US4944893A
Expired / Lapsed
US
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Remover solution for resist
Assignee: Tokyo Ohka Kogyo Co Ltd
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Filing: 1988-09-12
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Granted: 1990-07-31
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Expires: 2008-09-12
Abstract
Abstract The remover composition of the invention is advantageous in respect of the thermal stability without precipitation of insoluble matters when the remover is used prolongedly in a removing work of patterned resist, e.g., photoresist, layer in the manufacturing process of semiconductor devices. The inventive remover composition characteristically contains 1 to 50,000 ppm by weight of an acetylene alcohol such as 3-methyl-2-butyn-3-ol added to an organic remover solution composed of an alkylbenzene sulfonic acid, phenol compound, halogenated hydrocarbon compound and/or aromatic hydrocarbon compound.
Inventors
- 👤 Hatsuyuki Tanaka
- 👤 Masakazu Kobayashi
- 👤 Kazumasa Wakiya
- 👤 Toshimasa Nakayama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 16:51
CPC Classifications
C; C11; C11D; C11D7/00; C11D7/50; C11D7/5004; C11D7/5022; G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/426
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
66 words
A remover composition for a resist which comprises, in an add mixture; (a) an organic remover solution comprising an alkylbenzene sulfonic acid having 7 to 20 carbon atoms and at least one compound selected from the group consisting of phenols halogenated hydrocarbons and aromatic hydrocarbons; and (b) an actylene alcohol in an amount from 1 to 50,000 ppm by weight based on the organic remover solution.
Claim 2
Dependent Claim
66 words
A remover composition for a resist which comprises, in an add mixture; (a) an organic remover solution comprising an alkylbenzene sulfonic acid having 7 to 20 carbon atoms and at least one compound selected from the group consisting of phenols halogenated hydrocarbons and aromatic hydrocarbons; and (b) an actylene alcohol in an amount from 1 to 50,000 ppm by weight based on the organic remover solution.
Claim 3
Dependent Claim
59 words
The remover composition for resist as claimed in claim 1 wherein the alkylbenzene sulfonic acid is selected from the group consisting of ethylbenzene sulfonic acid, methylethylbenzene sulfonic acid trimethylbenzene sulfonic acid, propylbenzene sulfonic acid, cumene sulfonic acid, hexylbenzene sulfonic acid, heptylbenzene sulfonic acid, octylbenzene sulfonic acid, decylbenzene sulfonic acid, dodecylbenzene sulfonic acid, tridecylbenzene sulfonic acid and tetradecylbenzene sulfonic acid.
Claim 4
Dependent Claim
34 words
The remover composition for resist as claimed in claim 1 wherein the phenol compound is selected from the group consisting of phenol, halogenated phenols, catechol, cresols, xylenols, 4-tert-butyl phenol, 4-tert-butyl catechol and nonyl phenol.
Claim 5
Dependent Claim
34 words
The remover composition for resist as claimed in claim 1 wherein the halogenated hydrocarbon compound is selected from the group consisting of 1,2,3-trichloropropane, dichloropentane, hexyl chloride, 1,2-dibromoethane, chlorobenzene, 1,2-dichlorobenzene, trichlorobenzene, bromobenzene, 1,2-dibromobenzene and 2-chlorotoluene.
Claim 6
Dependent Claim
40 words
The remover composition for resist as claimed in claim 1 wherein the aromatic hydrocarbon compound is selected from the group consisting of naphthalene, methyl naphthalene, dimethyl naphthalene, tetrahydronaphthalene, dodecyl benzene, di(dodecyl)benzene, octyl benzene, decyl benzene, isopropyl naphthalene and diisopropyl naphthalene.
Claim 7
Dependent Claim
30 words
The remover composition for resist as claimed in claim 1 wherein the acetylene alcohol is selected from the group consisting of 3-methyl-1-butyn-3-ol, 3-methyl-1-pentyn-3-ol, 2,5- dimethyl-3-hexyn-2,5-diol, 3,6-dimethyl-4-octyn-3,6-diol, 2,4,7,9-tetramethyl-5-decyn-4,7-diol and 3,5-dimethyl-1-hexyn- 3-ol.
Claim 8
Dependent Claim
34 words
The remover composition for resist as claimed in claim 1 wherein the amount of the acetylene alcohol is in the range from 10 to 10,000 ppm by weight based on the organic remover solution.
References Cited (Backward Citations)
US3988256A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-07-30 | 1994-01-29 | 1994-07-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-07-30 | 1998-01-29 | 1998-07-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-07-30 | 2002-01-29 | 2002-07-31 | $7700.00 | Window Closed / Lapsed |