapor or aerosol.
Claim 15
Dependent Claim
20 words
A method as defined by claim 13, wherein the ionization is effected by electromagnetic radiation, electron impact or chemical means.
Claim 16
Dependent Claim
25 words
A method as defined by claim 1, wherein the chemical reaction and film deposition are induced by passing said vapor or aerosol through a plasma.
Claim 17
Dependent Claim
22 words
A method as defined by claim 15, wherein the plasma is generated by direct current, by radio frequency or by microwave discharge.
Claim 18
Dependent Claim
20 words
A method as defined by claim 1, including the further step of exposing the deposited film to an oxidizing agent.
Claim 19
Dependent Claim
20 words
A method as defined by claim 1, including the further step of exposing the deposited film to an oxidizing plasma.
Claim 20
Dependent Claim
23 words
A method as defined by claim 1, including the further step of exposing the deposited film to water vapor at an elevated temperature.
Claim 21
Dependent Claim
13 words
A method as defined by claim 1, wherein the supercritical fluid comprises n-pentane.
Claim 22
Dependent Claim
23 words
A method as defined by claim 20, wherein the supercritical solution comprises Y(thd) 3 , Ba(thd) 2 and Cu(thd) 3 dissolved in n-pentane.
Claim 23
Dependent Claim
33 words
A method as defined by claim 1, wherein the rate of film deposition is varied by varying the temperature of the substrate or of a deposition chamber in which the substrate is arranged.
Claim 24
Dependent Claim
35 words
A method as defined by claim 1, wherein the physical characteristics of the deposited film are varied by varying the temperature of the substrate or of a deposition chamber in which the substrate is arranged.
Claim 25
Independent Claim
153 words
A method for depositing a film of a desired material on a substrate, comprising the steps of: (a) dissolving at least one reagent in a supercritical fluid comprising at least one solvent to form a supercritical solution; (b) rapidly expanding the supercritical solution to produce a vapor or aerosol containing said at least one reagent and said at least one solvent; (c) mixing said vapor or aerosol with a gas containing at least one additional reagent dissolved therein which is capable of reacting with or is a precursor of a compound capable of reacting with said at least one reagent or with a compound of which said at least one reagent is a precursor to form the desired material; and (d) inducing a chemical reaction in the resulting mixture at or near the substrate surface and deposition of a film of the desired material resulting from the chemical reaction on the substrate surface.
Claim 26
Independent Claim
153 words
A method for depositing a film of a desired material on a substrate, comprising the steps of: (a) dissolving at least one reagent in a supercritical fluid comprising at least one solvent to form a supercritical solution; (b) rapidly expanding the supercritical solution to produce a vapor or aerosol containing said at least one reagent and said at least one solvent; (c) mixing said vapor or aerosol with a gas containing at least one additional reagent dissolved therein which is capable of reacting with or is a precursor of a compound capable of reacting with said at least one reagent or with a compound of which said at least one reagent is a precursor to form the desired material; and (d) inducing a chemical reaction in the resulting mixture at or near the substrate surface and deposition of a film of the desired material resulting from the chemical reaction on the substrate surface.
References Cited (Backward Citations)
US4582731A
Cited
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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