US4968893A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Scanning electron beam exposure system
Assignee: Fujitsu Ltd
•
Filing: 1989-04-18
•
Granted: 1990-11-06
•
Expires: 2009-04-18
Abstract
Abstract A scanning electron beam exposure system includes two apertures (39a, 48a) for forming a rectangular beam (31). The cross section of the rectangular beam is changed by a deflection unit (47X, 47Y) arranged between the two apertures. The rectangular beam is refocused by a refocusing coil (51) to improve the peripheral sharpness of a projected image of the beam. The refocusing coil is controlled in accordance with the cross section (X 1 , Y 1 ) of the beam.
Inventors
- 👤 Hiroshi Yasuda
- 👤 Haruo Tsuchikawa
- 👤 Takayuki Miyazaki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 21:03
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/302; H01J37/3002; H01J37/3007; H01J37/3023
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
331 words
A scanning electron beam exposure system providing an electron beam, comprising: means for emitting the electron beam; first aperture means for passing the electron beam therethrough; second aperture means for passing therethrough the electron beam passed through said first aperture means to shape the cross section of the electron beam into a rectangular form; means for storing and transmitting information on a plurality of rectangular patterns defined by first size information and first position information; pattern-generating means, operatively connected to said storing means, for generating information on an exposure pattern defined by second size information and second position information; first deflecting means, operatively connected to said pattern-generating means and positioned beween said first and second aperture means, for deflecting the electron beam to change the shape of the cross section of the electron beam passed through said second aperture means in accordance with the second size information; at least two converging means, located at different positions in he electron beam exposure system, for converging the electron beam; means for refocusing the electron beam passed through said second aperture means in accordance with the second size information, said refocusing means comprising: a coreless coil provided within a first one of said at least two converging means and adjacent to a second one of said at least two converging means; first multiplying means, operatively connected to said pattern-generating means, for multiplying said second size information and outputting a first multiplied signal; first register means for storing a first coefficient; second multiplying means, operatively connected to said first register means and said first multiplying means, for multiplying the first multiplied signal by said first coefficient and outputting a second multiplied signal; and driving means, operatively connected to said second multiplying means and said coreless coil, for driving said coreless coil in accordance with the second multiplied signal; and second deflecting means, operatively connected to said pattern-generating means, for deflecting the electron beam passed through said refocusing means in accordance with said second position information.
Claim 2
Dependent Claim
331 words
A scanning electron beam exposure system providing an electron beam, comprising: means for emitting the electron beam; first aperture means for passing the electron beam therethrough; second aperture means for passing therethrough the electron beam passed through said first aperture means to shape the cross section of the electron beam into a rectangular form; means for storing and transmitting information on a plurality of rectangular patterns defined by first size information and first position information; pattern-generating means, operatively connected to said storing means, for generating information on an exposure pattern defined by second size information and second position information; first deflecting means, operatively connected to said pattern-generating means and positioned beween said first and second aperture means, for deflecting the electron beam to change the shape of the cross section of the electron beam passed through said second aperture means in accordance with the second size information; at least two converging means, located at different positions in he electron beam exposure system, for converging the electron beam; means for refocusing the electron beam passed through said second aperture means in accordance with the second size information, said refocusing means comprising: a coreless coil provided within a first one of said at least two converging means and adjacent to a second one of said at least two converging means; first multiplying means, operatively connected to said pattern-generating means, for multiplying said second size information and outputting a first multiplied signal; first register means for storing a first coefficient; second multiplying means, operatively connected to said first register means and said first multiplying means, for multiplying the first multiplied signal by said first coefficient and outputting a second multiplied signal; and driving means, operatively connected to said second multiplying means and said coreless coil, for driving said coreless coil in accordance with the second multiplied signal; and second deflecting means, operatively connected to said pattern-generating means, for deflecting the electron beam passed through said refocusing means in accordance with said second position information.
Claim 3
Dependent Claim
47 words
A system as set forth in claim 1, further comprising flyback means, operatively connected to said refocusing means, for flying back the electron beam passed through said refocusing means and correcting the shift in the position of the electron beam in accordance with the second size information.
Claim 4
Dependent Claim
129 words
A system as set forth in claim 2, wherein said flyback means comprises: second register means, operatively connected to said first multiplying means, for storing a second coefficient; third register means, operatively connected to said first multiplying means, for storing a third coefficient; third multiplying means, operatively connected to said second register means and said first multiplying means, for multiplying the first multiplied signal by said second coefficient and outputting a first signal; and fourth multiplying means, operatively connected to said third register means and said first multiplying means, for multiplying said first multiplied signal by said third coefficient and outputting a second signal, and wherein said flyback means controls said second deflecting means in accordance with the first and second signals of said third and fourth multiplying means.
Claim 5
Dependent Claim
39 words
A system as set forth in claim 1, wherein said pattern-generating means generates a plurality of divided exposure patterns each having the same size when said storing means transmits a rectangular pattern which is larger than a predetermined size.
Claim 6
Dependent Claim
154 words
A system as set forth in claim 4, wherein said pattern-generating means comprises: first registers divided into first, second and third sets, operatively connected to said means for storing and transmitting information, for receiving the information; second registers, operatively connected to the first set of said first registers, for storing the divided exposure patterns; third registers, operatively connected to the second set of said first registers, for storing the position information; subtracters operatively connected to the third set of said first registers and said second registers; adders operatively connected to the third set of said first registers and said third registers; comparators operatively connected to said second registers; and first and second AND circuits, said first AND circuit operatively connected to said comparators and said second AND circuit operatively connected to one of said comparators, one of said adders, one of said subtracters, one of said second registers and one of said third registers.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-11-05 | 1994-05-07 | 1994-11-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-11-05 | 1998-05-07 | 1998-11-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-11-05 | 2002-05-07 | 2002-11-06 | $7700.00 | Window Closed / Lapsed |