Method of making a thin film electroluminescence element

Claim 1

A method of forming a thin film electroluminescent element comprising the steps of: forming a luminous body layer having a crystal basic material and a luminescence center, on a transparent base plate; and doping an impurity within said crystal basic material so that the doped luminous body layer will emit light from said luminescence center in response to an inflow of electrons accelerated in an electric field; forming a transparent electrode between said luminous body layer and said transparent base plate; forming a rear electrode on said luminous body layer opposed to said transparent electrode in a way such that an electric field can be formed between said rear electrode and said transparent electrode; at least one dielectric body film layer provided between at least one of said transparent electrode and said rear electrode, and said luminous body layer; and causing high energy particles to collide against a surface of the luminous body layer to destroy the crystal structure of at least a portion thereof and to form at least one electron inflow restraining layer in said luminous body layer in contact with said at least one dielectric body film layer, said electron inflow restraining layer restraining an inflow of said electrons from the interface of said luminous body layer with said dielectric body film layer into said luminous body layer.

Claim 2

A method of forming a thin film electroluminescent element comprising the steps of: forming a luminous body layer having a crystal basic material and a luminescence center, on a transparent base plate; and doping an impurity within said crystal basic material so that the doped luminous body layer will emit light from said luminescence center in response to an inflow of electrons accelerated in an electric field; forming a transparent electrode between said luminous body layer and said transparent base plate; forming a rear electrode on said luminous body layer opposed to said transparent electrode in a way such that an electric field can be formed between said rear electrode and said transparent electrode; at least one dielectric body film layer provided between at least one of said transparent electrode and said rear electrode, and said luminous body layer; and causing high energy particles to collide against a surface of the luminous body layer to destroy the crystal structure of at least a portion thereof and to form at least one electron inflow restraining layer in said luminous body layer in contact with said at least one dielectric body film layer, said electron inflow restraining layer restraining an inflow of said electrons from the interface of said luminous body layer with said dielectric body film layer into said luminous body layer.

Claim 3

A method for forming a thin film electroluminescence element comprising the steps of: forming a first electrode on a transparent base plate; disposing an evaporation material and said transparent base plate on which said first electrode is formed, within a vacuum chamber; heating said evaporation material to form a luminous body layer on said first electrode; generating gas ions and causing said gas ions to collide against an upper surface of said luminous body layer to physically change said surface to form an electron inflow restraining layer for restraining hot electron inflow into said luminous body in said luminous body layer; forming a dielectric body film layer on said electron inflow restraining layer; and forming a second electrode on said dielectric body film layer.

Claim 4

A method for forming a thin film electroluminescence element comprising the steps of: forming a first electrode on a transparent base plate; disposing an evaporation material and said transparent base plate on which said first electrode is formed, within a vacuum chamber; heating said evaporation material to form a luminous body layer on said first electrode; generating gas ions and causing said gas ions to collide against an upper surface of said luminous body layer to physically change said surface to form an electron inflow restraining layer for restraining hot electron inflow into said luminous body in said luminous body layer; forming a dielectric body film layer on said electron inflow restraining layer; and forming a second electrode on said dielectric body film layer.

Claim 7

A method for forming a thin film electroluminescence element comprising the steps of: forming a first electrode on a transparent base plate, and forming a dielectric body film layer on said first electrode; disposing an evaporation material and said transparent base plate on which said first electrode and said dielectric body film layer are formed, within a vacuum chamber; heating said evaporation material to form a luminous body layer on said dielectric body film layer; generating gas ions and colliding said gas ions against an upper surface of said luminous body layer to physically change said surface to form an electron inflow restraining layer for restraining hot electron inflow into said luminous body layer in said luminous body layer; and forming a second electrode on said electron inflow restraining layer.

Claim 8

A method for forming a thin film electroluminescence element comprising the steps of: forming a first electrode on a transparent base plate, and forming a dielectric body film layer on said first electrode; disposing an evaporation material and said transparent base plate on which said first electrode and said dielectric body film layer are formed, within a vacuum chamber; heating said evaporation material to form a luminous body layer on said dielectric body film layer; generating gas ions and colliding said gas ions against an upper surface of said luminous body layer to physically change said surface to form an electron inflow restraining layer for restraining hot electron inflow into said luminous body layer in said luminous body layer; and forming a second electrode on said electron inflow restraining layer.

Claim 11

A method for forming a thin film electroluminescence element comprising the steps of: forming a first electrode on a transparent base plate and forming a first dielectric body film layer on said first electrode; disposing an evaporation material and said transparent base plate on which said first electrode and said first dielectric body film layer are formed, within a vacuum chamber; heating said evaporation material to form a luminous body layer on said first dielectric body film layer; generating gas ions and colliding said gas ions against an upper surface of said luminous body layer to physically change said surface, to form an electron inflow restraining layer for restraining hot electron inflow into said luminous body layer in said luminous body layer; and forming a second dielectric body film layer on said electron inflow restraining layer and forming a second electrode on said second dielectric body film layer.

Claim 12

A method for forming a thin film electroluminescence element comprising the steps of: forming a first electrode on a transparent base plate and forming a first dielectric body film layer on said first electrode; disposing an evaporation material and said transparent base plate on which said first electrode and said first dielectric body film layer are formed, within a vacuum chamber; heating said evaporation material to form a luminous body layer on said first dielectric body film layer; generating gas ions and colliding said gas ions against an upper surface of said luminous body layer to physically change said surface, to form an electron inflow restraining layer for restraining hot electron inflow into said luminous body layer in said luminous body layer; and forming a second dielectric body film layer on said electron inflow restraining layer and forming a second electrode on said second dielectric body film layer.