US4904564A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for imaging multi-layer resist structure
Assignee: International Business Machines Corp
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Filing: 1988-06-16
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Granted: 1990-02-27
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Expires: 2008-06-16
Abstract
Abstract An image is provided by depositing a first layer of a photoresist containing a phenolic-formaldehyde novolak type polymer and an imidazole, benzimidazole, triazole, or indazoles to increase the solubility of the layer in aqueous alkaline developer after exposure to imaging radiation; depositing on the first layer a second layer of a photoresist containing a phenolic-formaldehyde novolak type polymer; the second layer having a lower degree of solubility in aqueous alkaline developer after exposure to imaging radiation; exposing the layers to imaging radiation; and developing the layers.
Inventors
- 👤 Kaolin N. Chiong
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 13:25
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/095; G03F7/022
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
166 words
A process for providing an image which comprises: depositing on a substrate a first layer of a positive photoresist comprising a phenolicformaldehyde novolak type polymer with a diazosensitizer and a compound selected from the group of imidazoles, benzimidzoles, triazoles, and indazoles, and mixtures thereof in an amount sufficient to increase the solubility of the layer in aqueous alkaline developer after exposure to imaging radiation; depositing on said first layer a second and different layer of a positive photoresist comprising a phenolic-formaldehyde novolak type polymer with a diazo-sensitizer wherein said second layer has a lower degree of solubility than said first layer in aqueous alkaline developer after exposure to imaging radiation; exposing said first layer of positive photoresist and said second layer of positive photoresist to imaging radiation in a predetermined pattern; and developing said first layer of positive photoresist and said second layer of positive photoresist to thereby remove the portions of said first layer and said second layer that were exposed to said imaging radiation.
Claim 2
Dependent Claim
166 words
A process for providing an image which comprises: depositing on a substrate a first layer of a positive photoresist comprising a phenolicformaldehyde novolak type polymer with a diazosensitizer and a compound selected from the group of imidazoles, benzimidzoles, triazoles, and indazoles, and mixtures thereof in an amount sufficient to increase the solubility of the layer in aqueous alkaline developer after exposure to imaging radiation; depositing on said first layer a second and different layer of a positive photoresist comprising a phenolic-formaldehyde novolak type polymer with a diazo-sensitizer wherein said second layer has a lower degree of solubility than said first layer in aqueous alkaline developer after exposure to imaging radiation; exposing said first layer of positive photoresist and said second layer of positive photoresist to imaging radiation in a predetermined pattern; and developing said first layer of positive photoresist and said second layer of positive photoresist to thereby remove the portions of said first layer and said second layer that were exposed to said imaging radiation.
Claim 3
Dependent Claim
11 words
The process of claim 1 wherein said compound is an imidazole.
Claim 4
Dependent Claim
25 words
The process of claim 2 wherein said imidazole is employed in amounts of about 0.5% to about 5% based upon the phenolic-formaldehyde novolak type polymer.
Claim 5
Dependent Claim
15 words
The process of claim 1 wherein said first layer is thicker than said second layer.
Claim 6
Dependent Claim
11 words
The process of claim 1 wherein said sensitizer is a diazo-naphthoquinone.
Claim 7
Dependent Claim
27 words
The process of claim 1 wherein said first layer is about 4,000 to about 7,000 angstroms, and said second layer is about 3,000 to about 5,000 angstroms.
Claim 8
Dependent Claim
20 words
The process of claim 1 wherein said first layer and said second layer are developed with an aqueous alkaline solution.
Claim 9
Dependent Claim
18 words
The process of claim 7 wherein said alkaline solution is a potassium hydroxide or sodium hydroxide aqueous solution
Claim 10
Dependent Claim
17 words
The process of claim 8 wherein said solution contains about 0.2N to about 0.28N of the hydroxide.
Claim 11
Dependent Claim
10 words
The process of claim 1 wherein said compound is benzimidazole.
Claim 12
Dependent Claim
47 words
The process of claim 1 wherein the phenolic-formaldehyde novalak type polymer and diazo-sensitizer employed in the second layer are the same as employed in the first layer and the relative amount of sensitizer to polymer in the second layer is the same as in the first layer.
Claim 13
Dependent Claim
12 words
The process of claim 1 wherein said predetermined pattern includes submicron features.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-02-26 | 1993-08-28 | 1994-02-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-02-26 | 1997-08-28 | 1998-02-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-02-26 | 2001-08-28 | 2002-02-27 | $7700.00 | Window Closed / Lapsed |