US4957834A
Expired / Lapsed
US
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Method for manufacturing photomask
Assignee: Mitsubishi Electric Corp
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Filing: 1988-11-03
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Granted: 1990-09-18
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Expires: 2008-11-03
Abstract
Abstract In manufacturing a photomask, a molybdenum silicide film is formed on the main surface of a quartz substrate. A resist film having a pattern is, then, formed on the molybdenum silicide film. Thereafter, the molybdenum silicide film is etched using the resist film as a mask. The etching is effected in a plasma generated in a mixed gas containing nitrogen gas in CF 4 gas.
Inventors
- 👤 Shuichi Matsuda
- 👤 Yaichiro Watakabe
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 00:41
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/54; G03F1/68; G03F1/80
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
116 words
A method for manufacturing a photomask, comprising providing a transparent glass substrate, said substrate being provided with a main surface; forming on the main surface of the substrate a refractory metal silicide film, said silicide film having a main surface opposite the side where the silicide film contacts the main surface of the substrate; forming resistant films on the main surface of the silicide film, said resistant films being formed at a predetermined distance from one another to expose portions of the main surface of the silicide film; and plasma etching the exposed portions of the main surface of the metal silicide film in a gas mixture containing at least nitrogen gas and CF 4 gas.
Claim 2
Independent Claim
116 words
A method for manufacturing a photomask, comprising providing a transparent glass substrate, said substrate being provided with a main surface; forming on the main surface of the substrate a refractory metal silicide film, said silicide film having a main surface opposite the side where the silicide film contacts the main surface of the substrate; forming resistant films on the main surface of the silicide film, said resistant films being formed at a predetermined distance from one another to expose portions of the main surface of the silicide film; and plasma etching the exposed portions of the main surface of the metal silicide film in a gas mixture containing at least nitrogen gas and CF 4 gas.
Claim 3
Dependent Claim
25 words
A method for manufacturing a photomask in accordance with claim 1, wherein said nitrogen gas is contained in the gas mixture at 4 to 12%.
Claim 4
Dependent Claim
21 words
A method for manufacturing a photomask in accordance with claim 2, wherein said metal silicide film comprises a molybdenum silicide film.
Claim 5
Dependent Claim
47 words
A method for manufacturing a photomask in accordance with claim 3, wherein the step of forming said resist films comprises the steps of applying an electron beam sensitive resist to said film of silicide and drawing a mask pattern on said resist film by an electron beam.
Claim 6
Independent Claim
159 words
A method of manufacturing a photomask, comprising providing a transparent glass substrate with a main surface; forming a refractory metal silicide film on the main surface of the substrate, the thus formed film being provided with a main surface opposite the side where the silicide film contacts the main surface of the substrate; forming resistant films on the main surface of the silicide film, the resistant films being formed at a predetermined distance from one another to expose portions of the main surface of the metal silicide film; and plasma etching the exposed portions of the main surface of the metal silicide film in a gas mixture containing at least nitrogen ga and a halogen-containing gas comprising CF 4 , the nitrogen gas and the halogen-containing gas being present in proportions and the RF discharge occurring at a frequency and with an output density effective to etch the metal silicide film at a speed higher than the resistant films.
Claim 7
Independent Claim
159 words
A method of manufacturing a photomask, comprising providing a transparent glass substrate with a main surface; forming a refractory metal silicide film on the main surface of the substrate, the thus formed film being provided with a main surface opposite the side where the silicide film contacts the main surface of the substrate; forming resistant films on the main surface of the silicide film, the resistant films being formed at a predetermined distance from one another to expose portions of the main surface of the metal silicide film; and plasma etching the exposed portions of the main surface of the metal silicide film in a gas mixture containing at least nitrogen ga and a halogen-containing gas comprising CF 4 , the nitrogen gas and the halogen-containing gas being present in proportions and the RF discharge occurring at a frequency and with an output density effective to etch the metal silicide film at a speed higher than the resistant films.
Claim 8
Dependent Claim
19 words
The method of claim 5, wherein the gas mixture utilized in the plasma etching step, further comprises oxygen gas.
Claim 9
Dependent Claim
68 words
The method of claim 6, wherein the plasma etching step is conducted in a gas mixture containing the nitrogen gas, oxygen gas and the halogen-containing gas; the nitrogen gas, the oxygen gas and the halogen-containing gas being present in proportions and the RF discharge occurring at a frequency and with an output density effective to etch the metal silicide film at a faster rate than the resistant films.
Claim 10
Dependent Claim
13 words
The method of claim 5, wherein the glass substrate comprises a quartz substrate.
Claim 11
Dependent Claim
22 words
The method of claim 5, wherein the gas mixture utilized in the plasma etching step comprises 4 to 12% of nitrogen gas.
Claim 12
Dependent Claim
23 words
The method of claim 5, wherein the metal silicide film formed on the main surface of the substrate comprises a molybdenum silicide film.
Claim 13
Dependent Claim
37 words
The method of claim 5, wherein the resistant films-forming step comprises applying an electron beam-sensitive resist to the main surface of the silicide film; and drawing a mask pattern on the resist film with an electron beam.
Claim 14
Dependent Claim
26 words
The method of claim 5, wherein in the plasma etching step the RF discharge occurs with an output density of 0.1 to 0.2 W/cm 2 .
References Cited (Backward Citations)
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| 3.5 Years (Year 4) | 1993-09-17 | 1994-03-19 | 1994-09-18 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-09-17 | 1998-03-19 | 1998-09-18 | $3760.00 | Window Closed / Lapsed |
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