Wafer hanger useful for thermally treating semiconductor wafers

Claim 2

A wafer hanger useful for hanging semiconductor wafers therefrom in a furnace in order to thermally treating said wafers, comprising: (a) a rod member capable of being inserted into respective engage holes formed in edge portions of said wafers; and (b) a supporting member for supporting said rod member in a horizontal direction at both end portions of said rod member, wherein said rod member is separatable from said supporting member, and said rod member and said supporting member are made of a material resistant to a temperature for a heat treatment of said wafers in said furnace.

Claim 3

A wafer hanger of claim 1, wherein height larger than respective diameters of said wafers.

Claim 4

A wafer hanger of claim 2, wherein said height is such that respective center points of said wafers are substantially at a center level of a heating space in said furnace when said wafer hanger is placed in said heating space.

Claim 5

A wafer hanger of claim 3, wherein said supporting member comprises: (b-1) a pair of stand portions standing in a vertical direction on which said both end portions of said rod member are placed, respectively; and (b-2) a pair of horizontal rod portions connecting said pair of stand portions with each other in said horizontal direction.

Claim 6

A wafer hanger of claim 4, wherein each of said standing portions has a triangular frame, and a recess is formed on a top apex of said triangular frame in order to receive a corresponding end portion of said rod member.

Claim 7

A wafer hanger useful for hanging semiconductor wafers therefrom in a furnace in order to thermally treating said wafers, comprising: (a) a rod portion having a linear array of tapered notches which are aligned in an axial direction of said rod portion, each of said tapered notches having an opening whose width is larger than respective thickness of said wafers and a bottom whose width is smaller than said respective thickness, said rod portion being made of a first material which is resistant to a temperature for a heat treatment of said wafers and has a thermal expansion coefficient smaller than a thermal expansion coefficient of said wafers; and (b) a supporting portion supporting said rod portion in a horizontal direction at both ends of said rod portion and being made of a second material resistant to said temperature for said heat treatment, wherein said wafers can be hung from said wafer hanger by inserting respective end portions of said wafers into said tapered notches, respectively.

Claim 8

A wafer hanger useful for hanging semiconductor wafers therefrom in a furnace in order to thermally treating said wafers, comprising: (a) a rod portion having a linear array of tapered notches which are aligned in an axial direction of said rod portion, each of said tapered notches having an opening whose width is larger than respective thickness of said wafers and a bottom whose width is smaller than said respective thickness, said rod portion being made of a first material which is resistant to a temperature for a heat treatment of said wafers and has a thermal expansion coefficient smaller than a thermal expansion coefficient of said wafers; and (b) a supporting portion supporting said rod portion in a horizontal direction at both ends of said rod portion and being made of a second material resistant to said temperature for said heat treatment, wherein said wafers can be hung from said wafer hanger by inserting respective end portions of said wafers into said tapered notches, respectively.

Claim 9

A wafer hanger of claim 6, wherein said linear array of tapered notches is a periodic array of tapered notches.

Claim 10

A wafer hanger of claim 7, wherein said supporting portion supports said rod portion at a height larger than respective diameters of said wafers.

Claim 11

A wafer hanger of claim 8, wherein said height is such that respective center points of said wafers are substantially at a center level of a heating space in said furnace when said wafer hanger is placed in said heating space.

Claim 12

A wafer hanger of claim 9, wherein said supporting portion comprises: (b-1) a pair of stand portions standing in a vertical direction on which said both ends of said rod portion are supported, respectively; and (b-2) a pair of horizontal rod portions connecting said pair of stand portions with each other in said horizontal direction.

Claim 13

A wafer hanger of claim 10, wherein said rod portion is separatable from said supporting portion.

Claim 14

A wafer hanger of claim 11, wherein said furnace has a heating tube having a shape of a lateral cylinder, and each of said standing portions has a shape of an anchor having a vertical axis and a pair of arms extending from a bottom part of said vertical axis, each of said arms having a shape of an arc which fits on an inner bottom surface of said heating tube, a recess being formed on a top of said vertical axes in order to receive a corresponding end of said rod portion.