US4899439A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of fabricating a high density electrical interconnect
Assignee: Rateze Remote Mgmt LLC
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Filing: 1989-06-15
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Granted: 1990-02-13
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Expires: 2009-06-15
Abstract
Abstract A high density electrical interconnect having a plurality of metallic conductors supported from metallic pillars which are electrically isolated from the ground plane by openings. The interconnect can be fabricated using a temporary support dielectric, which may be removed after completion to provide an air dielectric or be replaced with a more suitable permanent dielectric. The removal of the temporary support allows the conductors to be coated with protective layers or with a layer of a higher conductivity.
Inventors
- 👤 Curtis N. Potter
- 👤 Lawrence N. Smith
- 👤 Harry Kroger
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 07:42
CPC Classifications
H; H05; H05K; H05K3/00; H05K3/46; H05K3/4644; H05K3/4647; H05K1/00; H05K1/02; H05K1/0286; H05K1/0287; H05K1/0289; H05K1/0272; Y; Y10; Y10S; Y10S428/00; Y10S428/901; Y10T; Y10T29/00; Y10T29/49; Y10T29/49002; Y10T29/49117; Y10T29/49124; Y10T29/49126; Y10T29/49155
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
223 words
A method of fabricating a high density electrical interconnect system comprising, covering a substrate with a layer of an insulating material, applying an adhesion layer to the insulating material, applying a conductive ground plane and a plurality of first layers of support pillars over the adhesion layer leaving openings in the ground plane around the first layers for isolating the support pillars from the ground plane, applying a second adhesion layer to the first layers and the ground plane, applying a second layer of insulating material over the second adhesion layer, etching holes in the second layer of insulating material over the first layers of the support pillars, plating a second layer onto each of the first layers of the support pillars, applying a third adhesion layer over the second layer of the support pillars, applying a third layer of insulating material over the third adhesion layer, etching the third layer of insulating material to form openings for a third layer of support pillars and at least one metallic conductor, plating into the openings in the third layer of insulating material a third layer of support layers onto some of the second layers of support layers, forming additional layers of support pillars and metallic conductors above the third layer of support layers and said metallic conductor, and removing the layers of insulating material.
Claim 2
Independent Claim
223 words
A method of fabricating a high density electrical interconnect system comprising, covering a substrate with a layer of an insulating material, applying an adhesion layer to the insulating material, applying a conductive ground plane and a plurality of first layers of support pillars over the adhesion layer leaving openings in the ground plane around the first layers for isolating the support pillars from the ground plane, applying a second adhesion layer to the first layers and the ground plane, applying a second layer of insulating material over the second adhesion layer, etching holes in the second layer of insulating material over the first layers of the support pillars, plating a second layer onto each of the first layers of the support pillars, applying a third adhesion layer over the second layer of the support pillars, applying a third layer of insulating material over the third adhesion layer, etching the third layer of insulating material to form openings for a third layer of support pillars and at least one metallic conductor, plating into the openings in the third layer of insulating material a third layer of support layers onto some of the second layers of support layers, forming additional layers of support pillars and metallic conductors above the third layer of support layers and said metallic conductor, and removing the layers of insulating material.
Claim 3
Dependent Claim
20 words
The method of claim 1 including, placing a low dielectric material into the space created by removing the insulating material.
Claim 4
Dependent Claim
16 words
The method of claim 1 including, applying a protective coating to the pillars and the conductors.
Claim 5
Dependent Claim
20 words
The method of claim 3 including, placing a low dielectric material into the space created by removing the insulating material.
Claim 6
Dependent Claim
28 words
The method of claim 1 including, coating the metallic conductors with a metal having a higher conductivity than the metallic conductors after removing the layers of insulating material.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-02-12 | 1993-08-14 | 1994-02-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-02-12 | 1997-08-14 | 1998-02-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-02-12 | 2001-08-14 | 2002-02-13 | $7700.00 | Window Closed / Lapsed |