US4883352A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Deep-uv lithography
Assignee: Agere Systems LLC
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Filing: 1988-08-12
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Granted: 1989-11-28
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Expires: 2008-08-12
Abstract
Abstract A deep-UV step-and-repeat photolithography system includes a narrow-bandwidth pulsed excimer laser illumination source and an all-fused-silica lens assembly. The system is capable ofline definition at the 0.5-micrometer level. One significant feature of the system is its ability to perform wafer focus tracking by simply changing the frequency of the laser.
Inventors
- 👤 John H. Bruning
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 05:57
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70058; G03F7/70075; G03F7/70141; G03F7/70216; G03F7/70358; G03F7/70483; G03F7/7055; G03F7/70575; G03F7/708; G03F7/70808; G03F7/70858; G03F7/709
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
66 words
Apparatus comprising: means for providing laser radiation that inherently i s characterized by a relatively wide bandwidth; a lens assembly, disposed in the path of said radiation, which exhibits unacceptably large chromatic aberrations in response to the relatively wide bandwidth radiation inherently provided by said means; and means for sufficiently narrowing the bandwidth of said radiation to cause said assembly to exhibit acceptably low chromatic aberrations.
Claim 2
Dependent Claim
66 words
Apparatus comprising: means for providing laser radiation that inherently i s characterized by a relatively wide bandwidth; a lens assembly, disposed in the path of said radiation, which exhibits unacceptably large chromatic aberrations in response to the relatively wide bandwidth radiation inherently provided by said means; and means for sufficiently narrowing the bandwidth of said radiation to cause said assembly to exhibit acceptably low chromatic aberrations.
Claim 3
Independent Claim
91 words
A method for fabricating a device, comprising the steps of: generating laser radiation that inherently is characterized by a relatively wide bandwidth; directing at least a portion of said radiation at a workpiece via a lens assembly disposed in the path of said radiation, said assembly exhibiting unacceptably large chromatic aberrations in response to said relatively wide bandwith radiation; sufficiently narrowing the bandwidth of said radiation to cause said assembly to exhibit acceptably low chromatic aberrations; and further processing said workpiece to complete the fabrication of said device from said workpiece.
Claim 4
Independent Claim
91 words
A method for fabricating a device, comprising the steps of: generating laser radiation that inherently is characterized by a relatively wide bandwidth; directing at least a portion of said radiation at a workpiece via a lens assembly disposed in the path of said radiation, said assembly exhibiting unacceptably large chromatic aberrations in response to said relatively wide bandwith radiation; sufficiently narrowing the bandwidth of said radiation to cause said assembly to exhibit acceptably low chromatic aberrations; and further processing said workpiece to complete the fabrication of said device from said workpiece.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-11-27 | 1993-05-29 | 1993-11-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-11-27 | 1997-05-29 | 1997-11-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-11-27 | 2001-05-29 | 2001-11-28 | $7700.00 | Window Closed / Lapsed |