US4950642A
Expired / Lapsed
US
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Method for fabricating superconducting oxide thin films by activated reactive evaporation
Assignee: Hitachi Ltd
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Filing: 1988-08-05
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Granted: 1990-08-21
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Expires: 2008-08-05
Abstract
Abstract A process for fabricating a superconducting oxide thin film is disclosed which comprises the steps of separately evaporating metal elements, of which the superconducting oxide thin film with a desired stoichiometry is to be composed, to a substrate and simultaneously irradiating the substrate with oxygen plasma generated by RF wave or ECR microwave to form a crystalline oxide film without further annealing.
Inventors
- 👤 Yukio Okamoto
- 👤 Toshiyuki Aida
- 👤 Katsuki Miyauchi
- 👤 Kazumasa Takagi
- 👤 Tokuumi Fukazawa
- 👤 Shinji Takayama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 06:38
CPC Classifications
H; H10; H10N; H10N60/00; H10N60/01; H10N60/0268; H10N60/0296; H10N60/0492; C; C23; C23C; C23C14/00; C23C14/0021; C23C14/0036; C23C14/0026; C23C14/0031; C23C14/06; C23C14/08; C23C14/087; C23C14/22; C23C14/24; C23C14/32; C23C16/00; C23C16/22; C23C16/30; C23C16/40; C23C16/408; C23C16/44; C23C16/50; C23C16/517; C23C4/00; C23C4/04; C23C4/10; C23C4/11; H10N60/0548; Y; Y10; Y10S; Y10S505/00; Y10S505/725; Y10S505/73; Y10S505/732; Y10S505/786
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
115 words
A method for fabricating a ceramic oxide superconducting thin film, comprising the steps of applying a mixture of vapor of metal elements, of which the superconducting thin film is to be composed, said vapor begin generated in an evaporation chamber evacuated to a high vacuum by a differential pumping mechanism, and a plasma gas containing oxygen ions generated in a plasma chamber separated from said evaporation chamber to a substrate, wherein said evaporation chamber is evacuated to a high vacuum higher than that of said plasma chamber; and reacting said vapor and said gas with each other on said substrate in a reaction chamber to grow a superconductive thin film by crystallization without further annealing.
Claim 2
Independent Claim
115 words
A method for fabricating a ceramic oxide superconducting thin film, comprising the steps of applying a mixture of vapor of metal elements, of which the superconducting thin film is to be composed, said vapor begin generated in an evaporation chamber evacuated to a high vacuum by a differential pumping mechanism, and a plasma gas containing oxygen ions generated in a plasma chamber separated from said evaporation chamber to a substrate, wherein said evaporation chamber is evacuated to a high vacuum higher than that of said plasma chamber; and reacting said vapor and said gas with each other on said substrate in a reaction chamber to grow a superconductive thin film by crystallization without further annealing.
Claim 3
Dependent Claim
31 words
A method according to claim 1, wherein the plasma gas containing oxygen ions is generated by means of an electron cyclotron resonance microwave plasma generator or a radio frequency plasma generator.
Claim 4
Dependent Claim
37 words
A method according to claim 1 wherein said vapor and said plasma gas are reacted with each other on said substrate at a temperature of about 400° C. to produce said superconducting thin film on said substrate.
Claim 5
Independent Claim
107 words
A method for fabricating a ceramic oxide superconducting, thin film comprising the steps of: preparing a stream of vapor of the plural metal elements of which the superconductive material is to be composed in a vacuum chamber; forming oxygen plasma ions within said chamber using an electron cyclotron resonance microwave plasma generator; and directing said stream of vapor of the plural metal elements onto a substrate in an atmosphere of said oxygen plasma ions so that said plural metal elements and said oxygen plasma ions react on the surface of the substrate to form a thin film of the ceramic oxide superconducting material without requiring post-heat treatment.
Claim 6
Independent Claim
107 words
A method for fabricating a ceramic oxide superconducting, thin film comprising the steps of: preparing a stream of vapor of the plural metal elements of which the superconductive material is to be composed in a vacuum chamber; forming oxygen plasma ions within said chamber using an electron cyclotron resonance microwave plasma generator; and directing said stream of vapor of the plural metal elements onto a substrate in an atmosphere of said oxygen plasma ions so that said plural metal elements and said oxygen plasma ions react on the surface of the substrate to form a thin film of the ceramic oxide superconducting material without requiring post-heat treatment.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-08-20 | 1994-02-19 | 1994-08-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-08-20 | 1998-02-19 | 1998-08-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-08-20 | 2002-02-19 | 2002-08-21 | $7700.00 | Window Closed / Lapsed |