US4944831A
Expired / Lapsed
US
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Process for obtaining a pattern, in ferromagnetic material having differently sloping sides
Assignee: Commissariat à l'Énergie Atomique et Aux Énergies Alternatives
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Filing: 1988-08-05
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Granted: 1990-07-31
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Expires: 2008-08-05
Abstract
Abstract Process for obtaining a pattern, particularly of ferromagnetic material, having differently sloping sides and magnetic head having such a pattern. This process consists of depositing on a ferromagnetic layer (4) resting on a ceramic support (2), a photosensitive resin layer (6), forming by photolithography an opening (8) in said resin layer and then polymerizing said resin in order that the sides (8a) of the opening are inclined, forming a two-layer mask (10a, 12a) on the resin layer partly masking said opening and defining the shape of the pattern to be produced in the ferromagnetic layer, anisotropically etching the resin layer in order to eliminate the unmasked regions of said layer, eliminating the mask, anisotropically eteching the ferromagnetic layer (4) using the etched resin layer as the etching mask (6a) and eliminating the remainder of the resin layer.
Inventors
- 👤 Henri Sibuet
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 10:27
CPC Classifications
H; H01; H01F; H01F41/00; H01F41/32; H01F41/34; G; G11; G11B; G11B5/00; G11B5/127; G11B5/31; G11B5/3163; G11B5/3176; G11B5/3179; G11B5/3183; Y; Y10; Y10T; Y10T29/00; Y10T29/49; Y10T29/49002; Y10T29/4902; Y10T29/49021; Y10T29/49032; Y10T29/49036; Y10T29/49043; Y10T29/49046
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
155 words
Process for obtaining a pattern (4a) in a first material having differently sloping sides (20, 24), characterized in that it comprises the following stages: (a) deposition on a layer of first material (4) of a first photosensitive resin (6) layer, (b) formation of an opening (8) with inclined sides (8a) in the first resin layer (6), (c) producing a mask (10a, 12a) on the first resin layer (6), partly masking said opening (8), defining the shape or the pattern to be produced and having an inclined side (11a, 13) facing said opening, (d) anisotropic etching of the first resin layer (6) in order to eliminate the regions of said first layer which are not masked, (e) elimination of the mask (12a), (f) anisotropic etching of the layer of the first material (4a) using the first etched resin layer as the etching mask (6a), and (g) elimination of the remainder of the first resin layer (6).
Claim 2
Dependent Claim
155 words
Process for obtaining a pattern (4a) in a first material having differently sloping sides (20, 24), characterized in that it comprises the following stages: (a) deposition on a layer of first material (4) of a first photosensitive resin (6) layer, (b) formation of an opening (8) with inclined sides (8a) in the first resin layer (6), (c) producing a mask (10a, 12a) on the first resin layer (6), partly masking said opening (8), defining the shape or the pattern to be produced and having an inclined side (11a, 13) facing said opening, (d) anisotropic etching of the first resin layer (6) in order to eliminate the regions of said first layer which are not masked, (e) elimination of the mask (12a), (f) anisotropic etching of the layer of the first material (4a) using the first etched resin layer as the etching mask (6a), and (g) elimination of the remainder of the first resin layer (6).
Claim 3
Dependent Claim
20 words
Process according to claim 1, characterized in that a first positive photosensitive resin layer (6) polymerizable by heating is used.
Claim 4
Dependent Claim
36 words
Process according to claim 2, characterized in that stage b) comprises forming an opening (8) by photolithography in the first resin layer and annealing the resin in order to obtain inclined sides (8a) of said opening.
Claim 5
Dependent Claim
105 words
Process according to claim 1, characterized in that stage (c) comprises: depositing a second material layer (10) on the structure obtained during stage (b), which can be selectively etched with respect to the first material and with respect to the resin, depositing a second photosensitive resin layer (12) on the entire second material layer (10), defining the shape (12a) of the pattern (4a) to be produced in the second resin layer by photolithography, anisotropically etching the second material layer (10) in order to eliminate the second material regions not covered with resin (12a) and to expose the underlying regions of the first resin layer (6).
Claim 6
Dependent Claim
17 words
Process according to claim 1, characterized in that the first material layer (4) is a ferromagnetic layer.
Claim 7
Dependent Claim
21 words
Process according to claim 1, characterized in that the first material layer (4) is a layer based on iron and nickel.
Claim 8
Dependent Claim
14 words
Process according to claim 1, characterized in that the second material is silicon dioxide.
Claim 9
Dependent Claim
24 words
Process according to claim 1, wherein said pattern is of a pole piece of a read - write magnetic head on an insulating substrate.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-07-30 | 1994-01-29 | 1994-07-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-07-30 | 1998-01-29 | 1998-07-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-07-30 | 2002-01-29 | 2002-07-31 | $7700.00 | Window Closed / Lapsed |