Abstract A metal lead frame for an integrated circuit package is disclosed having stress relieving means formed therein to inhibit breakage of a thermally mismatched silicon die subsequently attached thereto and then heated during normal operation of the device. The stress relieving means may comprise parallel grooves formed in one or both surfaces of the central portion of the lead frame where a silicon integrated circuit die will subsequently be bonded to the lead frame. Preferably, the grooves are formed in both axes comprising the plane of the lead frame and may be formed on both surfaces of the lead frame. The stress relieving means may also comprise a series of openings cut through the central portion of the lead frame.
A metal lead frame for an integrated circuit package comprising a central metal die support portion having thermal stress relieving means formed in at least one surface thereof comprising parallel grooves having a depth of from about 40 to 70% of the thickness of said lead frame to inhibit breakage of a silicon die susequently attached thereto when the package is heated during normal operation and the silicon has a different coefficient of expansion than the central metal die support portion of the lead frame to which it is bonded.
Claim 2
Dependent Claim
90 words
A metal lead frame for an integrated circuit package comprising a central metal die support portion having thermal stress relieving means formed in at least one surface thereof comprising parallel grooves having a depth of from about 40 to 70% of the thickness of said lead frame to inhibit breakage of a silicon die susequently attached thereto when the package is heated during normal operation and the silicon has a different coefficient of expansion than the central metal die support portion of the lead frame to which it is bonded.