US4885186A
Expired / Lapsed
US
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Method for preparation of silicate glasses of controlled index of refraction
Assignee: Nytell Software LLC
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Filing: 1988-12-29
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Granted: 1989-12-05
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Expires: 2008-12-29
Abstract
Abstract A method for the preparation of silicate glasses of controlled index of refraction involves the thermal and/or plasma processing of organo-silicon polymers. Compositions so treated evidence a suppressed index of refraction which may subsequently be increased by sintering to yield a material uniquely suited for use in fiber optic devices.
Inventors
- 👤 Brian G. Bagley
- 👤 William E. Quinn
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 14:20
CPC Classifications
C; C03; C03C; C03C1/00
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
109 words
Method for the preparation of silicate glass of controlled index of refraction which comprises the steps of (a) curing an organo-silicon polymer containing a phosphorous or boron source at a temperature ranging from 200°-250° C., (b) exposing said cured resin to an air or oxygen plasma in a barrel reactor at room temperature, so resulting in the formation of a fenestrated structure having an index of refraction ranging down to 1.38, and (c) sintering said structure at a temperature within the range of 500°-1000° C. to effect an increase in the refractive index to a desired value ranging up to and exceeding the refractive index of bulk fused silica.
Claim 2
Dependent Claim
109 words
Method for the preparation of silicate glass of controlled index of refraction which comprises the steps of (a) curing an organo-silicon polymer containing a phosphorous or boron source at a temperature ranging from 200°-250° C., (b) exposing said cured resin to an air or oxygen plasma in a barrel reactor at room temperature, so resulting in the formation of a fenestrated structure having an index of refraction ranging down to 1.38, and (c) sintering said structure at a temperature within the range of 500°-1000° C. to effect an increase in the refractive index to a desired value ranging up to and exceeding the refractive index of bulk fused silica.
Claim 3
Dependent Claim
139 words
Method for the preparation of a germanosilicate glass of controlled index of refraction which comprises the steps of (a) curing an organo-silicon polymer upon a suitable substrate at a temperature ranging from 200°-250° C. for 30 minutes, (b) depositing a layer of a germanium ethoxide solution in ethanol upon said cured film, heat treating the film at 200°-250° C. for 30 minutes and then exposing the resultant structure to an air or oxygen plasma in a barrel reactor at room temperature, so resulting in the formation of a fenestrated structure having an index of refraction ranging down to 1.38, and (c) sintering said structure at a temperature within the range of 500°-1000° C. to effect an increase in the refractive index to a desired value ranging up to a value which exceeds the refractive index of bulk fused silica.
Claim 4
Dependent Claim
139 words
Method for the preparation of a germanosilicate glass of controlled index of refraction which comprises the steps of (a) curing an organo-silicon polymer upon a suitable substrate at a temperature ranging from 200°-250° C. for 30 minutes, (b) depositing a layer of a germanium ethoxide solution in ethanol upon said cured film, heat treating the film at 200°-250° C. for 30 minutes and then exposing the resultant structure to an air or oxygen plasma in a barrel reactor at room temperature, so resulting in the formation of a fenestrated structure having an index of refraction ranging down to 1.38, and (c) sintering said structure at a temperature within the range of 500°-1000° C. to effect an increase in the refractive index to a desired value ranging up to a value which exceeds the refractive index of bulk fused silica.
Claim 5
Dependent Claim
134 words
Method for the preparation of a silicate glass of controlled index of refraction which comprises the steps of (a) curing an organo-silicon thermosetting resin in a reaction vessel at a temperature within the range of 200°-400° C. for a time period within the range of 1-30 minutes; (b) exposing said cured resin to an oxygen or air plasma in a barrel reactor at room temperature, so resulting in a structure having an index of refraction less than that of bulk fused silica; and (c) adjusting the refractive index of the structure by sintering at a temperature within the range of 600°-1100° C. for a time period within the range of 1-60 minutes to effect an increase in the refractive index to a desired value ranging up to the refractive index of bulk fused silica.
Claim 6
Dependent Claim
134 words
Method for the preparation of a silicate glass of controlled index of refraction which comprises the steps of (a) curing an organo-silicon thermosetting resin in a reaction vessel at a temperature within the range of 200°-400° C. for a time period within the range of 1-30 minutes; (b) exposing said cured resin to an oxygen or air plasma in a barrel reactor at room temperature, so resulting in a structure having an index of refraction less than that of bulk fused silica; and (c) adjusting the refractive index of the structure by sintering at a temperature within the range of 600°-1100° C. for a time period within the range of 1-60 minutes to effect an increase in the refractive index to a desired value ranging up to the refractive index of bulk fused silica.
References Cited (Backward Citations)
No citation records indexed.
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