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US4917758A Expired / Lapsed US ⏱️ 0.0 years remaining

Method for preparing thin copper foil-clad substrate for circuit boards

Assignee: Mitsubishi Gas Chemical Co Inc
•
Filing: 1989-05-19
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Granted: 1990-04-17
•
Expires: 2009-05-19
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Abstract

Abstract A method for preparing a thin copper foil-clad substrate for the manufacture therefrom of circuit boards, which comprises subjecting a copper foil-clad circuit board substrate comprising an electrically insulating support having provided on one or both sides thereof a copper foil having an average thickness of 12 μm or more to etching with an etching solution for copper, the etching being performed such that the whole surface of the copper foil is etched at a predetermined etching rate selected from the range of from 0.01 to 0.3 μm/sec, thereby to reduce the thickness of the copper foil on at least one side of the insulating support to 10 to 80% of its original thickness, and the variation of the thickness of the copper foil remaining after the etching is within ±2.0 μm on the basis of a desired thickness.

Inventors

  • 👤 Koichi Ishizuka
  • 👤 Morio Gaku
  • 👤 Kenzi Ishii
  • 👤 Hidenori Kinbara
  • 👤 Masakazu Motegi

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-31 18:49
CPC Classifications
C; C23; C23F; C23F1/00; C23F1/10; C23F1/14; C23F1/16; C23F1/18; H; H05; H05K; H05K3/00; H05K3/02; H05K3/06; H05K2203/00; H05K2203/03; H05K2203/0353

Claims Analysis

Total Claims: 17
Claim 1
Independent Claim 139 words
A method for preparing a thin copper foil-clad substrate for the manufacture therefrom of circuit boards, which comprises subjecting a copper foil-clad circuit board substrate comprising an electrically insulating support having provided on one or both sides thereof a copper foil having an average thickness of 12 μm or more to etching with an etching solution for copper, said etching being performed such that the whole surface of the copper foil is etched at a predetermined etching rate selected from the range of from 0.01 to 0.3 μm/sec, thereby to reduce the thickness of the copper foil on at least one side of the insulating support to 10 to 80% of its original thickness, and the variation of the thickness of the copper foil remaining after the etching is within ±2.0 μm on the basis of a desired thickness.
Claim 2
Independent Claim 139 words
A method for preparing a thin copper foil-clad substrate for the manufacture therefrom of circuit boards, which comprises subjecting a copper foil-clad circuit board substrate comprising an electrically insulating support having provided on one or both sides thereof a copper foil having an average thickness of 12 μm or more to etching with an etching solution for copper, said etching being performed such that the whole surface of the copper foil is etched at a predetermined etching rate selected from the range of from 0.01 to 0.3 μm/sec, thereby to reduce the thickness of the copper foil on at least one side of the insulating support to 10 to 80% of its original thickness, and the variation of the thickness of the copper foil remaining after the etching is within ±2.0 μm on the basis of a desired thickness.
Claim 3
Dependent Claim 31 words
A method as claimed in claim 1, wherein the variation of the thickness of the copper foil remaining after etching is within ±1.0 μm on the basis of a desired thickness.
Claim 4
Dependent Claim 88 words
A method as claimed in claim 1, wherein said etching solution for copper is an aqueous solution containing 1.5 to 4 w/v % hydrogen peroxide, 3 to 7 w/v % sulfuric acid, and 10 to 60 g/l copper, the concentrations of hydrogen peroxide and sulfuric acid being each regulated within ±0.3 w/v % on the basis of a predetermined concentration, and the etching is performed at a temperature of from 25° to 50° C., the temperature being regulated within ±1.0° C. on the basis of a predetermined temperature.
Claim 5
Dependent Claim 24 words
A method as claimed in claim 3, wherein said etching solution for copper further contains 0.1 to 5 w/v % alcohol as an auxiliary.
Claim 6
Dependent Claim 78 words
A method as claimed in claim 1, wherein said etching solution for copper is an aqueous solution containing 0.25 to 3 mol/l cupric chloride and 1 to 4 mol/l hydrogen chloride, at least the concentration of hydrogen chloride being regulated within ±0.3 mol/l on the basis of a predetermined concentration, and the etching is performed at a temperature of from 25° to 55° C., the temperature being regulated within ±5.0° C. on the basis of a predetermined temperature.
Claim 7
Dependent Claim 28 words
A method as claimed in claim 5, wherein after the etching, the whole surface of the copper foil is further etched with a hydrogen peroxide/sulfuric acid etching solution.
Claim 8
Dependent Claim 41 words
A method as claimed in claim 1, which further comprises cleaning the surface of the copper foil remaining after the etching, and then covering the cleaned surface with an anti-corrosive agent or a strippable resin coating, thereby protecting the copper surface.
Claim 9
Dependent Claim 30 words
A method as claimed in claim 7, wherein the cleaning is performed by treating, immediately after the etching, the surface of the remaining copper foil with a water-soluble anti-corrosive agent.
Claim 10
Dependent Claim 15 words
A method as claimed in claim 7, wherein said strippable resin coating is a photoresist.
Claim 11
Dependent Claim 83 words
A method as claimed in claim 1, wherein said copper foil-clad circuit board substrate is a double-side copper foil-clad circuit board substrate, and the etching is performed such that the thickness of the copper foil on at least one side of the insulating support is reduced to 3 to 15 μm, thereby to prepare a double-side thin copper foil-clad circuit board substrate in which each side of the insulating support has a copper foil adhered thereto, the two copper foils having different thicknesses.
Claim 12
Dependent Claim 69 words
A method as claimed in claim 10, wherein the etching of said double-side copper foil-clad circuit board substrate is performed by means of a spray-type etching machine, with its spray nozzles for spraying an etching solution being positioned on each side of said double-side copper foil-clad circuit board substrate, the number of said spray nozzles on one side of the substrate being different from that for the other side.
Claim 13
Dependent Claim 60 words
A method as claimed in claim 1, wherein said copper foil-clad circuit board substrate is a double-side copper foil-clad circuit board substrate, and the etching is performed such that the thickness of the copper foil on one side of the insulating support is reduced to 3 to 15 μm and the copper foil on the other side is completely removed.
Claim 14
Dependent Claim 45 words
A method as claimed in claim 1, wherein said copper foil-clad circuit board substrate is a combined substrate prepared by provisionally bonding two single-side copper-clad circuit board substrates with each other through a release plastic film, thereby to unite the two substrates into a prepreg.
Claim 15
Dependent Claim 26 words
A method as claimed in claim 13, wherein said single-side copper-clad circuit board substrates of said combined substrate each have thicknesses of 0.3 mm or less.
Claim 16
Dependent Claim 27 words
A method as claimed in claim 13, wherein said combined substrate is an edge-bonded combined substrate in which the edge thereof has been partly or wholly bonded.
Claim 17
Dependent Claim 82 words
A method as claimed in claim 15, wherein said edge-bonded combined substrate is prepared by forming a combined substrate using a release film or sheet having a predetermined area size smaller than the prepreg, a film or sheet having a releasable part of a predetermined area size, or a release film or sheet having many perforations in the part corresponding to the edge of the edge-bonded combined substrate to be formed, and then cutting the thus-formed combined substrate into a predetermined size.

References Cited (Backward Citations)

US3231503A Cited
US3671407A Cited
US4434022A Cited
US4790902A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1993-04-16 1993-10-16 1994-04-17 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1997-04-16 1997-10-16 1998-04-17 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2001-04-16 2001-10-16 2002-04-17 $7700.00 Window Closed / Lapsed

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