US4889587A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of preparing a substrate for ink jet head and method of preparing an ink jet head
Assignee: Canon Inc
•
Filing: 1988-12-02
•
Granted: 1989-12-26
•
Expires: 2008-12-02
Abstract
Abstract A method of preparing an ink jet head comprises a support, an electrothermal transducer formed on said support and having a heat-generating resistor and a pair of electrodes connected electrically to said heat-generating resistor, and a liquid path formed on said support corresponding to the heat-generating portion of said electrothermal transducer formed between said pair of electrodes, and communicating with a discharge opening for discharging liquid, which comprises the step of dry etching to pattern the material for said heat-generating resistor provided on said support in the form of a layer.
Inventors
- 👤 Hirokazu Komuro
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 12:04
CPC Classifications
B; B41; B41J; B41J2/00; B41J2/005; B41J2/01; B41J2/135; B41J2/16; B41J2/1621; B41J2/164; B41J2/1642; B41J2/1601; B41J2/1604; B41J2/1623; B41J2/1626; B41J2/1628; B41J2/1629; B41J2/1631; B41J2/1646; B41J2/14; B41J2002/14379; B41J2202/00; B41J2202/01; B41J2202/03
Claims Analysis
Total Claims: 36
Claim 1
Independent Claim
91 words
A method of preparing an ink jet head comprising a support; an electrothermal transducer formed on said support and having a heat-generating resistor and a pair of electrodes connected electrically to said heat-generating resistor; and a liquid path formed on said support corresponding to the heat-generating portion of said electrothermal transducer formed between said pair of electrodes, and communicating with a discharge opening for discharging liquid, which comprises the step of dry etching to pattern the material for said heat-generating resistor provided on said support in the form of a layer.
Claim 2
Independent Claim
91 words
A method of preparing an ink jet head comprising a support; an electrothermal transducer formed on said support and having a heat-generating resistor and a pair of electrodes connected electrically to said heat-generating resistor; and a liquid path formed on said support corresponding to the heat-generating portion of said electrothermal transducer formed between said pair of electrodes, and communicating with a discharge opening for discharging liquid, which comprises the step of dry etching to pattern the material for said heat-generating resistor provided on said support in the form of a layer.
Claim 3
Dependent Claim
19 words
The method as defined in claim 1, wherein said dry etching is carried out using a halogenic etching gas.
Claim 4
Dependent Claim
16 words
The method as defined in claim 2, wherein said halogenic etching gas is a chlorine-type gas.
Claim 5
Dependent Claim
26 words
The method as defined in claim 3, wherein said chlorine-type gas is selected from CCl 4 , Cl 2 , BCl 3 and SiCl 4 .
Claim 6
Dependent Claim
15 words
The method as defined in claim 2, wherein said halogenic gas is a fluorine-type gas.
Claim 7
Dependent Claim
25 words
The method as defined in claim 5, wherein said fluorine-type gas is selected from CF 4 , CHF 3 CF 6 and NF 3 .
Claim 8
Dependent Claim
17 words
The method as defined in claim 1, wherein said heat-generating resistor is formed using a metal boride.
Claim 9
Dependent Claim
35 words
The method as defined in claim 7, wherein said metal boride is selected from hafnium boride, lanthanum boride, zirconium boride, titanium boride, tantalum boride, tungsten boride, molybdenum boride, niobium boride, chromium boride and vanadium boride.
Claim 10
Dependent Claim
38 words
The method as defined in claim 1, wherein prior to said step, the additional step of patterning the material for said electrodes provided on said material for said heat-generating resistor in the form of a layer is performed.
Claim 11
Dependent Claim
14 words
The method as defined in claim 9, wherein said patterning is performed by etching.
Claim 12
Dependent Claim
13 words
The method as defined in claim 10, wherein said etching is dry etching.
Claim 13
Dependent Claim
13 words
The method as defined in claim 10, wherein said etching is wet etching.
Claim 14
Dependent Claim
26 words
The method as defined in claim 1, wherein subsequently to said step, the additional step of forming a protective layer on said electrothermal transducer is performed.
Claim 15
Dependent Claim
17 words
The method as defined in claim 13, wherein said protective layer is formed using SiO 2 .
Claim 16
Dependent Claim
16 words
The method as defined in claim 13, wherein said protective layer is formed using a polyimide.
Claim 17
Dependent Claim
17 words
The method as defined in claim 1, wherein said electrothermal transducer generates heat utilized for discharging liquid.
Claim 18
Dependent Claim
29 words
The method as defined in claim 1, wherein said liquid path is formed by bonding said support to a covering member having a recession for forming the liquid path.
Claim 19
Dependent Claim
36 words
The method as defined in claim 1, wherein said liquid path is formed by forming a wall-forming member for forming the wall of the liquid path and then bonding said wall-forming member to a top plate.
Claim 20
Dependent Claim
17 words
The method as defined in claim 18, wherein said wall-forming member is formed using a photosensitive resin.
Claim 21
Independent Claim
63 words
A method of preparing a substrate for an ink jet head comprising a support; and an electrothermal transducer formed on said support and having a heat-generating resistor and a pair of electrodes connected electrically to said heat-generating resistor, which comprises the step of dry etching to pattern the material for said heat-generating resistor provided on said support in the form of a layer.
Claim 22
Independent Claim
63 words
A method of preparing a substrate for an ink jet head comprising a support; and an electrothermal transducer formed on said support and having a heat-generating resistor and a pair of electrodes connected electrically to said heat-generating resistor, which comprises the step of dry etching to pattern the material for said heat-generating resistor provided on said support in the form of a layer.
Claim 23
Dependent Claim
19 words
The method as defined in claim 20, wherein said dry etching is carried out using a halogenic etching gas.
Claim 24
Dependent Claim
16 words
The method as defined in claim 21, wherein said halogenic etching gas is a chlorine-type gas.
Claim 25
Dependent Claim
26 words
The method as defined in claim 22, wherein said chlorine-type gas is selected from CCl 4 , Cl 2 , BCl 3 and SiCl 4 .
Claim 26
Dependent Claim
15 words
The method as defined in claim 21, wherein said halogenic gas is a fluorine-type gas.
Claim 27
Dependent Claim
28 words
The method as defined in claim 24, wherein said fluorine-type gas is selected from CF 4 , CHF 3 , C 2 F 6 and NF 3 .
Claim 28
Dependent Claim
17 words
The method as defined in claim 20, wherein said heat-generating resistor is formed using a metal boride.
Claim 29
Dependent Claim
35 words
The method as defined in claim 26, wherein said metal boride is selected from hafnium boride, lanthanum boride, zirconium boride, titanium boride, tantalum boride, tungsten boride, molybdenum boride, niobium boride, chromium boride and vanadium boride.
Claim 30
Dependent Claim
38 words
The method as defined in claim 20, wherein prior to said step, the additional step of patterning the material for said electrodes provided on said material for said heat-generating resistor in the form of a layer is performed.
Claim 31
Dependent Claim
14 words
The method as defined in claim 28, wherein said patterning is performed by etching.
Claim 32
Dependent Claim
13 words
The method as defined in claim 29, wherein said etching is dry etching.
Claim 33
Dependent Claim
13 words
The method as defined in claim 29, wherein said etching is wet etching.
Claim 34
Dependent Claim
26 words
The method as defined in claim 20, wherein subsequently to said step, the additional step of forming a protective layer on said electrothermal transducer is performed.
Claim 35
Dependent Claim
17 words
The method as defined in claim 32, wherein said protective layer is formed using SiO 2 .
Claim 36
Dependent Claim
16 words
The method as defined in claim 32, wherein said protective layer is formed using a polyimide.
References Cited (Backward Citations)
DE2843064A1
Cited
JPS5459936A
Cited
US4723129A
Cited
JPS59194859A
Cited
US4602261A
Cited
US4720716A
Cited
US4783369A
Cited
US4719478A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-12-25 | 1993-06-26 | 1993-12-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-12-25 | 1997-06-26 | 1997-12-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-12-25 | 2001-06-26 | 2001-12-26 | $7700.00 | Window Closed / Lapsed |